公开(公告)号：JPH05249680A

公开(公告)日：1993-09-28

申请号：JP20784692

申请日：1992-08-04

Applicant: IBM

Inventor： ROBAATO DEIBITSUDO AREN ,  UIRIAMU ROSU BURANZUBOURUDO ,  BAATON JIESHII KAAPENTAA ,  UIRIAMU DEIINAN HINZUBAAGU ,  JIYOZEFU RATOORE ,  MAIKURU JIYOOJI MAKUMASUTAA ,  MERUBIN UOREN MONTOGOMERII ,  UEIN MAATEIN MOROO ,  ROOGAN ROIDO SHINPUSON ,  ROBAATO JIEIMUZU TOUEIGU ,  GUREGORII MAIKURU UOORURAFU

IPC: G03F7/004 ,  C08F2/50 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To obtain a positive photoresist and to provide a photolithographic method using the photoresist. CONSTITUTION: This photoresist contains a polymer practically insoluble in water and base and unstable to light and a photo-acid generating agent capable of forming a strong acid. The photo-acid generating agent is sulfonate ester derived from N-hydroxyamide or N-hydroxyimide. This photoresist further contains a proper photosensitizer.