公开(公告)号：DE69230684T2

公开(公告)日：2000-08-17

申请号：DE69230684

申请日：1992-10-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  WILLSON CARLTON GRANT ,  MCDONALD SCOTT ARTHUR ,  CONLEY WILLARD EARL ,  KWONG RANEE WAI-LING ,  SCHLOSSER HUBERT ,  LINEHAN LEO LAWRENCE ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of bing inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.

公开(公告)号：DE69230684D1

公开(公告)日：2000-03-23

申请号：DE69230684

申请日：1992-10-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  WILLSON CARLTON GRANT ,  MCDONALD SCOTT ARTHUR ,  CONLEY WILLARD EARL ,  KWONG RANEE WAI-LING ,  SCHLOSSER HUBERT ,  LINEHAN LEO LAWRENCE ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of bing inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.