公开(公告)号：EP0698230A4

公开(公告)日：1995-10-24

申请号：EP94900495

申请日：1993-10-29

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  BREYTA GREGORY ,  DIPIETRO RICHARD ANTHONY ,  ITO HIROSHI ,  KNORS CHRISTOPHER JOHN ,  KWONG RANEE WAI-LING ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SACHDEV HARBANS SINGH ,  WELSH KEVIN MICHAEL

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C5/16 ,  G03F7/029

CPC classification number: G03F7/039

Abstract: Resists for use in ultraviolet, electron beam and x-ray exposure devices comprising a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate esters or benzenesulfonyloxy esters of N-hydroxyimides.

公开(公告)号：JPH10182989A

公开(公告)日：1998-07-07

申请号：JP25249297

申请日：1997-09-17

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  FAHEY JAMES THOMAS ,  HEFFERON GEORGE JOSEPH ,  HUANG WU-SONG ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  KHOJASTEH MAHMOUD ,  KWONG RANEE WAI-LING ,  KIM YAN LEE ,  SACHDEV HARBANS SINGH ,  SACHDEV KRISHNA GANDI ,  SOORIYAKUMARAN RATNAM ,  WOOD ROBERT LAVIN

IPC: C08L25/02 ,  C08L61/10 ,  C08L101/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To make a composition hardly receive a disadvantageous reaction with environmental contaminants, enhance the tolerance for variable or long delay between exposure and printing after the exposure or printing after the exposure and development, eliminate any deterioration in a profile, stabilize the solubility in solvents and impart storage life thereof in a solution for a long period at ambient temperature. SOLUTION: This microlithographic composition comprises a composition, containing a film-forming polymer substituted at the o-position with an acid unstable compound containing a ketal component in at least a part of a chemically bound recurring hydroxyl group and an acid-generating compound, capable of forming an acid by exposure to actinic radiations and chemically bound to the polymer and used as the microlithographic composition. The acid generated by the exposure initiates the cleavage of at least a part of the compound containing the ketal component and the exposed composition becomes selectively more soluble in an aqueous base as compared with an unexposed composition.

公开(公告)号：DE69231175T2

公开(公告)日：2000-12-14

申请号：DE69231175

申请日：1992-10-23

Applicant: IBM

Inventor： SACHDEV HARBANS SINGH ,  CONLEY WILLARD EARL ,  JAGANNATHAN PREMLATHA ,  KATNANI AHMAD DAUOD ,  WAI-LING KWONG RANEE ,  LINEHAN LEO LAWRENCE ,  MIURA STEVE SEIICHI ,  SMITH RANDOLPH JOSEPH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

Abstract: High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.

公开(公告)号：DE69027799D1

公开(公告)日：1996-08-22

申请号：DE69027799

申请日：1990-02-02

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  KNORS CHRISTOPHER JOHN ,  KWONG RANEE WAI-LING ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: Resists for use in photon, electron beam and x-ray exposure devices comprise a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate salts of imides.

公开(公告)号：DE3576798D1

公开(公告)日：1990-05-03

申请号：DE3576798

申请日：1985-01-24

Applicant: IBM

Inventor： SACHDEV KRISHNA GANDI ,  SACHDEV HARBANS SINGH ,  AVIRAM ARI ,  WIZNER MARK ALAN

IPC: B41M5/392 ,  B41J31/00 ,  B41J31/02 ,  B41M5/26 ,  G01D15/10

Abstract: Chemical heat amplification is provided in thermal transfer printing, wherein some of the heat necessary for melting and transferring ink from a solid fusible layer in a ribbon to a re- ce i ving medium is provided by an exothermic reaction. This chemical reaction is due to an exothermic material that is located in the ink layer, or in another layer of the ink bearing ribbon. The exothermic reaction reduces the amount of the input power which must be applied either electrically or with electromagnetic waves. Examples of suitable exothermic materials are those which will provide heat within the operative temperature range of the ink, and include hydrazone derivatives which are substantially colorless, and have a molecular weight in the approximate range 150-650. The group consisting of substituted aryl sulfonyl hydrazones, mono hydrazones of acylic -diketones, aromatic disulfonyl and diacyl hydrazones, and mono hydrazones of cyclic -dicarbonyl heterocycles are usable exothermic materials.

公开(公告)号：DE68908470T2

公开(公告)日：1994-03-17

申请号：DE68908470

申请日：1989-03-14

Applicant: IBM

Inventor： ANDERSON HERBERT RUDOLPH ,  BOOTH RICHARD BENTON ,  DAVID LAWRENCE DANIEL ,  NEISSER MARK OLIVER ,  SACHDEV HARBANS SINGH ,  TAKACS MARK ANTHONY

IPC: H01L23/373 ,  C09K5/08 ,  F28F13/00 ,  C09K5/00

公开(公告)号：DE3382697D1

公开(公告)日：1993-07-22

申请号：DE3382697

申请日：1983-11-15

Applicant: IBM

Inventor： SACHDEV HARBANS SINGH ,  SACHDEV KRISHNA GANDHI

IPC: H01L21/302 ,  G03F7/09 ,  H01L21/3065 ,  H01L21/3205 ,  G03F7/00

公开(公告)号：DE3473198D1

公开(公告)日：1988-09-08

申请号：DE3473198

申请日：1984-12-14

Applicant: IBM

Inventor： SACHDEV HARBANS SINGH ,  SACHDEV KRISHNA

IPC: H01L21/312 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/498 ,  H01L23/522 ,  H01L23/532 ,  H01L21/90 ,  H01L23/52

Abstract: The structure overlay a substrate with conductive first pattern (7a) and comprise first layer (3 min ) of an organic polymer, a second layer (9) of an organometallic compound, second conductive pattern (7c sec ) on said layer (9) and metallurgy (7b min ) interconnecting said first and second pattern (7a, 7c sec ) through said layers (3 min , 9). For forming the structure said first, said second, a third and a fourth layer (3 min , 9, 4 min and 5 min ) are deposited with third layer (4 min ) being soluble in a solvent not dissolving layer (3 min ) and fourth layer (5 min ) being oxygen RIE resistant. The layers are selectively removed successively by RIE. Blanket metal layer (7 min ) is applied and then third layer (4 min ) is removed by dissolution and with it the overlying layers. Subsequently the process steps are repeated with the exception of steps involving an organometallic layer. The usage of an organometallic layer provides an improved compatibility of the thermal expansion coefficients between contiguous layers and an oxygen etch stop.

公开(公告)号：DE3275632D1

公开(公告)日：1987-04-16

申请号：DE3275632

申请日：1982-07-30

Applicant: IBM

Inventor： BAISE ARNOLD IVAN ,  BURNS JOHN MARTIN ,  SACHDEV HARBANS SINGH

IPC: C23C14/02 ,  B05D7/24 ,  C08F2/52 ,  C08F30/02 ,  C08J7/00 ,  C23C14/04 ,  H01L21/312 ,  B05D3/00 ,  B05D1/00

公开(公告)号：DE69230684T2

公开(公告)日：2000-08-17

申请号：DE69230684

申请日：1992-10-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  WILLSON CARLTON GRANT ,  MCDONALD SCOTT ARTHUR ,  CONLEY WILLARD EARL ,  KWONG RANEE WAI-LING ,  SCHLOSSER HUBERT ,  LINEHAN LEO LAWRENCE ,  SACHDEV HARBANS SINGH

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: Dry developable top surface imageable photoresist compositions which comprise, in admixture, a film-forming aromatic polymer resin activated to electrophilic substitution, an acid catalyzable agent capable of bing inserted into the aromatic polymer resin, and a radiation degradable acid generating compound and processes for generating positive tone resist images on substrates therewith.