公开(公告)号：DE69012873T2

公开(公告)日：1995-03-30

申请号：DE69012873

申请日：1990-03-13

Applicant: IBM

Inventor： HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY

IPC: G03F7/038 ,  C08G59/00 ,  C08G59/14 ,  C08G59/18 ,  G03F7/004 ,  G03F7/029 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

Abstract: A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.

公开(公告)号：DE69012873D1

公开(公告)日：1994-11-03

申请号：DE69012873

申请日：1990-03-13

Applicant: IBM

Inventor： HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY

IPC: G03F7/038 ,  C08G59/00 ,  C08G59/14 ,  C08G59/18 ,  G03F7/004 ,  G03F7/029 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30

Abstract: A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U.V. sensitizer.

公开(公告)号：DE69024452T2

公开(公告)日：1996-07-11

申请号：DE69024452

申请日：1990-10-08

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  GELORME JEFFREY DONALD ,  HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY ,  WITMAN DAVID FRANK

IPC: G03F7/031 ,  C08F2/50 ,  C08G59/68 ,  C08G77/14 ,  C08G77/22 ,  C08G85/00 ,  C08L83/04 ,  C08L83/06 ,  G03F7/027 ,  G03F7/029 ,  G03F7/075

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: wherein X is CH=CH2 or -(-CH2-)-n0-(-R) with R being H or wherein each R , R and R individually is selected from the group of alkyl, alkenyl, aryl, wherein each R , R and R individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

公开(公告)号：DE69024452D1

公开(公告)日：1996-02-08

申请号：DE69024452

申请日：1990-10-08

Applicant: IBM

Inventor： BABICH EDWARD DARKO ,  GELORME JEFFREY DONALD ,  HATZAKIS MICHAEL ,  SHAW JANE MARGARET ,  STEWART KEVIN JAY ,  WITMAN DAVID FRANK

IPC: G03F7/031 ,  C08F2/50 ,  C08G59/68 ,  C08G77/14 ,  C08G77/22 ,  C08G85/00 ,  C08L83/04 ,  C08L83/06 ,  G03F7/027 ,  G03F7/029 ,  G03F7/075

Abstract: An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: wherein X is CH=CH2 or -(-CH2-)-n0-(-R) with R being H or wherein each R , R and R individually is selected from the group of alkyl, alkenyl, aryl, wherein each R , R and R individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.