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公开(公告)号:GB2609779B
公开(公告)日:2025-04-16
申请号:GB202215194
申请日:2021-02-19
Applicant: IBM
Inventor: TIAN SHEN , RUILONG XIE , KEVIN BREW , HENG WU , JINGYUN ZHANG
Abstract: A phase change material switch includes a phase change layer disposed on a metal liner. A gate dielectric layer is disposed on the phase change layer. A metal gate liner is disposed on the gate dielectric layer.
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公开(公告)号:GB2608308A
公开(公告)日:2022-12-28
申请号:GB202213056
申请日:2021-01-26
Applicant: IBM
Inventor: TIAN SHEN , HENG WU , KEVIN WAYNE BREW , JINGYUN ZHANG
Abstract: A method is presented for improved linearity of a phase change memory (PCM) cell structure. The method includes forming a bottom electrode (12) over a substrate (10), constructing a PCM stack (20) including a plurality of PCM layers each having a different crystallization temperature over the bottom electrode (12), and forming a top electrode (32) over the PCM stack (20). The crystallization temperature varies in an ascending order from the bottom electrode (12) to the top electrode (32).
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公开(公告)号:GB2608308B
公开(公告)日:2025-04-16
申请号:GB202213056
申请日:2021-01-26
Applicant: IBM
Inventor: TIAN SHEN , HENG WU , KEVIN WAYNE BREW , JINGYUN ZHANG
Abstract: A method is presented for improved linearity of a phase change memory (PCM) cell structure. The method includes forming a bottom electrode over a substrate, constructing a PCM stack including a plurality of PCM layers each having a different crystallization temperature over the bottom electrode, and forming a top electrode over the PCM stack. The crystallization temperature varies in an ascending order from the bottom electrode to the top electrode.
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公开(公告)号:IL295321A
公开(公告)日:2022-10-01
申请号:IL29532122
申请日:2022-08-02
Applicant: IBM , TIAN SHEN , RUILONG XIE , KEVIN W BREW , HENG WU , JINGYUN ZHANG
Inventor: TIAN SHEN , RUILONG XIE , KEVIN W BREW , HENG WU , JINGYUN ZHANG
IPC: H01L45/00
Abstract: A phase change material switch includes a phase change layer disposed on a metal liner. A gate dielectric layer is disposed on the phase change layer. A metal gate liner is disposed on the gate dielectric layer.
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