公开(公告)号：DE3467430D1

公开(公告)日：1987-12-17

申请号：DE3467430

申请日：1984-05-16

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  MCKEAN DENNIS RICHARD ,  MILLER ROBERT DENNIS ,  TOMPKINS TERRY CADY ,  WILLSON CARLTON GRANT

IPC: G03F7/20 ,  C07D213/77 ,  G03C1/72 ,  G03C5/08 ,  G03F7/008 ,  G03F7/016 ,  G03F7/022 ,  G03F7/039 ,  H01L21/027 ,  G03F7/08

Abstract: A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.

公开(公告)号：DE3662317D1

公开(公告)日：1989-04-13

申请号：DE3662317

申请日：1986-03-14

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  GRANT BARBARA DIANNE ,  MILLER ROBERT DENNIS ,  TOMPKINS TERRY CADY ,  WILLSON CARLTON GRANT

IPC: C08L101/00 ,  C08K5/00 ,  C08K5/53 ,  C08L33/00 ,  C08L33/02 ,  C08L61/10 ,  G03C1/72 ,  G03C5/16 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  H01L21/027 ,  G03F7/10

Abstract: A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.

公开(公告)号：DE3272766D1

公开(公告)日：1986-09-25

申请号：DE3272766

申请日：1982-11-23

Applicant: IBM

Inventor： CLECAK NICHOLAS JEFFRIES ,  MCKEAN DENNIS RICHARD ,  MILLER ROBERT DENNIS ,  TOMPKINS TERRY CADY ,  TWIEG ROBERT JAMES ,  WILLSON CARLTON GRANT

IPC: G03C1/72 ,  C08L61/00 ,  C08L61/04 ,  G03F7/022 ,  H01L21/027 ,  G03F7/08

Abstract: Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.