公开(公告)号：JPS6044521A

公开(公告)日：1985-03-09

申请号：JP9578484

申请日：1984-05-15

Applicant: IBM

Inventor： JIEEMUZU EKONOMII ,  JIYON AARU SASUKO ,  UIRII FUORUKUSEN ,  ROBIN EI UIITAA

IPC: C08G63/00 ,  C08G63/60 ,  C09J167/00 ,  C09K3/10 ,  H01B3/42 ,  H01L23/10 ,  H01L23/29 ,  H01L23/31

公开(公告)号：JPH0683049A

公开(公告)日：1994-03-25

申请号：JP2114693

申请日：1993-02-09

Applicant: IBM

Inventor： MARII ANGEROPUUROSU ,  DANIERU JII BAAGAA ,  JIEFURII DABURIYUU RABADEI ,  ERITSUKU DEII PAAFUEKUTO ,  MAASA AI SANCHIESU ,  SARII EI SUWANSON ,  UIRII FUORUKUSEN

IPC: G03F7/027 ,  C08F283/04 ,  C08G73/10 ,  G03F7/028 ,  G03F7/038 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: PURPOSE: To provide an improved method for forming a negative image of a photosensitive polyimide having an improved wall surface angle on a substrate. CONSTITUTION: This forming method of the negative image of the polyimide includes (a) a process for coating the substrate with a coating film containing a polyamine acid ester and a photoinitiator, (b) a process for exposing the coating film corresponding to an image with radiation to make a polyamine acid ester insoluble corresponding to the image, (c) a process for developing the image, (d) a process for allowing the coating film to contact with a base and (e) a process for making the polyamine acid ester to an imide by heating the coating film.

公开(公告)号：JPH05197148A

公开(公告)日：1993-08-06

申请号：JP20638692

申请日：1992-08-03

Applicant: IBM

Inventor： JIEFURII UIRIAMU RABADEII ,  DENISU RICHIYAADO MATSUKIIN ,  UIRII FUORUKUSEN ,  GUREGORII MAIKERU UOORAFU

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PURPOSE: To form a polylmide image on a substrate by incorporating a polyamic alkyl ester compsn. into a photosensitive negative or positive gradation compsn. CONSTITUTION: When a photosensitive negative gradation compsn. containing a polyamic alkylester and photosensitive base-producing agent is exposed, the photosensitive base-producing agent in the exposed area produces radical base. This acts as a catalyst to imidize the polyamic alkylester into insoluble partially imidized polyimide. When a photosensitive positive gradation compsn. containing polyamlc alkylester base or base precursor and a photosensitive acid-producing agent is exposed, the photosensitive acid producing agent in the positive gradation compsn. produces acid, which traps base in the exposed area of the film. By successively heating the positive gradation compsn. at low temp., partial imidization in the nonexposed area of the film is caused by the base catalyst. The positive gradation compsn. is developed by using a proper solvent.