公开(公告)号：DE3485678D1

公开(公告)日：1992-06-04

申请号：DE3485678

申请日：1984-06-20

Applicant: IBM

Inventor： DIMILIA VINCENT ,  MALDONADO JUAN RAMON ,  SPEIDELL JAMES LOUIS ,  WARLAUMONT JOHN MICHAEL

IPC: B23Q3/08 ,  B23Q3/18 ,  G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H01L21/683 ,  H05K13/00

公开(公告)号：DE3365521D1

公开(公告)日：1986-10-02

申请号：DE3365521

申请日：1983-02-23

Applicant: IBM

Inventor： BRADY MICHAEL JOHN ,  MEYERSON BERNARD STEELE ,  WARLAUMONT JOHN MICHAEL

IPC: C01B33/02 ,  G03F1/22 ,  H01L21/027 ,  G03F1/00

Abstract: An improved X-ray lithography mask has been fabricated by forming an X-ray absorbing lithography pattern on a supporting foil of hydrogenated amorphous carbon. The substrate foil is formed by depositing a carbon film in the presence of hydrogen onto a surface having a temperature below 375 DEG C. The hydrogen concentration is maintained sufficiently high that the resulting film has at least one atom percent of hydrogen. A film having about 20 atom percent of hydrogen is preferred. While impurities are permitted, impurities must be maintained at a level such that the optical bandgap of the resulting film is at least one electron volt. A film with an optical bandgap of about 2 electron volts is preferred.

公开(公告)号：DE3265191D1

公开(公告)日：1985-09-12

申请号：DE3265191

申请日：1982-04-21

Applicant: IBM

Inventor： GROBMAN WARREN DAVID ,  NELSON DAVID ALBERT ,  WARLAUMONT JOHN MICHAEL

IPC: G01B11/00 ,  G02B5/18 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30 ,  G03B41/00

Abstract: Fine alignment of mask and wafer, using Fresnel zone plates is achieved. Light is focused on the wafer by a zone plate in the mask. Light diffracted from a zone plate on the wafer is received by a sensor. The received light is coded (analog or digital) to indicate alignment. For analog coding the wafer zone plate diffracts light to the sensor from an area of the wafer zone plate which is indicative of alignment. For digital coding, the wafer zone plate is digitally encoded as a function of alignment to similarly code the diffracted light. To eliminate ambiguity, the mask zone plate is formed from a plurality of "elements", each of which is itself a Fresnel zone plate. The focal length of the elemental Fresnel zone plate can be related to the mask/wafer separation distance, whereas the focal length of the macro zone plate (made up of a plurality of the elemental zone plates) is related to the distance between mask and light sensor.