METHOD FOR PRODUCING AN ELECTRONIC COMPONENT, ESPECIALLY A MEMORY CHIP
    3.
    发明申请
    METHOD FOR PRODUCING AN ELECTRONIC COMPONENT, ESPECIALLY A MEMORY CHIP 审中-公开
    方法生产电子部件,尤其是内存芯片

    公开(公告)号:WO03001588A3

    公开(公告)日:2003-03-06

    申请号:PCT/EP0205254

    申请日:2002-05-13

    Abstract: The invention relates to a method for producing an electronic component, especially a memory chip, using a laser-induced correction to equalise an integrated circuit by means of at least one laser via (15) in a layer at least partially covering the circuit. Said component comprises a rewiring of the contact pads. The inventive method comprises the following steps: each laser via is closed by means of a separate covering layer (16) which is to be applied locally; a rewiring extending between the local covering layers (16) is created; the local covering layers (16) are removed; and the laser-induced correction is carried out by means of the open laser vias.

    Abstract translation: 一种用于制造电子元件,特别是一个存储器芯片,经由一个或多个到电路至少部分地覆盖用于校准集成电路激光通孔(15)用激光索引修正引入层,其特征在于,所述部件具有接触垫的再布线的方法,包括 以下步骤:封闭每个激光通孔的单独局部施加外层(16)的装置; 产生所述覆盖层(16)延伸的重新布线之间的局部; 本地覆盖层的去除(16); 进行打开激光通孔的激光诱导的校正。

    6.
    发明专利
    未知

    公开(公告)号:DE10202881B4

    公开(公告)日:2007-09-20

    申请号:DE10202881

    申请日:2002-01-25

    Abstract: The present invention provides a method of producing semiconductor chips (1a, 1b, 1c; 1a', 1b', 1c') with a protective chip-edge layer (21'', 22''), in particular for wafer level packaging chips, with the steps of: preparing a semiconductor wafer (1); providing trenches (21, 22) in the semiconductor wafer to establish chip edges on a first side of the semiconductor wafer (1); filling the trenches (21, 22) with a protective agent (21'; 22'); grinding back the semiconductor wafer (1) from a second side of the semiconductor wafer (1), which is opposite from the first side, to expose the trenches (21, 22) filled with the protective agent (21'; 22'); and cutting through the trenches (21, 22) filled with the protective agent (21'; 22'), so that the protective chip-edge layer (21'', 22'') comprising the protective agent (21', 22') remains on the chip edges.

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