Abstract:
PROBLEM TO BE SOLVED: To provide a method for forming an integrated circuit with a re-wiring element. SOLUTION: The integrated circuit (23) is formed in a process preparing a carrier element (10) to which demarcated slitting (11) is attached; a process in which the integrated circuit (14) is mounted on the carrier element (10) upside down, and the slitting (11) is located above at least one connecting element (15) of the integrated circuit (14); a process in which an insulated element (17) is mounted on the side which is not covered by the integrated circuit (14) of the carrier element (10), except the connecting element (15) in the slitting (11); a process which attaches the re-interconnect line element (18, 19) which is patterned to the insulated element (17); a process which attaches a solder resist element (20) which is patterned to the re-interconnect line element (18, 19) which is patterned; and a process, in which a solder bowl (22) is attached to the region (21) which is not covered by the solder resist element (20) in patterned form. COPYRIGHT: (C)2004,JPO&NCIPI
Abstract:
PROBLEM TO BE SOLVED: To provide a multichip module in which many of multilayer chips are interconnected with ease and with cost reduction. SOLUTION: This method comprises: a process of providing at least one contact bump 11 on a substrate 10; a process of applying rewiring elements 12 to the substrate 10 and the contact bump(s) 11, and of patterning for obtaining a contact element 13 (or contact elements 13); a process of providing semiconductor chips 15 on the substrate 10 which has electrical contact connection consisting of the rewiring elements 12; and a process of providing sealing elements 16 which exhibit no electrical conductivity on the semiconductor chips 15, the substrate 10, the rewiring elements 12, and the at lease one contact bump 11 so that one surface 16' makes contact with the contact element(s) 13. The first surface 16' of one sealing element 16 functions as a substrate. The rewiring elements 12 corresponding to the surface 16' are electrically connected to the contact element(s) 13 of the at least one contact bump 11 on the underlying flat surface. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
The invention relates to a method for producing an electronic component, especially a memory chip, using a laser-induced correction to equalise an integrated circuit by means of at least one laser via (15) in a layer at least partially covering the circuit. Said component comprises a rewiring of the contact pads. The inventive method comprises the following steps: each laser via is closed by means of a separate covering layer (16) which is to be applied locally; a rewiring extending between the local covering layers (16) is created; the local covering layers (16) are removed; and the laser-induced correction is carried out by means of the open laser vias.
Abstract:
The invention relates to a semiconductor module comprising a semiconductor device (10) provided with a contact device (11) for establishing an electrical contact with a connection device by means of a wiring device (15), and a carrier device (12, 13, 14) for mechanically coupling the semiconductor device (10) to a connection device, the carrier device (12, 13, 14) being inclined between a first elasticity module on the semiconductor device (10) and a second, higher elasticity module on the connection device. The invention also relates to a method for producing a semiconductor module.
Abstract:
The method involves immersing a transfer plate (10) in a material bath, in which a material is placed in a fluid condition, where the pressure acts at the bath and another pressure dominates in blind holes (100). A pressure difference is made between the pressures at the bath and in the holes, respectively, such that the holes are partially filled with the fluid material. The transfer plate is extracted from the bath. The transfer plate opposite to the target plate is positioned, where the material is casted out from the holes to contact with the target plate and to place at the target plate. An independent claim is also included for a device for executing a method for placing material.
Abstract:
The present invention provides a method of producing semiconductor chips (1a, 1b, 1c; 1a', 1b', 1c') with a protective chip-edge layer (21'', 22''), in particular for wafer level packaging chips, with the steps of: preparing a semiconductor wafer (1); providing trenches (21, 22) in the semiconductor wafer to establish chip edges on a first side of the semiconductor wafer (1); filling the trenches (21, 22) with a protective agent (21'; 22'); grinding back the semiconductor wafer (1) from a second side of the semiconductor wafer (1), which is opposite from the first side, to expose the trenches (21, 22) filled with the protective agent (21'; 22'); and cutting through the trenches (21, 22) filled with the protective agent (21'; 22'), so that the protective chip-edge layer (21'', 22'') comprising the protective agent (21', 22') remains on the chip edges.
Abstract:
Production of connecting regions of an integrated circuit (10) comprises applying a dielectric (12) on the circuit, applying an oxidizable and/or corrodable metallization (13, 14, 15) on the dielectric providing a contact with a contact unit (11) of the circuit, applying a protective unit (16) to prevent oxidation of the metallization underneath, and structuring the protective unit so that it is removed around the connecting regions. An Independent claim is also included for an integrated circuit containing the connecting regions.
Abstract:
Process for joining switching units arranged on a wafer comprises: applying the wafer on a film; cutting the film to divide the switching units without separating the film; stretching the film; and plugging the chambers between units. Process for joining switching units (101a-101n) arranged on a wafer (100) comprises: applying the wafer on film (102); cutting the film to divide switching units without separating the film; applying on a stretching device (103); stretching the film so that prescribed contacting distance is produced; and plugging the intermediate chambers between the switching units using casting composition (105) to produce modified wafer (101a).
Abstract:
The module has an inner semiconductor chip stack (2) that exhibits an upper semiconductor chip and a lower semiconductor chip (4). The lower semiconductor chip exhibits a back wiring structure on its back. The lower semiconductor chip is electrically connected with flip chip contacts of the upper semiconductor chip. The back wiring structure stands over bond connections with external contacts of wiring substrates that are connected. An independent claim is also included for a method for manufacturing a semiconductor module.