Three-state spintronic device, memory cell, memory array and read-write circuit

    公开(公告)号:US12293781B2

    公开(公告)日:2025-05-06

    申请号:US18261716

    申请日:2021-01-21

    Abstract: The three-state spintronic device includes: a bottom electrode, a magnetic tunnel junction and a top electrode from bottom to top. The magnetic tunnel junction includes: a spin-orbit coupling layer, a ferromagnetic free layer, a barrier tunneling layer, a ferromagnetic reference layer, three local magnetic domain wall pinning centers and domain wall nucleation centers. An antisymmetric exchange interaction is modulated, and the magnetic domain wall pinning centers are embedded in an interface between a heavy metal and the ferromagnetic free layer. The magnetic domain wall nucleation centers are at two ends of the ferromagnetic free layer. A current pulse flows through the spin-orbit coupling layer to generate a spin current and the spin current is injected into the ferromagnetic free layer. Under a control of all-electrical controlled, an effective field of a spin-orbit torque drives domain wall to move and displace.

    METHOD OF DESIGNING THIN FILM TRANSISTOR
    3.
    发明公开

    公开(公告)号:US20240005077A1

    公开(公告)日:2024-01-04

    申请号:US18250461

    申请日:2020-10-30

    CPC classification number: G06F30/39 G16C60/00 H01L29/786

    Abstract: A method of designing a thin film transistor device, including: calculating characteristic parameters of searched materials; screening the materials according to a characteristic parameter threshold to obtain first active layer materials; simulating the first active layer material as an active layer material in a thin film transistor device model to obtain a device characteristic of the thin film transistor device; screening the first active layer materials according to a device characteristic threshold to obtain second active layer materials; taking the second active layer material as the active layer material of the thin film transistor device to perform an experiment; and selecting another second active layer material to perform the experiment once again when an experiment result does not meet a preset requirement, and a design of the thin film transistor device is completed until the experiment result meets the preset requirement.

    Method for obtaining a contact resistance of a planar device

    公开(公告)号:US11215652B2

    公开(公告)日:2022-01-04

    申请号:US16065582

    申请日:2015-12-25

    Abstract: A method for obtaining a contact resistance of a planar device includes: obtaining a contact resistance of a planar device by using a potential measurement method, in the measurement of the surface potential distribution, the planar device is in a state of current flowing, a certain voltage drop is formed at a junction area of the device; extracting the voltage drop measured through the Kelvin microscope by using a linear fitting method; and dividing the measured voltage drop by the current flowing through the device, thereby accurately calculating the magnitude of the contact resistance at the junction area of the planar device. With the present invention, the contact resistance of the planar device can be precisely measured, which is suitable for the contact resistance measurement experiments of devices such as thin film transistors and diodes. The invention has the advantages of reasonable theory, accurate result, simple and easy operation, and is favorable for optimizing the device performance and establishing a complete electrical model of the device.

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