公开(公告)号：AU9593601A

公开(公告)日：2002-04-29

申请号：AU9593601

申请日：2001-10-16

Applicant: JSR CORP

Inventor： SHIHO HIROSHI ,  KATO HITOSHI ,  MATSUKI YASUO ,  EBATA SATOSHI ,  MARUYAMA YOICHIRO ,  YOKOYAMA YASUAKI

IPC: C07F15/00 ,  C07C13/263 ,  C07C49/92 ,  C07C69/72 ,  C07C53/02 ,  C07C53/08 ,  C07C53/126 ,  C07C55/06 ,  C23C18/08

Abstract: A composition capable of forming a metal ruthenium film and a ruthenium oxide film by a simple application/baking process, a process for forming a metal ruthenium film and a ruthenium oxide film from the composition, a metal ruthenium film and a ruthenium oxide film formed by the process, and electrodes formed of the films.A solution composition comprising a specific ruthenium complex. The coating film of this solution composition is heated in an atmosphere containing no oxygen or an atmosphere containing oxygen to form a metal ruthenium film or a ruthenium oxide film, respectively, and electrodes formed of the films.

公开(公告)号：DE60234409D1

公开(公告)日：2009-12-31

申请号：DE60234409

申请日：2002-06-28

Applicant: JSR CORP

Inventor： EBATA SATOSHI ,  YONEDA EIJI ,  NAGAI TOMOKI ,  TONERI TATSUYA ,  WANG YONG ,  IWASAWA HARUO ,  NISHIMURA YUKIO

IPC: C07C309/19 ,  C07C25/00 ,  C07C309/17 ,  C07C309/23 ,  C07C381/12 ,  C07D209/48 ,  C07D333/46 ,  C07D333/78 ,  C07D335/02 ,  C07D347/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: A novel photoacid generator containg a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt% or less, a nitro group, a cyano group, or a hydrogen atom, and Z and Z are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

公开(公告)号：DE60128611T2

公开(公告)日：2008-01-31

申请号：DE60128611

申请日：2001-03-12

Applicant: JSR CORP

Inventor： MATSUKI YASUO ,  EBATA SATOSHI

IPC: C07F7/00 ,  C07F7/21 ,  C07F7/02 ,  C23C18/12 ,  H01L21/208

Abstract: Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiroÄ4.4Ünonasilane.

公开(公告)号：DE60128611D1

公开(公告)日：2007-07-12

申请号：DE60128611

申请日：2001-03-12

Applicant: JSR CORP

Inventor： MATSUKI YASUO ,  EBATA SATOSHI

IPC: C07F7/00 ,  C07F7/21 ,  C07F7/02 ,  C23C18/12 ,  H01L21/208

Abstract: Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiroÄ4.4Ünonasilane.

公开(公告)号：SG120873A1

公开(公告)日：2006-04-26

申请号：SG200203901

申请日：2002-06-28

Applicant: JSR CORP

Inventor： EBATA SATOSHI ,  YONEDA EIJI ,  NAGAI TOMOKI ,  TONERI TATSUYA ,  WANG YONG ,  IWASAWA HARUO ,  NISHIMURA YUKIO

IPC: C07C309/17 ,  C07C309/19 ,  C07C309/23 ,  C07C381/12 ,  C07D333/46 ,  C07D333/78 ,  C07D335/02 ,  C07D347/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C07C25/00 ,  C07D209/48

Abstract: A novel photoacid generator containg a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt% or less, a nitro group, a cyano group, or a hydrogen atom, and Z and Z are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

公开(公告)号：EP1586570A4

公开(公告)日：2007-06-20

申请号：EP04701104

申请日：2004-01-09

Applicant: JSR CORP

Inventor： MIYAMATSU TAKASHI ,  NIWATA HIROKAZU ,  EBATA SATOSHI ,  WANG YONG

IPC: C07D333/46 ,  C07D333/72 ,  C07D333/78 ,  G03F7/004 ,  G03F7/039 ,  C08L33/06

CPC classification number: C07D333/72 ,  C07D333/46 ,  C07D333/78 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/123

Abstract: Sulfonium salts which are excellent in transparency to rays having wavelengths of 220nm or below and can attain excellent performances in sensitivity, resolution, pattern shape, LER, storage stability, and so on when used as radiation-sensitive acid generator; and positive radiation-sensitive resin compositions containing the salts as the radiation-sensitive acid generator. The sulfonium salts are represented by the general formula (I): (I) [wherein R1 is halogeno, alkyl, alicyclic hydrocarbyl, alkoxyl, -OR3 (wherein R3 is alicyclic hydrocarbyl), or the like; R2 is (substituted) alkyl, or two or more R2s are united to form a ring structure; p is 0 to 7; q is 0 to 6; n is 0 to 3; and X- is a sulfonate anion]. The positive radiation-sensitive resin compositions comprise (A) radiation-sensitive acid generators consisting of the sulfonium salts and (B) resins having acid-dissociable groups.

公开(公告)号：EP1712572A4

公开(公告)日：2007-08-01

申请号：EP04819839

申请日：2004-11-30

Applicant: JSR CORP

Inventor： EBATA SATOSHI ,  KAIZU MICHITAKA ,  OSHIMA NOBORU

IPC: C08F4/70 ,  C08F32/00 ,  C08F2/38 ,  C08F232/08

CPC classification number: C08F32/00

Abstract: [MEANS FOR SOLVING PROBLEMS] There is provided a process for producing a cycloolefin addition polymer, characterized in that an addition polymerization of monomers containing a given cycloolefin compound is carried out in the presence of ethylene and a multicomponent catalyst, the multicomponent catalyst containing as essential components (a) palladium compound, (b) compound selected from among ionic boron compounds, ionic aluminum compounds and Lewis-acid aluminum and Lewis-acid boron compounds and (c) given phosphine compound or phosphonium salt thereof. [EFFECT] A cycloolefin addition polymer of a molecular weight range suitable for optical material sheets and films can be produced with the use of small amounts of molecular weight modifier and palladium catalyst by carrying out an addition polymerization of cycloolefin compound in the presence of given palladium catalyst and, as a molecular weight modifier, ethylene.

Abstract translation: [解决问题的手段]提供了一种生产环烯烃加成聚合物的方法，其特征在于含有给定环烯烃化合物的单体的加聚在乙烯和多组分催化剂存在下进行，该多组分催化剂含有作为基本成分 组分（a）钯化合物，（b）选自离子硼化合物，离子铝化合物和路易斯酸铝和路易斯酸硼化合物的化合物和（c）给定的膦化合物或其鏻盐。 [效果]通过使用少量分子量调节剂和钯催化剂，通过在给定的钯存在下进行环烯烃化合物的加成聚合，可以制备适用于光学材料片和薄膜的分子量范围的环烯烃加成聚合物 催化剂和作为分子量调节剂的乙烯。

公开(公告)号：EP1657259A4

公开(公告)日：2006-08-02

申请号：EP04771194

申请日：2004-08-04

Applicant: JSR CORP

Inventor： OSHIMA NOBORU ,  KAIZU MICHITAKA ,  EBATA SATOSHI ,  IMAMURA TAKASHI

IPC: C08F4/70 ,  C08F32/08 ,  C08F232/08

CPC classification number: C08F232/08 ,  C08F32/08

Abstract: A process for producing a cycloolefin addition polymer in which one or more cycloolefin monomers can be (co)polymerized by addition polymerization with a small palladium catalyst amount to produce a cycloolefin addition (co)polymer while attaining high catalytic activity. The process for cycloolefin addition polymer production is characterized by addition-polymerizing one or more cycloolefin monomers comprising a cycloolefin compound represented by a specific formula in the presence of a multi-component catalyst comprising (a) a palladium compound and (b) a specific phosphorus compound.

Abstract translation: 一种生产环烯烃加成聚合物的方法，其中一种或多种环烯烃单体可以通过加入少量钯催化剂量进行加成聚合（共）聚合，生成环烯烃加成（共）聚合物，同时获得高催化活性。 制备环烯烃加成聚合物的方法的特征在于在多组分催化剂的存在下，将包含由特定分子式表示的环烯烃化合物的一种或多种环烯烃单体加成聚合，所述多组分催化剂包含（a）钯化合物和（b） 复合。

公开(公告)号：EP1600437A4

公开(公告)日：2006-07-26

申请号：EP04713184

申请日：2004-02-20

Applicant: JSR CORP

Inventor： EBATA SATOSHI ,  WANG YONG ,  NISHIMURA ISAO

IPC: C07C309/17 ,  C07C309/19 ,  C07C309/23 ,  C07C381/12 ,  C07D207/46 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  C08K5/41 ,  C08L101/12

CPC classification number: C07C309/19 ,  C07C309/17 ,  C07C309/23 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/86 ,  C07D207/46 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/126

Abstract: The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R to R are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

Abstract translation: 本发明提供了新颖的酸产生剂，其在人体内的燃烧性和积聚性方面是无问题的，并且可产生具有高酸度和高沸点的酸，并且在抗蚀剂涂膜中表现出适当短的扩散长度，并且允许形成具有优异光滑性的抗蚀剂图案 依赖于掩模图案的密度; 酸产生器产生的磺酸; 用于合成酸发生剂的原料的磺酰卤; 和含有酸发生剂的辐射敏感性树脂组合物。 酸产生剂具有由通式（I）表示的结构，其中R 1是烷氧基羰基，烷基磺酰基或烷氧基磺酰基等一价取代基; R 2至R 4各自为氢或烷基; k为0以上的整数; 并且n为0〜5的整数。在这些辐射敏感性树脂组合物中，除了上述酸产生剂之外，阳性物质含有具有酸解离基团的树脂，负极材料含有碱溶性树脂和交联 除酸产生剂外还可加入。