公开(公告)号：EP2325695A4

公开(公告)日：2012-04-04

申请号：EP09813111

申请日：2009-09-10

Applicant: JSR CORP

Inventor： EBATA TAKUMA ,  NAKAGAWA HIROKI ,  MATSUDA YASUHIKO ,  KASAHARA KAZUKI ,  HOSHIKO KENJI ,  NAKASHIMA HIROMITSU ,  IKEDA NORIHIKO ,  SAKAI KAORI ,  HARADA SAKI

IPC: G03F7/039 ,  C08F20/26 ,  C08F20/28 ,  G03F7/004

CPC classification number: C08F20/28 ,  C08F220/18 ,  C08F220/28 ,  G03F7/0397 ,  G03F7/2041

Abstract: A radiation-sensitive resin composition includes (A) a polymer, (B) a photoacid generator, (C) an acid diffusion controller, and (D) a solvent, the polymer (A) including a repeating unit (a-1) shown by the following general formula (a-1), and the acid diffusion controller (C) including at least one base selected from (C-1) a base shown by the following general formula (C-1) and (C-2) a photodegradable base. wherein R 1 individually represent a hydrogen atom or the like, R represents a monovalent group shown by the above general formula (a'), R 19 represents a chain-like hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain-like hydrocarbon group having 1 to 30 carbon atoms or the like, m and n are integers from 0 to 3 (m+n=1 to 3), and R 2 and R 3 individually represent a monovalent chain-like hydrocarbon group having 1 to 20 carbon atoms or the like, provided that the two R 2 may bond to form a ring structure.

公开(公告)号：EP2131240A4

公开(公告)日：2011-01-05

申请号：EP08722276

申请日：2008-03-17

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  SAKAI KAORI ,  MATSUMURA NOBUJI ,  SUGIURA MAKOTO ,  NAKAMURA ATSUSHI ,  WAKAMATSU GOUJI ,  ANNO YUUSUKE

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/0035 ,  G03F7/0397 ,  G03F7/2024 ,  G03F7/2041 ,  G03F7/40

公开(公告)号：JP2013190499A

公开(公告)日：2013-09-26

申请号：JP2012055176

申请日：2012-03-12

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SAKAI KAORI ,  IKEDA NORIHIKO ,  OSAKI HITOMI

IPC: G03F7/039 ,  C08F24/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition allowing formation of a resist pattern excellent in LWR performance and MEEF performance.SOLUTION: A photoresist composition contains [A] a polymer having a structural unit (I) represented by Formula (1) and [B] an acid generator. The [A] polymer preferably has further a structural unit (II) represented by Formula (2). In Formula (2), R, Rand Ris an alkyl group having a carbon number of 1 to 4 or a monovalent alicyclic group having a carbon number of 4 to 20.

Abstract translation: 要解决的问题：提供能够形成LWR性能和MEEF性能优异的抗蚀剂图案的光致抗蚀剂组合物。光致抗蚀剂组合物含有[A]具有由式（1）表示的结构单元（I）和[ B]酸发生器。 [A]聚合物优选还具有由式（2）表示的结构单元（II）。 式（2）中，R，R R为碳数为1〜4的烷基或碳数为4〜20的1价脂环族基。

公开(公告)号：JP2010126696A

公开(公告)日：2010-06-10

申请号：JP2008305615

申请日：2008-11-28

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  MATSUDA YASUHIKO ,  SAKAI KAORI ,  SUGIURA MAKOTO

IPC: C08F220/28 ,  C08F220/38 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition useful as a chemically amplified resist satisfying excellent resolution, small LWR (Line Width Roughness), excellent pattern collapse resistance and excellent in non-defectiveness, and to provide a polymer usable as a resin component in the radiation-sensitive resin composition. SOLUTION: The radiation-sensitive resin composition includes a resin (A) and a radiation-sensitive acid generator (B). The resin (A) is a polymer including a specific repeating unit (a-1) derived from a (meth)acrylic ester substituted by an oxyalkylene group having norbornane lactone at a terminal, a specific repeating unit (a-2) derived from a (meth)acrylic ester having a sulfonamide group, and a repeating unit (a-3) having an acid dissociable group. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供可用作满足优异分辨率，小LWR（线宽粗糙度），优异的图案抗塌陷性和优异的非缺陷性的化学放大抗蚀剂的辐射敏感性树脂组合物，并提供聚合物 可用作辐射敏感性树脂组合物中的树脂组分。 解决方案：辐射敏感性树脂组合物包括树脂（A）和辐射敏感性酸产生剂（B）。 树脂（A）是包含由末端具有降冰片烷内酯的氧化烯基取代的（甲基）丙烯酸酯衍生的特定重复单元（a-1）的聚合物，来源于 具有磺酰胺基的（甲基）丙烯酸酯和具有酸解离基团的重复单元（a-3）。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010126581A

公开(公告)日：2010-06-10

申请号：JP2008300971

申请日：2008-11-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  MATSUDA YASUHIKO ,  SAKAI KAORI ,  SUGIURA MAKOTO

IPC: C08F20/28 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin and a radiation-sensitive resin composition satisfying excellent resolution, small LWR (Line Width Roughness), good PEB (Post Exposure Bake) temperature dependency, excellent pattern collapse resistance and low defectiveness, that is, excellent in non-defectiveness. SOLUTION: The resin is a copolymer resin (A) of a (meth)acrylic ester of an alcohol having a heterocycle in which a norbornane ring and a lactone ring are condensed and a (meth)acrylic ester of an alcohol having a cyclopentane ring. The radiation-sensitive resin composition includes the resin and a radiation-sensitive acid generator (B). COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供满足优异分辨率，小LWR（线宽粗糙度），良好的PEB（曝光后烘烤）温度依赖性，优异的图案抗塌陷性和低的耐辐射敏感性树脂组合物 缺陷性，即非缺陷性优异。 解决方案：树脂是具有其中降冰片烷环和内酯环缩合的杂环的醇的（甲基）丙烯酸酯的共聚物树脂（A）和具有下式的醇的（甲基）丙烯酸酯： 环戊烷环。 辐射敏感性树脂组合物包括树脂和辐射敏感性酸产生剂（B）。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008191341A

公开(公告)日：2008-08-21

申请号：JP2007024778

申请日：2007-02-02

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  MATSUMURA SHINJI ,  SAKAI KAORI

IPC: G03F7/40 ,  C08F20/30 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming method which can form a pattern on a second layer by exposing while maintaining the pattern formed on a first layer by inactivating it for preventing it from becoming alkali soluble due to photosensing at the second exposing in a double exposing pattern formation. SOLUTION: This pattern forming method has a step of forming a first resist layer on the substrate by using a resin composition for the first resist layer and forming a first resist pattern by radiating a radioactive ray on its required area of the first resist layer to expose and develop, a step of inactivating the first resist pattern to light, a step of forming a second resist layer on the substrate which has the first resist pattern by using a resin composition for the second resist layer and radiating a radioactive ray on its required area to expose, and a step of forming a second resist pattern by developing in the space of the first resist pattern. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种图案形成方法，其可以通过曝光同时保持形成在第一层上的图案而在第二层上形成图案，通过使其失活，以防止其由于在第二层的光敏而变得碱溶性 以双曝光图案形成曝光。 解决方案：该图案形成方法具有通过使用第一抗蚀剂层的树脂组合物在基板上形成第一抗蚀剂层并通过在第一抗蚀剂的所需区域上放射线来形成第一抗蚀剂图案的步骤 层，使第一抗蚀剂图形灭光的步骤，通过使用第二抗蚀剂层的树脂组合物在第一抗蚀剂图案的基板上形成第二抗蚀剂层并将放射线放射的步骤 其所需的曝光区域，以及通过在第一抗蚀剂图案的空间中显影而形成第二抗蚀剂图案的步骤。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011007876A

公开(公告)日：2011-01-13

申请号：JP2009149002

申请日：2009-06-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KUSAKAI KAZUNORI ,  KAWAKAMI MINEKI ,  OIZUMI YOSHIJI ,  NARUOKA TAKEHIKO ,  SAKAI KAORI ,  ASANO YUSUKE ,  KASAHARA KAZUKI

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is a material of a resist film that obtains a good pattern shape, has excellent depth of focus, prevents elution into a liquid for liquid immersion exposure, such as water, ensures a large receding contact angle to the liquid for liquid immersion exposure, and prevents development defects, and to provide a polymer to be used as a resin component of the radiation-sensitive resin composition, and a resist pattern forming method using the radiation-sensitive resin composition.SOLUTION: In the invention, a plurality of fluorine atom-containing polymers are used at the same time. The radiation-sensitive resin composition comprises a fluorine atom-containing polymer (A1) which, under the following conditions, dissolves in a 2.38% aqueous solution of tetramethylammonium hydroxide at 23°C at a dissolution rate of

Abstract translation: 要解决的问题：为了提供作为获得良好图案形状的抗蚀剂膜的材料的放射线敏感性树脂组合物，具有优异的聚焦深度，防止液体如液体浸泡的液体洗脱，例如水，确保了 与液体暴露的液体大的后退接触角，并且防止显影缺陷，并且提供用作该辐射敏感性树脂组合物的树脂组分的聚合物，以及使用该辐射敏感性树脂组合物的抗蚀剂图案形成方法 解决方案：在本发明中，同时使用多个含氟原子的聚合物。 该辐射敏感性树脂组合物包含含氟原子的聚合物（A1），其在以下条件下在23℃溶解速率<10nm / s的2.38％氢氧化四甲基铵水溶液中溶解; 在以下条件下，溶解速率≥10nm/ s，在23℃下在2.38％氢氧化四甲基铵水溶液中溶解的含氟原子的聚合物（A2） 具有酸解离性官能团的聚合物（B），其在酸解离性官能团解离时，通过酸的作用解离而变得碱溶性; 和辐射敏感性酸产生剂（C）。 [条件]将含氟聚合物在4-甲基-2-戊醇（固体浓度：11重量％）中的溶液旋涂在基材上，并在90℃×60秒的条件下进行烘烤以形成 具有膜厚度为300nm的涂膜。

公开(公告)号：JP2010271686A

公开(公告)日：2010-12-02

申请号：JP2009215636

申请日：2009-09-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： FUJISAWA TOMOHISA ,  MATSUDA YASUHIKO ,  HAMA YUKARI ,  SAKAI KAORI ,  KAWAKAMI MINEKI ,  NISHIMURA YUKIO ,  SAKAKIBARA HIROKAZU ,  MATSUMURA SHINJI ,  NAKAGAWA DAIKI

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F220/28 ,  G03F7/0045 ,  G03F7/0397

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is a material for resists having excellent resolution, etc. SOLUTION: The radiation-sensitive resin composition comprises (A) a compound represented by general formula (1): X + Z - (X + is a cation represented by general formula (1-1) or (1-2), and Z - is an anion such as OH - ), (B) a resin comprising repeating units represented by general formula (2) and repeating units represented by general formula (3), and (C) a radiation-sensitive acid generator. In the general formulae (1-1), (1-2), (2) and (3), R 2 -R 7 are H or the like; R 8 is an alicyclic hydrocarbon group or the like; A is a single bond or the like; and R 9 is a monovalent organic group. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 解决方案：辐射敏感性树脂组合物包含（A）由通式（I）表示的化合物 1）：X + Z - （X + 是由通式（1-1）或（1-2）表示的阳离子， （B）包含由通式（2）表示的重复单元和由通式（3）表示的重复单元的树脂， ），（C）辐射敏感性酸产生剂。 在通式（1-1），（1-2），（2）和（3）中，R 2是H等等; R 8是脂环族烃基等; A是单键等; R＆lt; SP＆gt; 9＆lt; SP＆gt;是单价有机基团。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010160346A

公开(公告)日：2010-07-22

申请号：JP2009002730

申请日：2009-01-08

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAKAJIMA HIROMITSU ,  IKEDA NORIHIKO ,  SAKAI KAORI ,  HARADA SAKI

IPC: G03F7/039 ,  C08F220/12 ,  C08F220/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has a large depth of focus and ensures small LWR and MEEF, excellent pattern collapse resistance and excellent development defect control property.
SOLUTION: The radiation-sensitive resin composition includes: a polymer (A) having one or more repeating units represented by general formulae (1) and (2) and one or more repeating units (3) having a carbonate structure; and a radiation-sensitive acid generator (B).
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有大的聚焦深度并且确保小的LWR和MEEF的良好的抗折叠性和优异的显影缺陷控制性的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包括：具有一个或多个由通式（1）和（2）表示的重复单元的聚合物（A）和具有碳酸酯结构的一个或多个重复单元（3） 和辐射敏感酸产生剂（B）。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010152349A

公开(公告)日：2010-07-08

申请号：JP2009269020

申请日：2009-11-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  MATSUDA YASUHIKO ,  SAKAI KAORI ,  SUGIURA MAKOTO

IPC: G03F7/039 ,  C08F220/16 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition which has excellent resolution performance, a low LWR (Line Width Roughness), excellent pattern collapse resistance and excellent defectiveness. SOLUTION: In the radiation-sensitive resin composition including a resin (A) and a radiation-sensitive acid generator (B), the resin (A) is a polymer including a (meth)acrylate unit (a-1) having, at its side chain, a norbornyl lactone group bonded to a 1-12C alkylene group or alicyclic alkylene group, a (meth)acrylate unit (a-2) having, at its side chain, a methylene group having a hydrogen atom, a hydroxyl group, or an acyl group at its terminal and a repeating unit (a-3) having an acid-dissociable group. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有优异的分辨率性能，低LWR（线宽粗糙度），优异的图案抗塌陷性和优异的缺陷性的辐射敏感性树脂组合物。 解决方案：在包含树脂（A）和辐射敏感性酸产生剂（B）的辐射敏感性树脂组合物中，树脂（A）是包含具有（甲基）丙烯酸酯单元（a-1） 在侧链上具有与1-12C亚烷基或脂环族亚烷基结合的降冰片基内酯基，在其侧链具有氢原子的亚甲基的（甲基）丙烯酸酯单元（a-2）， 羟基或其末端的酰基和具有酸解离基团的重复单元（a-3）。 版权所有（C）2010，JPO＆INPIT