公开(公告)号：WO2013003371A3

公开(公告)日：2013-02-28

申请号：PCT/US2012044244

申请日：2012-06-26

Applicant: KLA TENCOR CORP ,  SHADMAN KHASHAYAR ,  HAYNES ROBERT G ,  SEARS CHRISTOPHER M ,  NASSER-GHODSI MEHRAN

Inventor： SHADMAN KHASHAYAR ,  HAYNES ROBERT G ,  SEARS CHRISTOPHER M ,  NASSER-GHODSI MEHRAN

IPC: H01J37/06 ,  H01J37/10

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/093 ,  H01J37/14 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/2817

Abstract: One embodiment disclosed relates an apparatus which includes an electromagnet arranged to provide a large-scale magnetic field in a region. The apparatus further includes an array of multiple electron beam columns formed in the region using an array of bores through magnetic material. Another embodiment relates to a method of generating an array of electron beams. A large-scale magnetic field is generated in a region using at least two magnetic poles. The array of electron beams is generated using an array of columns formed using bores through a magnetic material positioned in the region. Other embodiments, aspects and features are also disclosed.

Abstract translation: 所公开的一个实施例涉及一种装置，其包括布置成在区域中提供大规模磁场的电磁体。 该设备还包括使用穿过磁性材料的孔阵列在该区域中形成的多个电子束柱的阵列。 另一个实施例涉及一种产生电子束阵列的方法。 使用至少两个磁极的区域中产生大规模磁场。 电子束阵列是使用通过位于该区域中的磁性材料的孔形成的列阵列产生的。 其他实施例，方面和特征也被公开。

公开(公告)号：EP2847781A4

公开(公告)日：2015-12-09

申请号：EP13788136

申请日：2013-05-07

Applicant: KLA TENCOR CORP

Inventor： NASSER-GHODSI MEHRAN ,  PLETTNER TOMAS ,  HAYNES ROBERT G ,  SEARS CHRISTOPHER MALCOLM STANLEY

IPC: H01J3/02 ,  H01J37/065 ,  H01J37/28

CPC classification number: H01J37/04 ,  H01J3/027 ,  H01J3/029 ,  H01J27/024 ,  H01J37/063 ,  H01J37/065 ,  H01J37/28 ,  H01J2237/06375

Abstract: One embodiment disclosed relates to an electron source for generating an electron beam. The electron source includes an electron emitter having a tip from which an electron beam is extracted. The electron further includes a non-planar extractor with an extractor opening and a built-in beam-limiting aperture. The extractor opening is larger than the beam-limiting aperture, and central axes of both the extractor opening and the beam-limiting aperture are aligned with the tip along a beam axis. Another embodiment relates to a method of generating an electron beam using an electron source having a non-planar extractor. Another embodiment relates to an array of electron sources for generating an array of electron beams. The array of electron sources includes an array of electron emitters and an array of non-planar extractor structures. Other embodiments, aspects and features are also disclosed.

公开(公告)号：EP2727129A4

公开(公告)日：2015-04-01

申请号：EP12804024

申请日：2012-06-26

Applicant: KLA TENCOR CORP

Inventor： SHADMAN KHASHAYAR ,  HAYNES ROBERT G ,  SEARS CHRISTOPHER M ,  NASSER-GHODSI MEHRAN

IPC: H01J37/06 ,  H01J37/10 ,  H01J37/14 ,  H01J37/30

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/093 ,  H01J37/14 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/2817