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    System and method for inspecting semiconductor wafers
    2.
    发明专利
    System and method for inspecting semiconductor wafers 有权
    用于检查半导体波形的系统和方法

    公开(公告)号：JP2010249833A

    公开(公告)日：2010-11-04

    申请号：JP2010131351

    申请日：2010-06-08

    Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー コーポレイション

    Inventor： ROSENGAUS ELIEZER ,  LANGE STEVEN R

    IPC: G01B11/30 ,  G01N21/956 ,  G01N21/95 ,  G06T1/00 ,  H01L21/66 ,  H01L21/677

    CPC classification number: G01N21/95623 ,  G01N21/9501 ,  G01N2021/8822 ,  H01L21/67155

    Abstract: PROBLEM TO BE SOLVED: To enable high-speed inspection of semiconductor wafers. SOLUTION: A plurality of independent, low cost, optical-inspection subsystems 30 are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer 20. The wafer location relative to the inspection is controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtering. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer 50 to aid in statistical process control, particularly for manufacturing equipment. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了能够高速检查半导体晶片。 解决方案：多个独立的，低成本的光学检查子系统30被封装和集成，以同时对晶片20的部分进行并行检查。控制相对于检查的晶片位置，使得整个晶片被成像 通过光学子系统的系统以光栅扫描模式。 单色相干光源照亮晶片表面。 暗场光学系统收集散射光，并使用傅立叶滤波对由有效的周期性晶片结构产生的滤波图案进行滤波。 滤波后的光由通用数字信号处理器处理。 图像减法方法用于检测晶片缺陷，其报告给主计算机50，以帮助统计过程控制，特别是用于制造设备。 版权所有（C）2011，JPO＆INPIT

    Systems and methods for creating persistent data for wafer and for using persistent data for inspection-related functions
    3.
    发明专利
    Systems and methods for creating persistent data for wafer and for using persistent data for inspection-related functions 有权
    用于创建用于波形的持续数据和使用用于检查相关功能的持续数据的系统和方法

    公开(公告)号：JP2014195090A

    公开(公告)日：2014-10-09

    申请号：JP2014094395

    申请日：2014-05-01

    Applicant: Kla-Tencor Corp ,  ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation

    Inventor： BHASKAR KRIS ,  CHETANA BHASKAR ,  ASHOK KULKARNI ,  ROSENGAUS ELIEZER ,  CECILIA CAMPOCHIARO ,  MAHER CHRIS ,  BRIAN DUFFY ,  ANEESH KHULLAR ,  ALPA KOHLI ,  LALITA BALASUBRAMANIAN ,  SANTOSH BHATTACHARYYA ,  MAHADEVAN MOHAN

    IPC: H01L21/66 ,  H01L21/02

    CPC classification number: G06T7/001 ,  G06T1/20 ,  G06T2207/30148

    Abstract: PROBLEM TO BE SOLVED: To provide various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions.SOLUTION: One system includes a set of processor nodes 20 coupled to a detector 10 of an inspection system. Each of the processor nodes 20 is configured to receive a portion of image data generated by the detector 10 during scanning of a wafer 12. The system also includes an array 22 of storage media separately coupled to each of the processor nodes 20. The processor nodes 20 are configured to send all of the image data or a selected portion of the image data received by the processor nodes 20 to the arrays 22 of storage media such that all of the image data or the selected portion of the image data generated by the detector 10 during the scanning of the wafer 12 is stored in the arrays 22 of the storage media.

    Abstract translation: 要解决的问题：提供用于为晶片创建持久数据并使用持久数据进行检查相关功能的各种系统和方法。解决方案：一个系统包括耦合到检查系统的检测器10的一组处理器节点20。 每个处理器节点20被配置为在晶片12的扫描期间接收由检测器10生成的图像数据的一部分。该系统还包括分别耦合到每个处理器节点20的存储介质的阵列22.处理器节点 20被配置为将由处理器节点20接收的图像数据的所有图像数据或所选部分发送到存储介质的阵列22，使得由检测器生成的图像数据或图像数据的所选部分 在晶片12的扫描期间，10被存储在存储介质的阵列22中。

    A system and method for inspecting semiconductor wafers
    5.
    发明专利
    A system and method for inspecting semiconductor wafers 未知

    公开(公告)号：AU3875899A

    公开(公告)日：1999-11-16

    申请号：AU3875899

    申请日：1999-04-30

    Applicant: KLA TENCOR CORP

    Inventor： ROSENGAUS ELIEZER ,  LANGE STEVEN R

    IPC: G01B11/30 ,  G01N21/95 ,  G01N21/956 ,  G06T1/00 ,  H01L21/66 ,  H01L21/677 ,  G01N21/89

    Abstract: A method for inspecting semiconductor wafers is provided in which a plurality of independent, low-cost, optical-inspection subsystems are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer, the wafer location relative to the inspection being controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtered. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer to aid in statistical process control, particularly for manufacturing equipment.

    A SYSTEM AND METHOD FOR INSPECTING SEMICONDUCTOR WAFERS
    7.
    发明公开
    A SYSTEM AND METHOD FOR INSPECTING SEMICONDUCTOR WAFERS 有权
    VORRICHTUNG UND VERFAHREN ZUMPRÜFENVON HALBLEITERSCHEIBEN

    公开(公告)号：EP1075652A4

    公开(公告)日：2007-06-06

    申请号：EP99921584

    申请日：1999-04-30

    Applicant: KLA TENCOR CORP

    Inventor： ROSENGAUS ELIEZER ,  LANGE STEVEN R

    IPC: G01B11/30 ,  G01N21/95 ,  G01N21/956 ,  G06T1/00 ,  H01L21/66 ,  H01L21/677 ,  G01N21/89

    CPC classification number: G01N21/95623 ,  G01N21/9501 ,  G01N2021/8822 ,  H01L21/67155

    Abstract: A method for inspecting semiconductor wafers is provided in which a plurality of independent, low cost, optical-inspection subsystems (30) are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer (20), the wafer location relative to the inspection being controlled so that the entire wafer (20) is imaged by the system of optical subsystems (30) in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtering. The filtered light is processed by general purpose digital-signal processors (19). Image subtraction methods are used to detect wafer defects, which are reported to a main computer (50) to aid in statistical process control, particularly for manufacturing equipment.

    Abstract translation: 提供了一种用于检查半导体晶片的方法，其中多个独立的低成本光学检查子系统（30）被封装和集成以同时执行晶片（20）的部分的平行检查，相对于检查的晶片位置 被控制为使得整个晶片（20）由光学子系统（30）的系统以光栅扫描模式成像。 单色相干光源照射晶圆表面。 暗场光学系统使用傅里叶滤波来收集散射光并过滤由有效的周期性晶片结构产生的图案。 滤波后的光由通用数字信号处理器（19）处理。 图像减法方法被用于检测晶片缺陷，其被报告给主计算机（50）以辅助统计过程控制，特别是用于制造设备。

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