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公开(公告)号:JPH07115114A
公开(公告)日:1995-05-02
申请号:JP33175292
申请日:1992-12-11
Applicant: KOREA ELECTRONICS TELECOMM
Inventor: KIYOU SEISHIYUN , KIN HOYUU , BAI KAZUNARI
IPC: H01L21/66
Abstract: PURPOSE: To read out the value of an energy gap more simply in a short time, by passing the light source having a constant wavelength through a test piece, and utilizing the obtained characteristics of the transmitted spectrum with an image processing system. CONSTITUTION: The light having a constant wavelength band (λ) with an energy gap(Eg) as the center is irradiated on a test piece. After the transmission function of λ=f(x) is obtained with an optical filter 5, the image is formed. The live image plane from an image input device 6 is stored in the frame memory of an image-signal processor 7. Then, scanning is performed along the side (x) for the image on a monitor. The scanned pixel value (x) and the Eg pixel value Xgap are compared. At the place where both values agree, the (x) coordinates of the pixel are read, and the λ gap is obtained from the algorithm of λ=f(x). Then, the relationship of gap (eV)=1.239/λ gap (μm) is used, and the value is converted into [eV] unit of the gap, and Eg is obtained.
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公开(公告)号:JPH0620908A
公开(公告)日:1994-01-28
申请号:JP34484891
申请日:1991-12-26
Applicant: KOREA ELECTRONICS TELECOMM
Inventor: RI SHIYOUGEN , KIN JIYUNTAI , KIN HOYUU
IPC: B23Q1/00 , B23Q1/34 , B23Q1/36 , B23Q5/22 , B23Q5/28 , B23Q5/34 , G03F7/20 , G03F7/22 , H01L21/027 , H01L21/30 , H01L21/68 , H01L41/09 , B23Q1/02
Abstract: PURPOSE: To eliminate measurement errors generated by an increase in height with changing displacement in a vertical direction by performing rotation in the vertical direction with the expansion displacement of an expansion part, enlarging the displacement and providing upper/lower direction and tilt driving device provided with a driving part for performing driving, linked with the rotation operation of a displacement-enlarging piece. CONSTITUTION: A roller 22 for upper/lower direction and tilt-driving transmits the enlarged displacement of an actuator to a vacuum chuck 6 in the vertical direction. Thus, it is turned to a driving point for the upper/lower direction and tilt driving device (A). Also, it is utilized as a guiding element for the rotation direction 27 of the roller for the upper/lower direction and tilt driving, and a roller supporting base 24 causes rotation movement along the structure of a circular V-groove 28. That is, the roller 22 for the upper/lower direction and tilt is rotated along the structure of the circular V-groove 28, and the rotation in a horizontal direction is enabled, without generating the displacement of the upper/lower direction and tilt.
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公开(公告)号:JPH07202349A
公开(公告)日:1995-08-04
申请号:JP30959694
申请日:1994-11-18
Applicant: KOREA ELECTRONICS TELECOMM
Inventor: RI KAIKEN , RI SAICHIN , KIN HOYUU
IPC: H01L33/06 , H01L33/20 , H01L33/30 , H01L33/36 , H01S5/00 , H01S5/20 , H01S5/34 , H01S5/343 , H01S3/18 , H01L33/00
Abstract: PURPOSE: To easily manufacture quantum wire laser diode by utilizing a molecular beam diffraction due to the shadow mask of a fine beam by MBE method. CONSTITUTION: On a GaAs substrate 1, an n -GaAs layer 2, an n -AlGaAs layers 3, an n -AlGaAs layers 4 are grown sequentially. Then, on the n -AlGaAs layers 4, a quantum wire structure is formed by utilizing a molecular beam diffraction. The distance between a shadow diffraction mask 6, which is used for that and a surface where a quantum wire 8, is generated is adjusted, and an i-AlAs layer 5 is grown with only AlAs for a mask to be the shadow diffraction mask 6 as a selective etching layer, and over it, the i-GaAs layer 6 which is to be a shadow diffraction mask is grown. For the i-GaAs layer 6 to be a diffraction mask, a photoresist layer 7 is coated on the i-GaAs layer 6. Thus, a quantum wire layer diode is manufacture easily.
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公开(公告)号:JPH07201734A
公开(公告)日:1995-08-04
申请号:JP28490994
申请日:1994-11-18
Applicant: KOREA ELECTRONICS TELECOMM
Inventor: RI SHIYOUSHIYOU , IN ZENJIN , KIN HOYUU , KIYOU SOUGEN
IPC: B82Y10/00 , B82Y40/00 , H01L21/20 , H01L21/203
Abstract: PURPOSE: To provide a stainless, no-potential heterojunction thin film by remov ing an oxide film and a different kind of thin film from a V-groove part by using a selective dry etching method and then removing the remaining film of oxide. CONSTITUTION: On the surface of a single-crystal thin film 1, a pattern is formed which includes lines repeated at specific intervals. Then etching is carried out to form grooves (V-grooves), which are repeated at intervals corresponding to the line pattern and is sectioned into a V-shape on the surface of the single- crystal thin film 1. On this surface, a different kind of thin film 2 in a V-groove pattern, having a grating mismatched with the thin film 1 is grown. The majority or the whole of grating mismatching potential is locally distributed because of the presence of the V-grooves. On the different kind of thin film 2, an oxide film 3 is vapor-deposited. Then the oxide film 3 and the different kind of thin film 2 at the V-groove part where the potentials are locally distributed are removed, and furthermore the oxide film 3 is removed.
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