Abstract:
A method for manufacturing a nano gap electrode and a nano gap device manufactured by using the same are provided to manufacture uniform and reproductive nano gap electrodes by controlling the density and the reactive time of a reaction material. A method for manufacturing a nano gap electrode is characterized by dipping a substrate(1) having metal patterns(2) into a solution containing metal ions. And a reduced metal is grown on a surface of the metal pattern by a reducing agent included in the solution.
Abstract:
A bio-sensor is provided to detect the existence and the concentration of various bio-materials such as genes and proteins to be measured efficiently and electrically. A bio-sensor in which a plurality of interdigitated electrode sensor units, each of which is independently operated, is integrated in a substrate comprises a first and a second electrodes formed to be spaced apart from one another with a multi-line shape and a biomolecule receptor fixed on a sensor which is fixed on the substrate exposed between the first and second electrodes and specifically bound to biomolecules, and is characterized in that the biomolecule is analyzed by the number of the multi-line electrode sensor units electrically conducted by conductive particles directly bound to biomolecules captured by the biomolecule receptor or conductive particles bound to the biomolecules via the biomolecule receptor. A method for analyzing biomolecules comprises the steps of: (a) contacting a sample solution including the biomolecules to be measured with the bio-sensor to capture the biomolecules in the sensor-fixed biomolecule receptor fixed on the substrate exposed between the first and second electrodes of the multi-line electrode sensor units independently operated to one another; (b) contacting the biomolecules bound to the sensor-fixed biomolecules receptor with the particle fixed biomolecule receptor in which the conductive particles are fixed to bind the conductive particles to the biomolecules; (c) measuring the electric conductivity of the bio-sensor; and (d) converting the electric conductivity into the concentration of the biomolecules in the sample solution from the relation between the rate of the sensor showing the change of the electric conductivity before and after the sample solution contact and the concentration.
Abstract:
The present invention relates to gold nanoparticles which can be produced at low costs with high yields in large amounts by a liquid phase synthesis method and have a controlled size, as well as a synthesis method thereof. The inventive gold nanoparticles consist of gold nanoplates having a polygonal or circular plate structure.
Abstract:
The present invention relates to gold nanoparticles which can be produced at low costs with high yields in large amounts by a liquid phase synthesis method and have a controlled size, as well as a synthesis method thereof. The inventive gold nanoparticles consist of gold nanoplates having a polygonal or circular plate structure.
Abstract:
Provided is a nanogap device having metallic nanodots. To be specific, the nanogap device having a plurality of metallic nanodots performed by a heat-treatment process of the device having a large separation distance between electrodes formed by lithographic technology is provided for easy fabrication of a biosensor and a memory device having a superior performance. In particular, the nanogap device can be easily applied to the biosensor that has the high sensitivity in the detection of biomolecules and the suitability of statistical measurement method.
Abstract:
The present invention provides a semiconductor based photovoltaic device and a manufacturing method thereof. The semiconductor based photovoltaic device is able to absorb light with a wide band wavelength, and has high photoelectric conversion efficiency since it has high electron-hole pair separation efficiency. More specifically, the method for manufacturing the photovoltaic device comprises the steps of: a) forming a thin semiconductor quantum dot film on a p or n-type semiconductor substrate, wherein the thin semiconductor quantum dot film includes semiconductor quantum dots inside a medium at which the same type of impurities as the semiconductor substrate are doped; b) forming a pore array through partial etching, wherein the pore array penetrates the thin semiconductor quantum dot film; c) depositing a semiconductor in which complementary impurities to the semiconductor substrate are doped on the thin semiconductor quantum dot film at which the pore array is formed; and d) forming sequentially a transparent conductive film and an upper electrode on the semiconductor in which the complementary impurities are doped and forming a lower electrode at a lower portion of the semiconductor substrate.
Abstract:
Die vorliegende Erfindung stellt eine halbleiterbasierte Photovoltaikvorrichtung und ein Herstellungsverfahren dafür bereit. Die halbleiterbasierte Photovoltaikvorrichtung ist in der Lage, Licht mit einer breitbandigen Wellenlänge zu absorbieren und hat eine hohe photoelektrische Konversionseffizienz, weil sie eine hohe Separationseffizienz für Elektron-Loch-Paare aufweist. Spezieller umfasst das verfahren zur Herstellung der Photovoltaikvorrichtung die Schritte a) Ausbilden einer Halbleiterquantenpunktdünnschicht auf einem Halbleitersubstrat vom p- oder n-Typ, wobei die Halbleiterquantenpunktdünnschicht innerhalb eines Mediums, bei welchem derselbe Typ von Störstellen wie das Halbleitersubstrat dotiert sind, Halbleiterquantenpunkte beinhaltet; b) Ausbilden einer Porenanordnung durch Teilätzung, wobei die Porenanordnung die Halbleiterquantenpunktdünnschicht durchdringt; c) Abscheiden eines Halbleiters, in welchem zu dem Halbleitersubstrat komplementäre Störstellen dotiert sind, auf der Halbleiterquantenpunktdünnschicht, bei welcher die Porenanordnung ausgebildet ist; und d) nacheinander Ausbilden einer transparenten leitfähigen Schicht und einer oberen Elektrode auf dem Halbleiter, in welchem die komplementären Störstellen dotiert sind, und Ausbilden einer unteren Elektrode an einem unteren Abschnitt des Halbleitersubstrats.