公开(公告)号：WO2009048517A3

公开(公告)日：2009-06-18

申请号：PCT/US2008011319

申请日：2008-09-30

Applicant: LAM RES CORP ,  KIM JAEHYUN ,  SATO ARTHUR H ,  COMENDANT KEITH ,  LIU QING ,  WU FEIYANG

Inventor： KIM JAEHYUN ,  SATO ARTHUR H ,  COMENDANT KEITH ,  LIU QING ,  WU FEIYANG

IPC: H01L21/66

CPC classification number: G01N27/04 ,  G01R27/2623 ,  Y10T29/49117

Abstract: A chamber formed from an electrically conductive material is connected to a ground potential. A hot electrode formed from an electrically conductive material is disposed within the chamber in a substantially horizontal orientation and is physically separated from the chamber. The hot electrode includes a top surface defined to support a part to be measured. A radiofrequency (RF) transmission rod is connected to extend from a bottom surface of the hot electrode through an opening in a bottom of the chamber and be physically separated from the chamber. The RF transmission rod is defined to transmit RF power from a conductor plate in an electrical components housing to the hot electrode. An upper electrode formed from an electrically conductive material is disposed within the chamber in a substantially horizontal orientation. The upper electrode is electrically connected to the chamber and is defined to be movable in a vertical direction.

Abstract translation: 由导电材料形成的腔室连接到地电位。 由导电材料形成的热电极以基本上水平的方向布置在腔室内，并与腔室物理分离。 热电极包括限定为支撑待测量部分的顶表面。 射频（RF）传输杆连接成从热电极的底部表面延伸穿过腔室底部中的开口并与腔室物理分离。 RF传输杆被定义为将来自电气部件外壳中的导体板的RF功率传输到热电极。 由导电材料形成的上电极以基本上水平的方向布置在腔室内。 上电极电连接到腔室并且被限定为可在竖直方向上移动。

公开(公告)号：SG175638A1

公开(公告)日：2011-11-28

申请号：SG2011075504

申请日：2007-10-16

Applicant: LAM RES CORP

Inventor： DE LA LLERA ANTHONY ,  RONNE ALLAN K ,  KIM JAEHYUN ,  AUGUSTINO JASON ,  DHINDSA RAJINDER ,  WANG YEN-KUN ,  ULLAL SAURABH J ,  NORELL ANTHONY J ,  COMENDANT KEITH ,  DENTY JR WILLIAM

Abstract: UPPER ELECTRODE BACKING MEMBER WITH PARTICLE REDUCING FEATURES AbstractComponents of a plasma processing apparatus includes a backing member with gas passages attached to an upper electrode with gas passages. To compensate for the differences in coefficient of thermal expansion between the metallic backing member and upper electrode, the gas passages are positioned and sized such that they are misaligned at ambient temperature and substantially concentric at an elevated processing temperature. Non-uniform shear stresses can be generated in the elastomeric bonding material, due to the thermal expansion. Shear stresses can either be accommodated by applying an elastomeric bonding material of varying thickness or using a backing member comprising of multiple pieces. Figure 1,

公开(公告)号：SG177220A1

公开(公告)日：2012-01-30

申请号：SG2011093168

申请日：2007-12-17

Applicant: LAM RES CORP

Inventor： AUGUSTINO JASON ,  DE LA LLERA ANTHONY ,  RONNE ALLAN K ,  KIM JAEHYUN ,  DHINDSA RAJINDER ,  WANG YEN-KUN ,  ULLAL SAURABH J ,  NORELL ANTHONY J ,  COMENDANT KEITH ,  DENTY WILLIAM M JR

Abstract: A showerhead electrode assembly for a plasma processing apparatus is provided. The showerhead electrode assembly includes a first member attached to a second member. The first and second members have first and second gas passages in fluid communication. When a process gas is flowed through the gas passages, a total pressure drop is generated across the first and second gas passages. A fraction of the total pressure drop across the second gas passages is greater than a fraction of the total pressure drop across the first gas passages.Figure 3