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    QUARTZ WINDOW FOR A DEGAS CHAMBER
    2.
    发明申请
    QUARTZ WINDOW FOR A DEGAS CHAMBER 审中-公开
    QUARTZ WINDOW FOR DEGAS CHAMBER

    公开(公告)号：WO2011056194A3

    公开(公告)日：2011-07-21

    申请号：PCT/US2010002822

    申请日：2010-10-22

    Applicant: LAM RES CORP ,  AUGUSTINO JASON ,  HART TIM

    Inventor： AUGUSTINO JASON ,  HART TIM

    IPC: H01L21/02

    CPC classification number: H01J37/32467 ,  Y10T137/8359

    Abstract: A five-sided quartz window configured to be mounted on a degas chamber as a UV-transmissive window. The quartz window is made of synthetic quartz and has a uniform thickness. The shape of the quartz window is defined by an upper surface, a lower surface and a sidewall therebetween. The sidewall has five straight sections interconnected by five arcuate sections. The quartz window has four arcuate recesses extending into the sidewall.

    Abstract translation: 五面石英窗被配置为安装在脱气室上作为UV透射窗。 石英窗由合成石英制成，厚度均匀。 石英窗的形状由上表面，下表面和侧壁之间限定。 侧壁具有由五个弧形部分相互连接的五个直线部分。 石英窗有四个弧形的凹槽延伸到侧壁。

    BACKSIDE MOUNTED ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME
    3.
    发明申请
    BACKSIDE MOUNTED ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME 审中-公开
    背面安装的电极载体和装配的装置

    公开(公告)号：WO2010002722A2

    公开(公告)日：2010-01-07

    申请号：PCT/US2009048794

    申请日：2009-06-26

    Applicant: LAM RES CORP ,  AUGUSTINO JASON ,  AVOYAN ARMEN ,  FANG YAN ,  OUTKA DUANE ,  SHIH HONG ,  WHITTEN STEPHEN

    Inventor： AUGUSTINO JASON ,  AVOYAN ARMEN ,  FANG YAN ,  OUTKA DUANE ,  SHIH HONG ,  WHITTEN STEPHEN

    IPC: H05H1/38 ,  H05H1/24 ,  H05H1/34

    CPC classification number: H01J37/32568 ,  H01J37/32091 ,  H01J37/32605

    Abstract: A carrier assembly is provided comprising a backside mounted electrode carrier and electrode mounting hardware. The backside mounted electrode carrier comprises an electrode accommodating aperture, which in turn comprises a sidewall structure that is configured to limit lateral movement of an electrode positioned in the aperture. The electrode accommodating aperture further comprises one or more sidewall projections that support the weight of an electrode positioned in the aperture. The electrode mounting hardware is configured to engage an electrode positioned in the electrode accommodating aperture from the backside of the carrier and urge the electrode against the sidewall projections so as to limit axial movement of the electrode in the electrode accommodating aperture. Additional embodiments of broader and narrower scope are contemplated.

    Abstract translation: 提供的载体组件包括背面安装的电极载体和电极安装硬件。 背面安装的电极载体包括电极容纳孔，电极容纳孔又包括被配置为限制位于孔中的电极的横向移动的侧壁结构。 电极容纳孔还包括支撑位于孔中的电极的重量的一个或多个侧壁突起。 电极安装硬件被配置成从位于载体的背面的电极容纳孔中的电极接合，并且将电极推向侧壁突起，以限制电极在电极容纳孔中的轴向移动。 考虑到更广泛和更窄范围的另外的实施例。

    LOWER ELECTRODE ASSEMBLY OF PLASMA PROCESSING CHAMBER
    5.
    发明申请
    LOWER ELECTRODE ASSEMBLY OF PLASMA PROCESSING CHAMBER 审中-公开
    等离子体处理室的下电极组件

    公开(公告)号：WO2010062345A3

    公开(公告)日：2010-08-12

    申请号：PCT/US2009005857

    申请日：2009-10-29

    Applicant: LAM RES CORP ,  AUGUSTINO JASON ,  CHAU QUAN ,  GAFF KEITH WILLIAM ,  HA HANH TUONG ,  RICHARDSON BRETT C ,  SINGH HARMEET

    Inventor： AUGUSTINO JASON ,  CHAU QUAN ,  GAFF KEITH WILLIAM ,  HA HANH TUONG ,  RICHARDSON BRETT C ,  SINGH HARMEET

    IPC: H05H1/34 ,  H01L21/3065

    CPC classification number: H01J37/20 ,  H01J37/32091 ,  H01J37/32541 ,  H01J37/3255 ,  H01J37/32642 ,  H01J37/32715

    Abstract: A lower electrode assembly for use in a plasma processing chamber comprises a metal base and upper and lower edge rings. The metal base comprises metal plates brazed together and forming a brazed line on a lower side surface of the base, an edge ring support surface extending horizontally inwardly from the lower side surface and an upper side surface above the edge ring support surface. The upper edge ring comprises a lower surface mounted on the edge ring support surface and the lower edge ring surrounds the lower side surface of the base with a gap between opposed surfaces of the upper and lower edge rings and between the lower edge ring and the outer periphery of the base. The gap has an aspect ratio of total gap length to average gap width sufficient to impede arcing at the location of the braze line.

    Abstract translation: 用于等离子体处理室的下电极组件包括金属基座和上下边缘环。 金属基底包括钎焊在一起的金属板，在基座的下侧表面上形成钎焊线，从下侧表面向水平方向内延伸的边缘环支撑表面和在边缘环支撑表面上方的上侧表面。 上边缘环包括安装在边缘环支撑表面上的下表面，并且下边缘环围绕底部的下侧表面，在上边缘环和下边缘环的相对表面之间以及下边缘环和外侧边缘环的相对表面之间具有间隙 基地周边。 间隙具有总间隙长度与平均间隙宽度的宽高比，足以阻止钎焊线位置处的电弧。

    PERIPHERALLY ENGAGING ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME
    6.
    发明申请
    PERIPHERALLY ENGAGING ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME 审中-公开
    外围接触电极载体和组装体

    公开(公告)号：WO2010002724A2

    公开(公告)日：2010-01-07

    申请号：PCT/US2009048797

    申请日：2009-06-26

    Applicant: LAM RES CORP ,  AUGUSTINO JASON ,  AVOYAN ARMEN ,  FANG YAN ,  OUTKA DUANE ,  SHIH HONG ,  WHITTEN STEPHEN

    Inventor： AUGUSTINO JASON ,  AVOYAN ARMEN ,  FANG YAN ,  OUTKA DUANE ,  SHIH HONG ,  WHITTEN STEPHEN

    IPC: H05H1/34

    CPC classification number: H01J37/32541 ,  H01J37/32009 ,  H01J37/32605 ,  H01L21/67069

    Abstract: In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.

    Abstract translation: 根据本公开的一个实施例，提供了包括多组分电极和外围接合电极载体的组件。 外围接合电极载体包括载体框架和多个往复电极支撑件。 多组分电极位于载体框架的电极容纳孔中。 电极的背板包括围绕其周边形成的多个安装凹部。 往复式电极支撑件可以往复运动进入和离开安装凹槽。 考虑到更广泛和更窄范围的另外的实施例。

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