FERROELECTRIC FLAT PANEL DISPLAYS
    1.
    发明申请
    FERROELECTRIC FLAT PANEL DISPLAYS 审中-公开
    电磁平板显示屏

    公开(公告)号:WO9965051A3

    公开(公告)日:2000-03-16

    申请号:PCT/US9912717

    申请日:1999-06-07

    CPC classification number: G02F1/133603

    Abstract: A thin film of ferroelectric layered superlattice material in a flat panel display device is energized to selectively influence the display image. In one embodiment, a voltage pulse causes the layered superlattice material to emit electrons that impinge upon a phosphor, causing the phosphor to emit light. In another embodiment, an electric potential creates a remanent polarization in the layered superlattice material, which exerts an electric field in liquid crystal layer, thereby influencing the transmissivity of light through the liquid crystal. The layered superlattice material is a metal oxide formed using an inventive liquid precursor containing an alkoxycarbolyxate. The thin film thickness is preferably in the range of 50-140 nm, so that polarizability and transparency of the thin film is enhanced. A display element may comprise a varistor device to prevent cross-talk between pixels and to enable sudden polarization switching. A functional gradient in the ferroelectric thin film enhances electron emission. Two ferroelectric elements, one on either side of the phosphor may be used to enhance luminescence. A phosphor can be sandwiched between a dielectric and a ferroelectric layer to enhance emission.

    Abstract translation: 平板显示装置中的铁电层状超晶格材料薄膜被通电以选择性地影响显示图像。 在一个实施例中,电压脉冲使得层状超晶格材料发射撞击磷光体的电子,导致磷光体发光。 在另一个实施例中,电位在层状超晶格材料中产生剩余极化,其在液晶层中施加电场,从而影响透过液晶的透射率。 层状超晶格材料是使用本发明的含有烷氧基羧酸的液体前体形成的金属氧化物。 薄膜厚度优选在50-140nm的范围内,从而提高了薄膜的极化率和透明度。 显示元件可以包括用于防止像素之间的串扰并允许突发极化切换的变阻器装置。 铁电薄膜中的功能梯度增强了电子发射。 可以使用两个铁电元件,一个在荧光体的两侧,以增强发光。 磷光体可以夹在电介质和铁电层之间以增强发射。

    Method for manufacturing pressure sensitive semiconductor device
    3.
    发明授权
    Method for manufacturing pressure sensitive semiconductor device 失效
    制造压力敏感半导体器件的方法

    公开(公告)号:US3634931A

    公开(公告)日:1972-01-18

    申请号:US3634931D

    申请日:1969-12-09

    CPC classification number: H01L29/84 G01L1/18 H01L21/00 H01L29/00

    Abstract: In a semiconductor device with a four-layer structure having the so-called thyristor characteristic, when the control electrode for controlling its breakover voltage is constructed by the Schottky barrier and a means to apply a stress to the barrier, the breakover voltage of the said semiconductor device can be controlled by the stress. If this device is assembled in a circuit system, the circuit system can be set to either the ''''off'''' or ''''on'''' state, corresponding to the applied stress.

    Abstract translation: 在具有所谓的晶闸管特性的具有四层结构的半导体器件中,当用于控制其跳变电压的控制电极由肖特基势垒构成并且对屏障施加应力的装置时,所述 半导体器件可以通过应力控制。 如果该设备组装在电路系统中,则电路系统可以设置为对应于施加的应力的“关闭”或“开启”状态。

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