Patent search ap:("MOTOROLA INC") AND inv:"CURLESS JAY A" Page 1

1.

发明专利
MANUFACTURE OF SEMICONDUCTOR SUBSTRATE HAVING CRYSTALLINE ALKALINE EARTH METALLIC OXIDE INTERFACE HAVING SILICON 失效

公开(公告)号：JP2000294554A

公开(公告)日：2000-10-20

申请号：JP2000066646

申请日：2000-03-10

Applicant: MOTOROLA INC

Inventor： YU ZHIYI , DROOPAD RAVINDRANATH , OVERGAARD COREY DANIEL , RAMDANI JAMAL , CURLESS JAY A , HALLMARK JERALD ALLEN , OOMS WILLIAM J , WANG JUN

IPC: H01L41/24 , C30B23/02 , C30B25/02 , H01L21/203 , H01L21/316

Abstract: PROBLEM TO BE SOLVED: To provide the manufacture of a thin stable crystalline interface to silicon. SOLUTION: This method is for manufacturing of a semiconductor substrate by preparing a silicon substrate 10 having a surface, and forming interface 14 consisting of silicon, oxygen, and a metal on the surface of the silicon substrate, and forming one or more single crystalline oxide layer on the interface 14. This interface consists of the atomic layer of silicon oxygen, and a metal expressed by the formula XSiO2, where X represents a metal.

2.

发明专利
METHOD FOR FABRICATING A SEMICONDUCTOR STRUCTURE HAVING A CRYSTALLINE ALKALINE EARTH METAL OXIDE INTERFACE WITH SILICON 未知

公开(公告)号：SG101423A1

公开(公告)日：2004-01-30

申请号：SG200003946

申请日：2000-07-14

Applicant: MOTOROLA INC

Inventor： YU ZHIYI , DROOPAD RAVINDRANATH , OVERGAARD COREY DANIEL , RAMDANI JAMAL , CURLESS JAY A , HALLMARK JERALD A , OOMS WILLIAM J , WANG JUN

IPC: C23C14/08 , C23C16/40 , C30B25/02 , C30B29/16 , H01L21/20 , H01L29/20

3.

发明专利
Method for producing high quality epitaxial layers by molecular beam epitaxy 未知

公开(公告)号：SG140094G

公开(公告)日：1995-01-13

申请号：SG140094

申请日：1994-09-30

Applicant: MOTOROLA INC

Inventor： CURLESS JAY A , KRAMER GARY D , TSUI RAYMOND K , PEFFLEY MARILYN S , RODE DANIEL L

IPC: C30B25/18

4.

发明专利
Method for fabricating a semiconductor structure having a crystalline alkaline earth metal oxide interface with silicon. 未知

公开(公告)号：HK1043246A1

公开(公告)日：2002-09-06

申请号：HK02104063

申请日：2002-05-31

Applicant: MOTOROLA INC

Inventor： YU ZHIYI , DROOPAD RAVINDRANATH , OVERGAARD COREY D , RAMDANI JAMAL , CURLESS JAY A , HALLMARK JERALD A , COMS WILLIAM J , WANGJUN

IPC: C30B20060101 , C30B25/00 , H01L20060101 , H01L21/00 , H01L21/20 , H01L , C30B

5.

发明专利
Method for producing high quality epitaxial layers by molecular beam epitaxy 未知

公开(公告)号：HK14095A

公开(公告)日：1995-02-10

申请号：HK14095

申请日：1995-02-06

Applicant: MOTOROLA INC

Inventor： CURLESS JAY A , KRAMER GARY D , TSUI RAYMOND K , PEFFLEY MARILYN S , RODE DANIEL L

IPC: H01L21/203 , C30B23/02 , H01L21/26 , C30B25/18

6.

发明专利
未知

公开(公告)号：DE3685245D1

公开(公告)日：1992-06-17

申请号：DE3685245

申请日：1986-03-27

Applicant: MOTOROLA INC

Inventor： CURLESS JAY A , KRAMER GARY D , TSUI RAYMOND K , PEFFLEY MARILYN S , RODE DANIEL L

IPC: H01L21/203 , C30B23/02 , H01L21/26 , C30B25/18

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