Abstract:
Es werden ein Verfahren zum Herstellen eines Dünnfilmtransistors und ein Dünnfilmtransistor angegeben, das/der eine Verschlechterung und Variation der Leistung verhindert. Ein Verfahren zum Herstellen eines Dünnfilmtransistors (1B) umfasst: das Bilden einer Oxidhalbleiterschicht 3 auf einer ersten Hauptfläche eines Substrats 2; das Bilden einer ersten leitenden Schicht auf der Oxidhalbleiterschicht 3, während eine zweite leitende Schicht auf einer zweiten Hauptfläche des Substrats 2 gebildet wird; das kollektive Bilden von Maskenschichten auf der ersten leitenden Schicht und der zweiten leitenden Schicht; und das kollektive Inkontaktbringen der ersten leitenden Schicht und der zweiten leitenden Schicht mit Ätzflüssigkeit, so dass Teilbereiche der ersten leitenden Schicht und der zweiten leitenden Schicht entfernt werden, um eine Source-Elektrode 6 und eine Drain-Elektrode 7 auf der Oxidhalbleiterschicht 3 zu bilden, während eine Gate-Elektrode 5 auf der zweiten Hauptfläche des Substrats 2 gebildet wird.
Abstract:
Provided are a narrow frame touch input sheet, manufacturing method of same, and conductive sheet used in the narrow frame touch input sheet that are suitable for a capacitive touch sensor of a narrow frame for which a conductive transparent film pattern has two layers. A conductive sheet is used which is provided with one or a plurality of layered transparent base sheets; and a conductive transparent film, a light-excluding conductive film for electrode use, and a first resist layer which are formed to be sequentially layered on the top surface and the rearmost surface thereof. Both sides of the first resist layer are exposed simultaneously, and after development, the conductive transparent film and the light-excluding conductive film for electrode use are simultaneously etched, the first resist layer is stripped away, then a second resist layer is formed as a coating over external bounding edge portions of both sides, and only the light-excluding conductive film for electrode use of the central window portion is etched. A circuit pattern of the conductive transparent film is thereby formed by being exposed.
Abstract:
Es werden ein Verfahren zum Herstellen eines Dünnfilmtransistors und ein Dünnfilmtransistor angegeben, das/der eine Verschlechterung und Variation der Leistung verhindert. Ein Verfahren zum Herstellen eines Dünnfilmtransistors (1B) umfasst: das Bilden einer organischen Halbleiterschicht 3 auf einer ersten Hauptfläche eines Substrats 2; das Bilden einer ersten leitenden Schicht auf der organischen Halbleiterschicht 3, während eine zweite Halbleiterschicht auf einer zweiten Hauptfläche des Substrats gebildet wird; das kollektive Bilden von Maskenschichten auf der ersten leitenden Schicht und der zweiten leitenden Schicht; und das Inkontaktbringen der ersten leitenden Schicht und der zweiten leitenden Schicht mit Ätzflüssigkeit, so dass Teilbereiche der ersten leitenden Schicht und der zweiten leitenden Schicht entfernt werden, um eine Source-Elektrode 6 und eine Drain-Elektrode 7 auf der organischen Halbleiterschicht 3 zu bilden, während eine Gate-Elektrode 5 auf der zweiten Hauptfläche des Substrats 2 gebildet wird.
Abstract:
Provided are a narrow frame touch input sheet, manufacturing method of the same, and conductive sheet used in the narrow frame touch input sheet, which are suitable for a capacitive touch sensor having a narrow frame and two layers of transparent conductive film. patterns. The method uses the conductive sheet including one or more transparent base sheets stacked into a layer, transparent conductive films, light-excluding conductive electrode films, and first resist layers, which are layered sequentially on the uppermost and lowermost surfaces thereof. The first resist layers are exposed simultaneously on the both surfaces, and after development, the transparent conductive films and the light-excluding conductive electrode films are simultaneously etched, the first resist layers are stripped away, then second resist layers are formed as coating on the both surfaces in an outer edge portion, so that the light-excluding conductive electrode films are etched only in the central window portions. Thus, circuit patterns of the transparent conductive films are exposed.
Abstract:
Provided are a narrow frame touch input sheet, manufacturing method of the same, and conductive sheet used in the narrow frame touch input sheet, which are suitable for a capacitive touch sensor having a narrow frame and two layers of transparent conductive film patterns. The method uses the conductive sheet including one or more transparent base sheets stacked into a layer, transparent conductive films, light-excluding conductive electrode films, and first resist layers, which are layered sequentially on the uppermost and lowermost surfaces thereof. The first resist layers are exposed simultaneously on the both surfaces, and after development, the transparent conductive films and the light-excluding conductive electrode films are simultaneously etched, the first resist layers are stripped away, then second resist layers are formed as coating on the both surfaces in an outer edge portion, so that the light-excluding conductive electrode films are etched only in the central window portions. Thus, circuit patterns of the transparent conductive films are exposed.
Abstract:
PROBLEM TO BE SOLVED: To provide a narrow frame touch input sheet in which a narrow frame transparent conductive film pattern is suitable to a two-layer capacitance type touch sensor, a laminated narrow frame touch input sheet and a method for manufacturing a narrow frame touch input sheet. SOLUTION: The narrow frame touch input sheet and its manufacturing method are formed by a method which simultaneously etches a transparent conductive film and a light shielding conductive film for electrode, forms an elongated routing circuit pattern in which the transparent conductive film and the light shielding conductive film for electrode are sequentially laminated in the same pattern at the outer frame edge without a positional deviation, then, in a covered state forms a second resist layer on the elongated routing circuit pattern, and etches only a light shielding conductive film layer for electrode on which the second resist layer is not formed to thereby expose and form a circuit pattern of a transparent conductive film at a central window. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a narrow picture frame touch input sheet with an excellent rust-prevention property.SOLUTION: A conductive sheet, on which a transparent conductive film 3, a shading conductive film 1, and a first resist layer are sequentially laminated and formed on both faces of a transparent substrate sheet, is used. After both faces of the first resist layer are exposed at the same time, and developed, the transparent conductive film 3 and the shading conductive film 1 are etched at the same time. After the first resist layer is exfoliated, a rust inhibitor is applied on the exposed shading conductive film 1 and a patterned second resist layer is laminated. Only the shading conductive film 1 at a central window part and a terminal part is etched, so as to expose the transparent conductive film 3. Furthermore, at a boundary between the central window part and the terminal part, an exposed end face of the shading conductive film 1 is side-etched, so that the second resist layer has a pent-roof structure. Finally, the second resist layer with the pent-roof structure is softened by thermal processing, so that the exposed end face of the remaining shading conductive film 1 is coated, and the second resist layer is not exfoliated and is remained as a rustproof layer under this condition.
Abstract:
PROBLEM TO BE SOLVED: To provide a narrow frame touch input sheet with a protection film and a laminate narrow frame touch input sheet with a protection film which are suitable for a capacitance type touch sensor with a narrow frame and a two-layered transparent conductive film pattern and a method for manufacturing them. SOLUTION: A transparent conductive film, a light shielding conductive film for electrode, and a first resist layer are successively formed on the both faces of a base sheet, and the first resist layer is simultaneously exposed and developed on the both faces, and the transparent conducive film and the light shielding conductive film for an electrode are simultaneously etched, and the first resist layer is peeled, so that a thin wire leading circuit pattern in which the transparent conductive film and the light shielding conductive film for an electrode are laminated can be formed at the external frame sections of the both faces of the base sheet, and after that the both face thin wire leading circuit pattern is coated with a second resist layer, and only the light shielding conductive film for an electrode on which the second resist layer is not formed is etched so that the circuit pattern of the transparent conductive film can be formed, so as to be exposed at each of the both face central window portions, and the light transmitting protection film is laminated. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a thin transformer. SOLUTION: A board 1 is provided with a linear hole group 3 constituted of three parallel adjacent linear holes 2, and a printed coil pair 6 constituted of two discontinuous printed coils 5 in which conductive pattern layers 4 are formed spirally on the both faces and side faces of parts interposed between each linear hole 2 of the linear hole group 3 as axes with another circuit, and a loop-shaped magnetic body 7, whose both ends are connected through the two printed coils 5 of the printed coil pair 6, is provided inside the board 1, and the number of turns of the two printed coils 5 of the printed coil pair 6 is made different in this printed circuit board.