公开(公告)号：KR20120064480A

公开(公告)日：2012-06-19

申请号：KR20100125736

申请日：2010-12-09

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： ISHIMOTO TAKEKI ,  MASUDA YASUHITO ,  YAMAZAKI NOBUYUKI ,  SAYAMA JIN

IPC: H01R9/05 ,  H02G11/00

Abstract: PURPOSE: A small diameter coaxial cable harness having a storage unit with the thin thickness is provided to control the thickness of the harness by arranging small diameter coaxial cables on a flat plate shape. CONSTITUTION: A small diameter coaxial cable harness(20) comprises the following: small diameter coaxial cables(24) intermittently integrated to plural flat units(31); and at least two bending units(41, 42, 43) formed among the flat units using parts of the small diameter coaxial cables, and bent to the opposite side of each other.

Abstract translation: 目的：提供一种具有厚度薄的存储单元的小直径同轴电缆线束，通过将小直径同轴电缆布置成平板形状来控制线束的厚度。 构造：小直径同轴电缆线束（20）包括：小间隙同轴电缆（24），间歇地集成到多个平坦单元（31）上; 以及至少两个弯曲单元（41,42,43），其使用所述小直径同轴电缆的一部分在所述平坦单元之间形成并弯曲到彼此的相对侧。

公开(公告)号：CA2522239A1

公开(公告)日：2004-10-14

申请号：CA2522239

申请日：2004-03-12

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： HAGA TSUYOSHI ,  OKUDA YASUHIRO ,  MASUDA YASUHITO ,  HAYASHI FUMIHIRO

IPC: H01R11/01 ,  G01R1/04 ,  G01R31/28 ,  H01L21/48 ,  H01L23/482 ,  H01L23/498 ,  H01R43/00 ,  H05K3/40

Abstract: An anisotropic electrically conductive film comprising a base film in the fo rm of a porous film made of synthetic resin and having an electric insulation property, and an electrically conductive metal adhered to a resin section of porous construction in such a manner as to penetrate from a first surface to a second surface at a plurality of places on the base film, wherein electrical ly conductive sections which can be made electrically conductivity in the direction of the film thickness are independently provided; and a method of producing the same.

公开(公告)号：CA2598056A1

公开(公告)日：2006-09-08

申请号：CA2598056

申请日：2006-02-23

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： SHIMIZU SEIJI ,  SAKABE SHUJI ,  WATATANI KENICHI ,  HASHIDA MASAKI ,  OKUDA YASUHIRO ,  MASUDA YASUHITO ,  MISHIMA HIDEHIKO

IPC: B23K26/40

Abstract: In order to easily control the laser pulse width and perform high-precision processing, the method for processing a material by laser ablation according to the present invention is characterized in that the material having a region of which a double logarithmic chart shows a linearly-shaped line with a gradient of not more than 0.5, when a relationship between laser pulse width and ablation threshold is represented in the logarithmic chart with a laser pulse width in picosecond plotted along the horizontal axis and an ablation threshold in J/cm 2 plotted along the vertical axis, is processed by the pulsed laser beam having the laser pulse width within the region.

公开(公告)号：CA2578033A1

公开(公告)日：2006-03-02

申请号：CA2578033

申请日：2005-07-11

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： HAYASHI FUMIHIRO ,  IDOMOTO YUICHI ,  FUJITA TARO ,  MASUDA YASUHITO ,  UENOYAMA MAYO ,  OKUDA YASUHIRO

IPC: H05K3/42 ,  H05K3/00 ,  H05K3/26

Abstract: A method of manufacturing a perforated porous resin substrate, the method including the following steps: Step 1 of forming at least one perforation penetrating in the thickness direction from a first surface to a second surface in a porous resin substrate made of a resin material containing a fluoropolymer; Step 2 of etching treatment conducted by putting an etchant containing an alkali metal in contact with the wall face of each perforation; and Step 3 of putting an oxidizable compound or a solution thereof in contact with a degenerative layer generated by the etching treatment, and thereby removing the degenerative layer. A method of manufacturing a porous resin substrate in which electrical conductivity is afforded to the wall face of the perforation.

公开(公告)号：CA2527241A1

公开(公告)日：2004-12-16

申请号：CA2527241

申请日：2004-06-04

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： IDOMOTO YUICHI ,  MASUDA YASUHITO ,  OKUDA YASUHIRO ,  FUJITA TARO ,  UENOYAMA MAYO ,  HAYASHI FUMIHIRO ,  HAGA TSUYOSHI

IPC: B23B35/00 ,  B23Q3/08 ,  H05K3/00 ,  H05K3/42

Abstract: A method of manufacturing a drilled porous resin base material with conducti ve drilled inner wall surfaces, comprising a step 1 for penetrating liquid or solution into the porous structure of the porous resin base material, a step 2 for forming solid matter from the penetrated liquid or solution, a step 3 fo r forming a plurality of drilled holes passed from the first surface to the second surface of the porous resin base material having the solid matter in the porous structure, and a step 4 for melting or dissolving the solid matte r and removing it from the porous structure. The method also comprises the ste p for selectively adhering catalysts to only the inner wall surfaces of the drilled holes and adhering a conductive metal to the inner wall surfaces.

公开(公告)号：CA2522239C

公开(公告)日：2011-01-04

申请号：CA2522239

申请日：2004-03-12

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： MASUDA YASUHITO ,  OKUDA YASUHIRO ,  HAYASHI FUMIHIRO ,  HAGA TSUYOSHI

IPC: H01R11/01 ,  G01R1/04 ,  G01R31/28 ,  H01L21/48 ,  H01L23/482 ,  H01L23/498 ,  H01R43/00 ,  H05K3/40

Abstract: The present invention is directed to an anisotropic conductive film and manufacturing methods thereof, in which an electrically insulative porous film made of synthetic resin is used as a base film and in which conductive parts capable of being provided with conductiveness in the film thickness direction are formed independently at plural positions of the base film by adhering conductive metal to resinous parts of porous structure in such a manner as piercing through from a first surface to a second surface.

公开(公告)号：CA2551397A1

公开(公告)日：2005-07-28

申请号：CA2551397

申请日：2005-01-13

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： HAYASHI FUMIHIRO ,  OKUDA YASUHIRO ,  MASUDA YASUHITO

IPC: B24C1/04 ,  C23C18/22 ,  B24C3/32 ,  B24C11/00 ,  C23C18/16 ,  H05K1/00 ,  H05K3/10 ,  H05K3/18

Abstract: A production method for a porous molding in which complicated and fine penetrated portions and recesses are pattern-worked. A pattern-worked porous molding or non-woven fabric in which a plated layer is selectively formed on the surfaces of penetrated portions and recesses. A mask having pattern-form penetrated portions is disposed on at least one surface of a porous molding or non-woven fabric, and fluid or fluid containing abrasive grains is sprayed over the mask to form penetrated portions or recesses or the both of them, t o which the opening shape of the mask~s penetrated portion is transferred, on the porous molding or non-woven fabric. A porous molding or non-woven fabric and an electric circuit components or the like in which a plated layer is selectively formed on the surfaces of penetrated portions or recesses or the both of them.

公开(公告)号：DE602005013187D1

公开(公告)日：2009-04-23

申请号：DE602005013187

申请日：2005-01-13

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： HAYASHI FUMIHIRO ,  MASUDA YASUHITO ,  OKUDA YASUHIRO

IPC: B24C1/04 ,  C23C18/22 ,  B24C3/32 ,  B24C11/00 ,  C23C18/16 ,  H05K1/00 ,  H05K3/00 ,  H05K3/10 ,  H05K3/18 ,  H05K3/38 ,  H05K3/42

Abstract: An object of the present invention is to provide a method for manufacturing a porous material in which complicated and fine through portions, recessed portions, and the like have been patterned. It is to provide a patterned porous molded product or nonwoven fabric, in which a plated layer has been selectively formed on the surfaces of the through portions and the recessed portions. With the invention, a mask having through portions in a pattern is placed on at least one side of the porous molded product or the nonwoven fabric. A fluid or a fluid containing abrasive grains is sprayed from above the mask, thereby to form through portions or recessed portions, or both of them, to which the opening shape of each through portion of the mask has been transferred, in the porous molded product or the nonwoven fabric. The invention provides a porous molded product or a nonwoven fabric in which a plated layer has been selectively formed on the surfaces of the through portions or the recessed portions, or both of these, an electric circuit component, or the like.

公开(公告)号：CA2546094A1

公开(公告)日：2005-08-04

申请号：CA2546094

申请日：2005-01-20

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： MASUDA YASUHITO ,  OKUDA YASUHIRO ,  MISHIMA HIDEHIKO

IPC: B23K26/00 ,  B23K26/382 ,  B23K26/40 ,  C08J9/36

公开(公告)号：EP1707315A4

公开(公告)日：2007-05-30

申请号：EP05703853

申请日：2005-01-13

Applicant: SUMITOMO ELECTRIC INDUSTRIES

Inventor： HAYASHI FUMIHIRO ,  MASUDA YASUHITO ,  OKUDA YASUHIRO

IPC: B24C1/04 ,  C23C18/22 ,  B24C3/32 ,  B24C11/00 ,  C23C18/16 ,  H05K1/00 ,  H05K3/00 ,  H05K3/10 ,  H05K3/18 ,  H05K3/38 ,  H05K3/42

CPC classification number: B24C3/322 ,  B24C1/04 ,  B24C11/00 ,  C23C18/1605 ,  C23C18/1644 ,  C23C18/1651 ,  C23C18/1653 ,  C23C18/30 ,  H05K1/0284 ,  H05K3/107 ,  H05K3/182 ,  H05K3/184 ,  H05K2201/0116 ,  H05K2201/015 ,  H05K2201/0209 ,  H05K2201/0293 ,  H05K2201/09036 ,  H05K2201/09118 ,  H05K2203/025 ,  H05K2203/0565 ,  Y10T428/24479 ,  Y10T428/24496 ,  Y10T428/24612 ,  Y10T428/249953 ,  Y10T428/249987 ,  Y10T442/674

Abstract: A production method for a porous molding in which complicated and fine penetrated portions and recesses are pattern-worked. A pattern-worked porous molding or non-woven fabric in which a plated layer is selectively formed on the surfaces of penetrated portions and recesses. A mask having pattern-form penetrated portions is disposed on at least one surface of a porous molding or non-woven fabric, and fluid or fluid containing abrasive grains is sprayed over the mask to form penetrated portions or recesses or the both of them, to which the opening shape of the mask’s penetrated portion is transferred, on the porous molding or non-woven fabric. A porous molding or non-woven fabric and an electric circuit components or the like in which a plated layer is selectively formed on the surfaces of penetrated portions or recesses or the both of them.