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    THERMAL CHEMICAL VAPOR DEPOSITION COATING
    3.
    发明申请
    THERMAL CHEMICAL VAPOR DEPOSITION COATING 审中-公开
    热化学蒸气沉积涂料

    公开(公告)号：WO2017040623A1

    公开(公告)日：2017-03-09

    申请号：PCT/US2016/049647

    申请日：2016-08-31

    Applicant: SILCOTEK CORP.

    Inventor： VEZZA, Thomas F. ,  MATTZELA, James B. ,  BARONE, Gary A. ,  GROVE, William David ,  SILVIS, Paul H.

    IPC: C23C16/24 ,  C23C16/455

    CPC classification number: C23C16/24 ,  C23C16/45523

    Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The thermal chemical vapor deposition coated article includes a substrate and a coating on the substrate, the coating having multiple layers and being positioned on regions of the thermal chemical vapor deposition coated article that are unable to be concurrently coated through line-of-sight techniques. The coating has a concentration of particulate from gas phase nucleation, per 100 square micrometers, of fewer than 6 particles having a dimension of greater than 0.5 micrometers. The thermal chemical vapor deposition process includes introducing a multiple aliquot of a silicon-containing precursor to the enclosed vessel with intermediate gaseous soaking to produce the coated article.

    Abstract translation: 公开了热化学气相沉积涂覆制品和热化学气相沉积工艺。 热化学气相沉积涂覆制品包括基材和基材上的涂层，涂层具有多层并且位于不能通过视线技术同时涂覆的热化学气相沉积涂覆制品的区域上。 该涂层具有每100平方微米气相成核的少于6个尺寸大于0.5微米的颗粒的颗粒浓度。 热化学气相沉积工艺包括使用中间气体浸泡将含有硅的前体的多重等分试样引入封闭的容器中以产生涂覆制品。

    VAPOR PHASE TREATMENT OF AMORPHOUS CARBON FILMS WITH (PERFLUORO 1,1,2,2 TETRAHYDROALKYL)TRIALKOXYSILANE
    4.
    发明申请
    VAPOR PHASE TREATMENT OF AMORPHOUS CARBON FILMS WITH (PERFLUORO 1,1,2,2 TETRAHYDROALKYL)TRIALKOXYSILANE 审中-公开
    （PERFLUORO 1,1,2,2四氢喹啉酮）三羧酸的蒸气相处理非晶碳膜

    公开(公告)号：WO2014186470A1

    公开(公告)日：2014-11-20

    申请号：PCT/US2014/038006

    申请日：2014-05-14

    Applicant: SILCOTEK CORP.

    Inventor： SMITH, David A. ,  SILVIS, Paul H.

    IPC: B05D5/08 ,  B05D1/00

    CPC classification number: B05D1/60 ,  B05D5/083 ,  C09D5/08

    Abstract: Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.

    Abstract translation: 化学气相沉积制品和方法包括在材料上的化学气相沉积功能化，该材料包括碳的sp3排列。 化学气相沉积功能化被定位成与工艺流体，烃，分析物，排气或其组合接触。 另外或替代地，化学气相沉积功能化不是冰箱架或挡风玻璃。

    THERMAL CHEMICAL VAPOR DEPOSITION SPLIT-FUNCTIONALIZATION PROCESS, PRODUCT AND COATING
    6.
    发明公开
    THERMAL CHEMICAL VAPOR DEPOSITION SPLIT-FUNCTIONALIZATION PROCESS, PRODUCT AND COATING 审中-公开
    热化学气相沉积分裂功能化工艺，产品和涂层

    公开(公告)号：EP3165633A1

    公开(公告)日：2017-05-10

    申请号：EP16196501.7

    申请日：2016-10-31

    Applicant: Silcotek Corp.

    Inventor： YUAN, Min ,  SMITH, David A. ,  SILVIS, Paul H. ,  MATTZELA, James B.

    IPC: C23C16/24 ,  C23C16/30 ,  C23C16/40 ,  C23C16/56

    CPC classification number: C23C16/45557 ,  C04B41/456 ,  C04B41/524 ,  C23C16/24 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56

    Abstract: Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time.

    Abstract translation: 公开了热化学气相沉积分裂功能化工艺，涂层和产品。 热化学气相沉积分裂官能化方法包括将制品放置在封闭室内，在第一温度范围内使制品功能化第一段时间，然后在第二温度范围内进一步功能化制品第二段时间 。 热化学气相沉积分裂官能化产品包括通过在第一温度范围内官能化第一时间段和通过在第二温度范围内进一步官能化第二时间段形成的另一官能化形成的官能化。

    DIFFUSION-RATE-LIMITED THERMAL CHEMICAL VAPOR DEPOSITION COATING
    10.
    发明公开
    DIFFUSION-RATE-LIMITED THERMAL CHEMICAL VAPOR DEPOSITION COATING 审中-公开
    扩散速率有限的热化学气相沉积涂层

    公开(公告)号：EP3196335A1

    公开(公告)日：2017-07-26

    申请号：EP17152489.5

    申请日：2017-01-20

    Applicant: Silcotek Corp.

    Inventor： VEZZA, Thomas F. ,  CONDO, Steven A. ,  DESKEVICH, Nicholas Peter ,  MATTZELA, James B. ,  SILVIS, Paul H.

    IPC: C23C16/24 ,  C23C16/455

    CPC classification number: C23C16/455 ,  C23C16/24 ,  C23C16/45502 ,  C23C16/46

    Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.

    Abstract translation: 公开了热化学气相沉积涂覆制品和热化学气相沉积工艺。 该制品包括衬底和在衬底上的热化学气相沉积涂层。 热化学气相沉积涂层包括由扩散速率受限的热化学气相沉积产生的特性。 热化学气相沉积工艺包括将气体物质引入容器并通过气体物质的扩散速率限制反应在容器内的物品上产生热化学气相沉积涂层。

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