公开(公告)号：WO1996030747A1

公开(公告)日：1996-10-03

申请号：PCT/US1996004273

申请日：1996-03-28

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  JOHNSON, Ralph ,  WELLS, Keith ,  GALBRAITH, Lee, K.

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956

Abstract: Light scattered from an illuminated spot (54) on a patterned wafer (56) is first passed through a dielectric filter (74) and then through an optical fiber bundle (76) to a detector (72). The filter (74) controls the aperture of the light that is passed to a desired azimuth angle and the optical fiber bundle (76) further limits the aperture.

Abstract translation: 从图案化晶片（56）上的照明光点（54）散射的光首先通过介质滤光器（74），然后通过光纤束（76）传送到检测器（72）。 滤光器（74）控制被传递到所需方位角的光的孔径，并且光纤束（76）进一步限制光圈。

公开(公告)号：WO1995003540A1

公开(公告)日：1995-02-02

申请号：PCT/US1993009526

申请日：1993-10-05

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  WELLS, Keith, B. ,  NGUYEN, Hung ,  JOHNSON, Ralph, T. ,  LESLIE, Brian, C.

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01N21/95607

Abstract: A method of locating particle and defect features on a periodically patterned surface (16) uses multiple threshold intensity levels to identify features in the data stream produced by scanning the surface with a light beam (12) and detecting the light scattered (22) from the surface. High thresholds are assigned to regions of the surface with high background scatter, while low thresholds are assigned to regions of the surface with low background scatter. The scattered light (22) is detected with a wide dynamic range detector producing high resolution 12-bit pixel data capable of resolving the smallest particles and defects of interest in low scatter regions, while avoiding saturation in high scatter regions. Periodic pattern features (56) are removed from the data by mapping features from a plurality of periodically repeating die on the surface to a single die map and looking for overlapping features.

Abstract translation: 在周期性图案化表面（16）上定位颗粒和缺陷特征的方法使用多个阈值强度水平来识别通过用光束（12）扫描表面而产生的数据流中的特征，并且从 表面。 高阈值被分配给具有高背景散射的表面的区域，而低阈值被分配给具有低背景散射的表面的区域。 通过宽动态范围检测器检测散射光（22），产生高分辨率的12位像素数据，能够解析低散射区域中最小的粒子和感兴趣的缺陷，同时避免高散射区域的饱和。 通过将表面上的多个周期性重复的模具的特征映射到单个管芯图并查找重叠特征，从数据中去除周期性图案特征（56）。

公开(公告)号：WO1994008204A1

公开(公告)日：1994-04-14

申请号：PCT/US1993009318

申请日：1993-09-30

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  WHEELER, William, R.

IPC: G01B07/28

CPC classification number: G01B7/34

Abstract: A stylus profilometer having a counterbalanced stylus with a motion transducer using a vane (41) moving between parallel, spaced-apart, conductive plates (35 and 37) which damp the motion of the vane by means of trapped air. The vane forms an electrode with the plates so that the combination is a pair of capacitors in a balanced bridge arrangement. Motion of the stylus causes an unbalance of the bridge indicative of the extent of stylus motion. A lever arm (59) associated with the stylus has a tip (57) influenced by a magnetic field which biases the stylus or controls force on a surface to be measured. The entire assembly has a very low moment of inertia to reduce the effects of vibration on the stylus and thereby increase resolution of the device and reduce damage to the substrate.

Abstract translation: 一种具有平衡触笔的触笔轮廓仪，其具有运动换能器，该运动传感器使用在平行的，间隔开的导电板（35和37）之间移动的叶片（41），其通过被捕获的空气来阻碍叶片的运动。 叶片形成具有板的电极，使得组合是平衡桥布置的一对电容器。 手写笔的运动导致桥梁的不平衡，指示触针运动的程度。 与触针相关联的杠杆臂（59）具有尖端（57），其受到磁场的影响，该磁场偏压触针或控制待测表面上的力。 整个组件具有非常低的惯性矩，以减少触针上的振动的影响，从而增加装置的分辨率并减少对基板的损坏。

公开(公告)号：WO1997046865A1

公开(公告)日：1997-12-11

申请号：PCT/US1997009650

申请日：1997-06-03

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  LESLIE, Brian, C. ,  NIKOONAHAD, Mehrdad ,  WELLS, Keith, B.

IPC: G01N21/00

CPC classification number: G01N21/95607 ,  G01N21/94 ,  G01N21/9501

Abstract: In an optical scanning system (200) for detecting particles and pattern defects on a sample surface (240), a light beam (238) is focused to an illuminated spot on the surface and the spot is scanned across a scan line. A detector (11b) is positioned adjacent to the surface to collect scattered light from the spot where the detector includes a one- or two-dimensional array of sensors. Light scattered from the illuminated spot at each of a plurality of positions along the scan line is focused onto a corresponding sensor in the array. A plurality of detectors symmetrically placed with respect to the illuminating beam detect laterally and forward scattered light from the spot.

Abstract translation: 在用于检测样品表面（240）上的颗粒和图案缺陷的光学扫描系统（200）中，将光束（238）聚焦到表面上的照明点，并且扫描线上扫描光点。 检测器（11b）位于与表面相邻的位置，以收集来自检测器包括传感器的一维或二维阵列的点的散射光。 沿着扫描线的多个位置中的每一个处从照明点散射的光被聚焦到阵列中的对应的传感器上。 相对于照明光束对称放置的多个检测器检测来自光斑的横向和前向散射光。

公开(公告)号：WO1996018093A1

公开(公告)日：1996-06-13

申请号：PCT/US1995016172

申请日：1995-12-08

Applicant: TENCOR INSTRUMENTS ,  NIKOONAHAD, Mehrdad ,  STOKOWSKI, Stanley, E.

Inventor： TENCOR INSTRUMENTS

IPC: G01N21/00

CPC classification number: G01N21/95623 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/8825 ,  G01R31/2831 ,  G01R31/308 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A high sensitivity and high throughput surface inspection system directs a focused beam of light (38) at a grazing angle towards the surface to be inspected (40). Relative motion is caused between the beam (38) and the surface (40) so that the beam (38) scans a scan path covering substantially the entire surface and light scattered along the path is collected for detecting anomalies. The scan path comprises a plurality of arrays of straight scan path segments. The focused beam of light (38) illuminates an area of the surface between 5-15 microns in width and this system is capable of inspecting in excess of about 40 wafers per hour for 150 millimeter diameter wafers (6-inch wafers), in excess of about 20 wafers per hour for 200 millimeter diameter wafers (8-inch wafers) and in excess of about 10 wafers per hour for 300 millimeter diameter wafers (12-inch wafers).

Abstract translation: 高灵敏度和高通量的表面检查系统将聚焦光束（38）以掠射角度朝向要检查的表面（40）引导。 在光束（38）和表面（40）之间产生相对运动，使得光束（38）扫描覆盖基本上整个表面的扫描路径，并且收集沿着路径散射的光以检测异常。 扫描路径包括多个直扫描路径段阵列。 聚焦光束（38）照亮了宽度为5-15微米之间的表面区域，该系统能够超过150毫米直径的晶片（6英寸晶圆）超过约40个晶片，过量 对于200毫米直径的晶片（8英寸晶圆），每小时约20个晶片，对于300毫米直径的晶片（12英寸晶圆），每小时超过约10个晶片。

公开(公告)号：WO1985000885A1

公开(公告)日：1985-02-28

申请号：PCT/US1984000145

申请日：1984-01-30

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  GALBRAITH, Lee, K. ,  PECEN, Jiri

IPC: G01N21/00

CPC classification number: G01N21/93 ,  G01N21/4785 ,  G01N21/94 ,  G01N21/9501

Abstract: A test device for calibrating an optical scanner wherein microscopic patterns (21) of light scattering elements (13, 15) simulate the scattering of light from particles or flaws of different sizes. Simulation of different particles sizes is achieved by means of clusters (25, 29, 33, 37) or arrays of these light scattering elements having different areawise densities. Patterns of such clusters or arrays are disposed on a surface with intervening spaces (17) where a random assortment of foreign particles may be expected. In this manner, the foreign particles may be directly compared to a test pattern. The test surface may be a semiconductor wafer (41) having a thin, inert coating with openings (45) therein forming the light scattering elements. The openings may be made by photolithographic techniques, i.e., masking and etching, so that various patterns on a surface may be all created simultaneously by the same process.

Abstract translation: 用于校准光学扫描仪的测试装置，其中光散射元件的微观图案模拟来自不同尺寸的颗粒或缺陷的光的散射。 通过具有不同面积密度的这些光散射元件的簇或阵列来实现不同粒径的模拟。 这种簇或阵列的图案设置在具有中间空间的表面上，其中可以预期随机分类的异物。 以这种方式，外来颗粒可以直接与测试图案进行比较。 测试表面可以是具有薄的惰性涂层的半导体晶片，其中开口形成光散射元件。 开口可以通过光刻技术制成，即掩模和蚀刻，使得表面上的各种图案可以全部通过相同的工艺同时制作。

公开(公告)号：WO1997033158A1

公开(公告)日：1997-09-12

申请号：PCT/US1997004134

申请日：1997-03-05

Applicant: TENCOR INSTRUMENTS ,  VAEZ-IRAVANI, Mehdi

Inventor： TENCOR INSTRUMENTS

IPC: G01N21/88

CPC classification number: G01N21/9501 ,  G01N2021/8825

Abstract: A single laser (30) is used to provide light for both dark (80) and bright field (60) detection. The laser beam is split into two beams by a Wollaston prism (40) and both beams are directed towards a sample (12) to be inspected to illuminate two areas (16, 18) of the sample. The light reflected by or transmitted through the sample at the two spots is then combined by the same or a different Wollaston prism and the phase shift caused by any anomaly of a sample is detected as a phase shift between the two beams by a bright field detector. Light scattered by the sample at the two spots is detected by a dark field detector. A halfwave plate (36) is used to orient the polarization plane of light from the laser incident on the Wollaston prism so that one of the two beams (52, 54) incident on the sample has a much higher intensity than the other and so that the sensitivity and the detection operation of dark field is not altered by the presence of two illuminated spots on the sample. A transparent dielectric at a suitable angle to the incident beam and the reflected or transmitted beam may be used to enhance bright field detection.

Abstract translation: 单个激光（30）用于为暗（80）和明场（60）检测提供光。 激光束被Wollaston棱镜（40）分成两个光束，并且两个光束被引向样品（12）以进行检查以照射样品的两个区域（16,18）。 然后通过相同或不同的Wollaston棱镜将由两个点反射或透过样品的光组合起来，并且由样品的任何异常引起的相移通过亮场检测器被检测为两个光束之间的相移 。 在两个点处由样品散射的光由暗场检测器检测。 使用半波片（36）来定向来自入射在渥拉斯顿棱镜上的激光的光的偏振平面，使得入射到样品上的两个光束（52,54）中的一个具有比另一个更强的强度，因此 暗场的灵敏度和检测操作不会因样品上存在两个发光斑点而改变。 可以使用与入射光束和反射或透射光束成适当角度的透明电介质来增强亮场检测。

公开(公告)号：WO1997012226A1

公开(公告)日：1997-04-03

申请号：PCT/US1996015354

申请日：1996-09-25

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  GROSS, Kenneth, P. ,  ALTENDORFER, Hubert ,  KREN, George

IPC: G01N21/47

CPC classification number: G01N21/9501 ,  G01N21/94

Abstract: A light beam is directed towards a surface (12) along a direction normal to the surface (12). There is a scanning means (114, 116, 118) which causes the surface (12) to move so that the beam scans the surface (12) along a spiral path. Light scattered by the surface (12) within a first range of angles is collected by a first collection means (32, 34) and directed to a first detector (42), and light scattered within a second range is collected by a second collection means (38) and is directed to a second detector (44). The two ranges of collection angles are different, so that the first detector (42) is optimized to detect scattering from large particles, and the second detector (44) is optimized to detect light from small particles and defects.

Abstract translation: 光束沿着垂直于表面（12）的方向指向表面（12）。 存在使得表面（12）移动的扫描装置（114,116,118），使得光束沿着螺旋路径扫描表面（12）。 由第一收集装置（32,34）收集由表面（12）在第一角度范围内散射的光并被引导到第一检测器（42），并且在第二范围内散射的光由第二收集装置 （38）并且被引导到第二检测器（44）。 收集角度的两个范围是不同的，使得第一检测器（42）被优化以检测来自大颗粒的散射，并且第二检测器（44）被优化以检测来自小颗粒和缺陷的光。

公开(公告)号：WO1996014566A1

公开(公告)日：1996-05-17

申请号：PCT/US1995014223

申请日：1995-11-03

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  GROSS, Kenneth, P.

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01N21/8806

Abstract: An apparatus and method for inspecting a substrate (14), such as a semiconductor wafer, includes crossed cylindrical optical elements (44) that form an elliptical beam (40) that is caused to scan in parallel fashion at an oblique angle to the substrate (14). Preferably, the smaller dimension of the elliptical beam (40) is perpendicular to the direction of the scan of the beam across the wafer. A reflector (38) converts an angularly varying beam to a telecentrically scanning beam and also provides focusing only in the direction parallel to the telecentric scan.

Abstract translation: 用于检查诸如半导体晶片的基板（14）的装置和方法包括形成椭圆光束（40）的交叉圆柱形光学元件（44），所述椭圆光束（40）以与倾斜角度平行的方式扫描到基板 14）。 优选地，椭圆形光束（40）的较小尺寸垂直于横跨晶片的光束的扫描方向。 反射器（38）将角度变化的光束转换成远心扫描光束，并且仅在与远心扫描平行的方向上提供聚焦。

公开(公告)号：WO1993023734A1

公开(公告)日：1993-11-25

申请号：PCT/US1993004153

申请日：1993-05-03

Applicant: TENCOR INSTRUMENTS

Inventor： TENCOR INSTRUMENTS ,  GALBRAITH, Lee, K. ,  VAUGHT, John, L. ,  WOLF, Ralph, C. ,  LESLIE, Brian ,  NEUKERMANS, Armand, P.

IPC: G01N21/00

CPC classification number: G02F1/134309 ,  G01N21/95623 ,  G01N2201/067 ,  G02B27/46

Abstract: An inspection apparatus for a light diffracting surface (w) employs a planar array of individually addressable light valves (69; 82; 84) for use as a spatial filter in an imaged Fourier plane of a diffraction pattern, with valves having stripe geometry (91; 93; 95) corresponding to positions of members (81; 83; 85) of the diffraction pattern, blocking light from those members. The remaining valve stripes, i.e. those not blocking light from diffraction order members, are open for transmission of light. Light (13; 31) directed onto the surface (w), such as a semiconductor wafer, forms elongated curved diffraction orders (65) from repetitive patterns of circuit features. The curved diffraction orders are transformed to linear orders by a Fourier transform lens (35a; 35b). The linear diffraction orders from repetitive patterns of circuit features are blocked, while light from non-repetitive features, such as dirt particles or defects, is allowed to pass through the light valves to a detector (47).