Abstract:
PROBLEM TO BE SOLVED: To obtain an inter-layer connecting material wherein microscopic formation vias can be formed at all interlayers. SOLUTION: The inter-layer connecting material includes: a metal layer that is patternable for forming a wiring circuit pattern and has a first main surface with a continuous flat shape and a second main surface with the continuous flat shape on the opposite side of the first main surface; and a second layer lying on the first main surface, wherein a removable layer comprising polymer lies on a stripping layer. Further, the patternable inter-layer connecting material includes: the removable layer wherein the second layer is peelable by means of the strippping layer, which temporarity adheres the second layer to the first metal layer and is fit so as to be peeled from the first metal layer; and a plurality of solid metal bump, which lies on the second main surface and is formed of the second metal, respectively. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
A plurality of multilayer metal sheets (1) each comprising a bump-forming metal layer (2), etching-stop layer (3), and a wiring film-forming metal layer (4) are processed so as to each have a wiring film (4a) formed out of the wiring film-forming metal layer and bumps (2a) formed out of the bump-forming metal layer. The multilayer metal sheets are so stacked by repeating a stacking step in such a way that the bump-forming surface of one multilayer metal sheet faces to the wiring film of another multilayer metal sheet. A multilayer wiring board is polished by a polisher (11a) for a multilayer wiring board comprising a metal sheet holding means (13) for holding a metal sheet (1a), a blade holding means (25) for holding a blade (26) above the metal sheet, a height adjusting mechanism (20) for adjusting the height of the blade holding means, and a blade translating mechanism (15) for moving the blade holding means parallel to the surface of the metal sheet.