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    Color display system using spatial light modulators
    1.
    发明公开
    Color display system using spatial light modulators 失效
    使用空调光调制器的彩色显示系统

    公开(公告)号：EP0547601A3

    公开(公告)日：1993-10-13

    申请号：EP92121488.8

    申请日：1992-12-17

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Stoltz, Richard A.

    IPC: H04N9/31

    CPC classification number: G09G3/346 ,  G02B26/0841 ,  G09G3/2077 ,  H04N5/7458 ,  H04N9/3126

    Abstract: A color display system (10) for transforming pixel data, where each of three primary colors is represented by a value for its intensity, into an image. Three light sources, (11a - 11c), one for each primary color, each illuminate a spatial light modulator (SLM) (12a - 12c), such as a deformable mirror device. Each of these SLMs (12a - 12c) is operated so that it reflects an amount of light corresponding to the intensity of the pixel currently being displayed. The light thus regulated is linearized into a single beam of mixed-color light using mirrors, (14a, 14b), and lens (15), and directed to an addressing SLM (13). Addressing SLM (13) is operated so that only an element corresponding to the pixel being displayed is "on". The addressing SLM (13) reflects the mixed-color light for that pixel to a photosensitive surface (18).

    Method of making interconnections on semiconductor devices
    2.
    发明公开
    Method of making interconnections on semiconductor devices 失效
    上的半导体器件的化合物的制备方法

    公开(公告)号：EP0687005A3

    公开(公告)日：1997-04-16

    申请号：EP95304002.9

    申请日：1995-06-07

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Havemann, Robert H. ,  Stoltz, Richard A.

    IPC: H01L21/768

    CPC classification number: H01L21/76834 ,  H01L21/76831 ,  H01L21/76837

    Abstract: A semiconductor device and method having a low-permittivity material between closely-spaced leads in order to decrease unwanted capacitance, while having a more structurally strong dielectric between widely-spaced leads where capacitance is not as critical. A metal layer 14 is deposited on a substrate 12 of a semiconductor wafer 10 , where the metal layer 14 has a first region 15 and a second region 17 . An insulating layer 39 is deposited on the metal layer, and the insulating layer 39 is patterned with a conductor pattern of widely-spaced leads and closely-spaced leads. Widely-spaced leads 16 are formed in the first region 15 of the metal layer 14 . At least adjacent portions of closely-spaced leads 18 are formed in the second region 17 of the metal layer 14 . A low-permittivity material 34 is deposited between adjacent portions of the closely-spaced leads 18 . A structural dielectric layer 26 is deposited between at least the widely-spaced leads. The low-permittivity material 34 is a material with a dielectric constant of less than 3. An advantage of the invention includes improved structural strength by placing structurally weak low-permittivity material only where needed, in areas having closely-spaced leads.

    Improvements in or relating to fuse and antifuse link structures for integrated circuits
    3.
    发明公开
    Improvements in or relating to fuse and antifuse link structures for integrated circuits 失效
    改进熔化和反熔丝的集成电路。

    公开(公告)号：EP0663669A2

    公开(公告)日：1995-07-19

    申请号：EP95300197.1

    申请日：1995-01-12

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Magel, Gregory A. ,  Stoltz, Richard A.

    IPC: G11C17/16

    CPC classification number: G11C17/16

    Abstract: A fuse and antifuse link structure, which when used with a memory integrated circuit device such as a gate array or programmable read-only memory (PROM), allows the memory circuit to be reprogrammed. The fuse and antifuse link is comprised of a fuse 12 and an antifuse 16, connected in series, parallel, or a combination thereof. Either element of the link can be programmed initially, and the other can be programmed in a second step, to reverse the first programming. Several links can be used in one circuit to provide multiple reprogramming capability.

    Low volatility solvent-based precursors for nanoporous aerogels
    5.
    发明公开
    Low volatility solvent-based precursors for nanoporous aerogels 失效
    低挥发性的含溶剂的前体的纳米多孔气凝胶

    公开(公告)号：EP0775669A3

    公开(公告)日：1997-08-13

    申请号：EP96118275.5

    申请日：1996-11-14

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Smith, Douglas M. ,  Johnston, Gregory P. ,  Ackerman, William C. ,  Jeng, Shin-Puu ,  Gnade, Bruce E. ,  Stoltz, Richard A. ,  Maskara, Alok ,  Ramos, Teresa

    IPC: C01B13/32 ,  B01J13/00

    CPC classification number: H01L21/02126 ,  B01J13/0091 ,  C01B33/1585 ,  C03C1/008 ,  C03C17/25 ,  C03C2217/213 ,  C03C2218/113 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02343 ,  H01L21/02359 ,  H01L21/31695

    Abstract: An aerogel precursor sol is disclosed herein. This aerogel precursor sol comprises a metal-based aerogel precursor reactant and a first solvent comprising a polyol; wherein, the molar ratio of the first solvent molecules to the metal atoms in the reactant is at least 1 : 16 . Preferably, the first solvent is glycerol. Preferably, the aerogel precursor reactant may selected from the group consisting of metal alkoxides, at least partially hydrolyzed metal alkoxides, particulate metal oxides, and combinations thereof. Typically, the molar ratio of the first solvent molecules to the metal atoms in the reactant is no greater than 12 : 1, and preferably, the molar ratio of the first solvent molecules to the metal atoms in the reactant is between 1 : 2 and 12 : 1. In some embodiments, the molar ratio of the first solvent molecules to the metal atoms in the reactant is between 2.5 :1 and 12:1. In some embodiments, the first solvent comprises a glycol. In some embodiments, the reactant is tetraethoxysilane that may be at least partially hydrolyzed. In some embodiments, the first polyol is selected from the group consisting of 1,2,4-butanetriol; 1,2,3- butanetriol; 2 methyl-propanetriol; and 2-(hydroxymethyl)-1,3-propanediol; 1-4, 1-4, butanediol; and 2-methyl-1,3-propanediol, and combinations thereof. This invention allows controlled porosity thin film nanoporous aerogels to be deposited, gelled, aged, and dried without atmospheric controls. In another aspect, this invention allows controlled porosity thin film nanoporous aerogels to be deposited, gelled, rapidly aged at an elevated temperature, and dried with only passive atmospheric controls, such as limiting the volume of the aging chamber.

    Image capture with spatial light modulator and single-cell photosensor
    6.
    发明公开
    Image capture with spatial light modulator and single-cell photosensor 失效
    Bildaufnahmegerätmit einemräumlichenLichtmodulator und einem einzelligen Photosensor。

    公开(公告)号：EP0547599A2

    公开(公告)日：1993-06-23

    申请号：EP92121486.2

    申请日：1992-12-17

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Stoltz, Richard A.

    IPC: H04N3/08 ,  H04N5/30

    CPC classification number: H04N3/08

    Abstract: An apparatus and method for capturing an image, using a spatial light modulator (SLM) 11 and a single-element sensor 15. The SLM 11 is an array of individually switchable pixel elements, which reflect light toward the sensor if switched to an "on" position. As each pixel element is switched on, light from that pixel element is directed to the sensor 15. For each pixel element, the sensor 15 generates a signal proportional to the light associated with that pixel element, the result being a series of signals representing at least one image frame. The process may be repeated for a number of image frames for generating moving pictures. The SLM is a deformable mirror device.

    Abstract translation: 使用空间光调制器（SLM）11和单元件传感器15拍摄图像的装置和方法。SLM 11是可单独切换的像素元件的阵列，其将光朝向传感器反射，如果切换到“开” “立场。 当每个像素元件被接通时，来自该像素元件的光被引导到传感器15.对于每个像素元件，传感器15产生与与该像素元件相关联的光成比例的信号，结果是一系列信号， 至少一个图像帧。 可以针对用于生成运动图像的多个图像帧重复该过程。

    Method to produce masking
    7.
    发明公开
    Method to produce masking 失效
    Verfahren zur Herstellung einer Markierung。

    公开(公告)号：EP0501278A1

    公开(公告)日：1992-09-02

    申请号：EP92102658.9

    申请日：1992-02-18

    Applicant: TEXAS INSTRUMENTS INCORPORATED

    Inventor： Douglas, Monte A. ,  Stoltz, Richard A.

    IPC: G03F1/08 ,  G03F7/20 ,  G03C5/58 ,  C23C16/04

    CPC classification number: B82Y30/00 ,  B82Y10/00 ,  C23C16/04 ,  G03C5/58 ,  G03F7/2043 ,  Y10S148/105 ,  Y10S438/945

    Abstract: This is a method for masking a structure 12 for patterning micron and submicron features, the method comprises: forming at least one monolayer 32 of adsorbed molecules on the structure; prenucleating portions 46,48 of the adsorbed layer by exposing the portions corresponding to a desired pattern 36 of an energy source 42; and selectively forming build-up layers 66,68 over the prenucleated portions to form a mask over the structure to be patterned. Other methods are also disclosed.

    Abstract translation: 这是用于掩蔽用于图案化微米和亚微米特征的结构12的方法，该方法包括：在结构上形成吸附分子的至少一个单层32; 通过暴露对应于能量源42的期望图案36的部分，吸附层的前核部分46,48; 并且在去核部分之上选择性地形成积层66,68以在待图案化的结构上形成掩模。 还公开了其它方法。

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