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    1.
    发明专利
    未知

    公开(公告)号：AT556439T

    公开(公告)日：2012-05-15

    申请号：AT05741416

    申请日：2005-05-19

    Applicant: TORAY INDUSTRIES

    Inventor： MURASE SEIICHIRO ,  KITAZAWA DAISUKE ,  NAGAO KAZUMASA ,  SUGIMOTO KAZUNORI ,  TOMINAGA TSUYOSHI

    IPC: H01L51/00 ,  C07D209/86 ,  C07D209/88 ,  C07D307/91 ,  C07D333/54 ,  C07D333/76 ,  C07D401/04 ,  C07D405/04 ,  C07D409/10 ,  C09K11/06 ,  H01L51/50 ,  H05B33/14 ,  H05B33/22

    Abstract: The present invention relates to a light emitting device material comprising an anthracene compound represented by the following general formula (3) (wherein R19 to R37 each may be the same or different and are selected from among a hydrogen atom, alkyl group, cycloalkyl group, heterocyclic group, alkoxy group, alkylthio group, arylether group, arylthioether group, phenyl group, alkyl substituted phenyl group, alkoxy substituted phenyl group, aryl substituted phenyl group, naphtyl group, alkyl substituted naphtyl group, alkoxy substituted naphtyl group, aryl substituted naphtyl group, phenanthryl group, alkyl substituted phenanthryl group, alkoxy substituted phenanthryl group, aryl substituted phenanthryl group, heteroaryl group and silyl group. n is 1 or 2. A is a heteroarylene group or arylene group with a carbon number of 6 or more to 12 or less. Any one of the R 19 to R 27 and any one of the R 36 or R 37 are used for linking with A.).

    PRODUCTION METHOD FOR POLYMER
    2.
    发明专利
    PRODUCTION METHOD FOR POLYMER 失效

    公开(公告)号：JP2002284812A

    公开(公告)日：2002-10-03

    申请号：JP2001089513

    申请日：2001-03-27

    Applicant: TORAY INDUSTRIES

    Inventor： FUJIWARA TAKENORI ,  SUGIMOTO KAZUNORI ,  MORI YOICHI

    IPC: C08F6/08 ,  C08F22/40

    Abstract: PROBLEM TO BE SOLVED: To provide a resin with low-permittivity and refractive index. SOLUTION: The production method for a polymer is characterized in that a polymer represented by formula (1) (wherein I is 1-2; m and n are each an integer of 0-5 provided m+n>=1; X is a direct bond, O, S, CH2 , CO, SO or SO2 ; R to R are each H, CH3 S, F, CF3 , a 1-10C alkyl or a 6-20C aryl; R and R are each H or a 1-10C alkyl; and R and R are each H, CH3 , OCH3 , F, CF3 , OCF3 , a 1-10C alkyl or a 6-20C aryl) and prepared by the polymerization in the presence of a metal catalyst is reacted with a hydrosilane compound and/or hydrogen and then the metal catalyst is removed.

    POLYARYLENE ETHER RESIN COMPOSITION
    4.
    发明专利
    POLYARYLENE ETHER RESIN COMPOSITION 失效

    公开(公告)号：JP2001329060A

    公开(公告)日：2001-11-27

    申请号：JP2000152890

    申请日：2000-05-24

    Applicant: TORAY INDUSTRIES

    Inventor： SUGIMOTO KAZUNORI ,  MORI YOICHI

    IPC: C08G65/40

    Abstract: PROBLEM TO BE SOLVED: To provide a low fluorine content and low specific dielectric constant polyarylene ether resin. SOLUTION: Provided is a polyarylene ether resin composition comprising repeating units represented by formula (1) (wherein l, m, n, and o are each an integer of 0-4; p is an integer of 0 or 1; q is an integer of 500-5,000,000, provided that l+m>=1; X is a direct bond, CH2, CO, S, SO, or SO2; R1 and R2 are each a 5-20C cycloalkyl or a 6-20C aryl; and R3 and R4 are each H, F, CF3, a 1-20C alkyl, a 5-20C cycloalkyl, or a 6-20C aryl, provided that R3 and R4 may be combined together to form a 5-20C cycloalkyl or a 6-20C aryl) and having a weight-average molecular weight of 500-5,000,000.

    POLY(ALICYCLIC OLEFIN)
    5.
    发明专利
    POLY(ALICYCLIC OLEFIN) 失效

    公开(公告)号：JP2002088120A

    公开(公告)日：2002-03-27

    申请号：JP2001071896

    申请日：2001-03-14

    Applicant: TORAY INDUSTRIES

    Inventor： SUGIMOTO KAZUNORI ,  MORI YOICHI

    IPC: C08K3/00 ,  C08F32/08 ,  C08L27/18 ,  C08L45/00 ,  H01B3/30 ,  H01B3/44

    Abstract: PROBLEM TO BE SOLVED: To provide a resin that has a low dielectric constant and a low refractive index. SOLUTION: The objective poly(alicyclic olefin) characteristically comprises the recurring units represented by the following general formula (1) with a weight-average molecular weight of 500-5,000,000 (wherein l is 1-2; m, n, o are each an integer of 0-5 satisfying m+n>=1; X is a direct bond, or O, S, CH2, CO, SO or SO2; R1-R4 are each H, F, CF3, a 1-10C alkyl, a 6-20C aryl and may be identical or different; R5 and R6 are each H, or a 1-10C alkyl and may be identical or different; R7 and R8 are each F, CF3, OCF3, a 1-10C alkyl group, a 6-20C aryl group and may be identical or different).

    LOW DIELECTRIC CONSTANT POLYMER
    6.
    发明专利
    LOW DIELECTRIC CONSTANT POLYMER 审中-公开

    公开(公告)号：JP2002201216A

    公开(公告)日：2002-07-19

    申请号：JP2001332317

    申请日：2001-10-30

    Applicant: TORAY INDUSTRIES

    Inventor： FUJIWARA TAKENORI ,  MORI YOICHI ,  SUGIMOTO KAZUNORI ,  OTAKE ATSUYUKI

    IPC: C08F8/46 ,  C08F22/40

    Abstract: PROBLEM TO BE SOLVED: To provide a porous heat-resistant polymer having a low dielectric constant and, simultaneously, a small pore diameter to be used in electronic parts, and a polymer composition to form a crosslinked structure. SOLUTION: The porous polymer is the one comprising a poly(alicyclic olefin) composition containing a structural unit expressed by the formula (1) (wherein 1 is an integer of 1-2; m, n, and o are each an integer of 0-5 and an integer meeting m+n>=1; and X is a direct bond or O, S, CH2, CO, SO or SO2). The crosslinked poly(alicyclic olefin) composition is a porous polymer comprising a copolymer of a matrix polymer comprising the poly(alicyclic olefin) composition containing a structural unit expressed by the above formula with a thermally decomposable polymer which decomposes at a temperature lower than the decomposition temperature of the matrix polymer and comprises the structural unit expressed by the above formula.

    POLY(ALICYCLIC ACID ANHYDRIDE)
    7.
    发明专利
    POLY(ALICYCLIC ACID ANHYDRIDE) 失效

    公开(公告)号：JP2002030115A

    公开(公告)日：2002-01-31

    申请号：JP2000213865

    申请日：2000-07-14

    Applicant: TORAY INDUSTRIES

    Inventor： SUGIMOTO KAZUNORI ,  MORI YOICHI

    IPC: C08F132/08 ,  C08F8/30

    Abstract: PROBLEM TO BE SOLVED: To provide a poly(alicyclic acid anhydride) being a precursor in the production of a poly(alicyclic imide). SOLUTION: The poly(alicyclic acid anhydride) composition is a compound represented by formula I (wherein l is an integer of 1 or 2; m is an integer of 3-30,000; R1 to R4, which may be the same as or different from each other, are each H, F, CF3, a 1-10C alkyl, or a 6-20C aryl; and R5 and R6 are each H or a 1-10C alkyl).

    POLYAMIC ACID COMPOSITION, SOLUBLE POLYIMIDE COMPOSITION, AND POLYBENZOXAZOLE-POLYIMIDE COMPOSITION
    8.
    发明专利
    POLYAMIC ACID COMPOSITION, SOLUBLE POLYIMIDE COMPOSITION, AND POLYBENZOXAZOLE-POLYIMIDE COMPOSITION 失效

    公开(公告)号：JP2001348428A

    公开(公告)日：2001-12-18

    申请号：JP2000343220

    申请日：2000-11-10

    Applicant: TORAY INDUSTRIES

    Inventor： SUWA MITSUFUMI ,  FUJITA YOJI ,  SUGIMOTO KAZUNORI

    IPC: C08G73/06

    Abstract: PROBLEM TO BE SOLVED: To provide a resin having a low permittivity and heat resistance. SOLUTION: Provided is a polyamic acid composition comprising repeating units represented by formula (1) [wherein R1 and R2 are each any one group selected from methylene, oxygen, C(CH3)2, C(CF3)2, and COO; R3 is any one group selected from hydrogen, a 1-10C hydrocarbon group, (meth) acryloyloxyethyl, (meth)acryloyloxy-n-propyl, (meth)acryloyloxy-i-propyl, and (meth)acryloyloxy-n-butyl; R4 is hydrogen, a 1-4C hydrocarbon group, a 1-4C alkoxyl, an ester group, carboxyl, or hydroxyl; R5 is hydrogen, a 1-6C hydrocarbon group, R6-CO, or R6COO (wherein R6 is a 1-4C hydrocarbon group); (p) and (q) are each an integer of 0-2; and (r) and (s) are each o or 1].

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