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公开(公告)号:SG122957A1
公开(公告)日:2006-06-29
申请号:SG200508449
申请日:2005-11-14
Applicant: UNITED TECHNOLOGIES CORP
Inventor: BELOUSOV IGOR V , MALASHENKO IGOR S , SERGIYENKO GREGORY A , SHELKOVOI ANATOLI N , MEMMEN ROBERT L , RUTZ DAVID A , KINSTLER MONIKA D
Abstract: A method for depositing a first material on a substrate (108) includes providing the substrate (108) in a deposition chamber. A molten body (164) is formed between the substrate and a source of the first material by melting one or more second materials. A flow of the first material is passed through the molten body (164) and from the molten body (164) to the substrate (108) as a vapor flow. An essentially non-expending portion of the molten body comprises an alloy having a melting temperature below a melting temperature of the first material.
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公开(公告)号:EP2850220A4
公开(公告)日:2015-11-11
申请号:EP13790590
申请日:2013-05-14
Applicant: UNITED TECHNOLOGIES CORP
Inventor: BELOUSOV IGOR V , KONONENKO YURIY G , KUZMICHEV ANATOLY , MULLOOLY JR JOHN F
CPC classification number: C23C14/0021 , C23C14/083 , C23C14/32 , H01J37/32055 , H01J37/321 , H05H1/42 , H05H1/50
Abstract: A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises maintaining at least an ion current density in a range of 2-1000 mA/cm2.
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公开(公告)号:UA106400C2
公开(公告)日:2014-08-26
申请号:UAA201207703
申请日:2012-06-22
Applicant: UNITED TECHNOLOGIES CORP
Inventor: KONONENKO YURIY G , BELOUSOV IGOR V , BONDARCHUK VADIM IVANOVICH , MARYNSKYI ANDRII G , SODERBERG CARL R
Abstract: Изобретениеотноситсяк отраслицветнойметаллургии, аименно - кспособуограничениярекристаллизациимикроструктурыповерхностнойзоныдеталиизсуперсплавапутемееобработкипритемпературе 800-900 (Св кислородсодержащейсредедлявведениякислородав поверхностнуюзонув количестве, достаточномдлясозданиямелкихоксидныхсоединений, которыеявляютсядискретнымиотдельнымифазами, которыефиксируютпределылюбыхновыхзеренв поверхностнойзонеи деталиизсуперсплава, которуюобрабатываютуказаннымспособом. Изобретениеобеспечиваетснижениеуровнярекристаллизациидеталиизсуперсплаваиз-законтроляколичествакислорода, вводимогоприегообработке, иповышениекачествадеталейизсуперсплава, которыеполучаютуказаннымспособом.
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公开(公告)号:UA86366C2
公开(公告)日:2009-04-27
申请号:UAA200509014
申请日:2005-09-23
Applicant: UNITED TECHNOLOGIES CORP
Inventor: BELOUSOV IGOR V , MALASHENKO IGOR S , SERGIYENKO GREGORY A , SHELKOVOI EUGENE A , MEMMEN ROBERT L , RUTZ DAVID A , KINSTLER MONIKA A
Abstract: Способосажденияпервогоматериаланаподложкувключаетрасположениеподложкив камередляосаждения. Образуютрасплавмеждуподложкойи источникомпервогоматериалапутемрасплавленияодногоилинесколькихвторыхматериалов. Потокпервогоматериалапроходитсквозьрасплави отрасплавак подложкекакпотокпара. Практическинерасходнаячастьрасплававключаетсплав, которыйимееттемпературуплавления, нижетемпературыплавленияпервогоматериала.
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公开(公告)号:AT401429T
公开(公告)日:2008-08-15
申请号:AT05255509
申请日:2005-09-08
Applicant: UNITED TECHNOLOGIES CORP
Inventor: KINSTLER MONIKA D , IVASISHIN OREST M , SERHIYENKO GREGORY A , MARKOVSKY PAVEL E , BONDARCHUK VADIM I , BELOUSOV IGOR V
Abstract: A method for treating a deposited titanium-base material from an initial condition to a treated condition includes a rapid heating and a rapid cooling. The heating is from a first temperature to a second temperature, the first temperature being below a ² transus and the second temperature being below above the transus. The cooling is from the second temperature to a third temperature below an equilibrium ² transus.
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公开(公告)号:SG122960A1
公开(公告)日:2006-06-29
申请号:SG200508453
申请日:2005-11-14
Applicant: UNITED TECHNOLOGIES CORP
Inventor: KINSTLER MONIKA D , IVASISHIN OREST M , MARKOVSKY PAVEL E , BONDARCHUK VADIM I , SERGIYENKO GREGORY A , BELOUSOV IGOR V
Abstract: A method for treating a deposited titanium-base material from an initial condition to a treated condition includes a rapid heating and a rapid cooling. The heating is from a first temperature to a second temperature, the first temperature being below a ² transus and the second temperature being below above the transus. The cooling is from the second temperature to a third temperature below an equilibrium ² transus.
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公开(公告)号:UA113608C2
公开(公告)日:2017-02-27
申请号:UAA201202665
申请日:2012-03-05
Applicant: UNITED TECHNOLOGIES CORP
Inventor: BELOUSOV IGOR V , KONONENKO YURIY G , KUZMICHEV ANATOLY I , SHAGINYAN LEONID , MALONEY MICHAEL J , MULLOOLY JOHN F
Abstract: Винахідналежитьдогалузіметалургії, асаме - доспособуі пристроюдлянанесеннятеплозахиснихпокриттівнадеталь. Спосібполягаєв тому, щодетальрозміщуютьв камеріосадженнятапершийелектричнийпотенціалподаютьнадеталь. Компонентиматеріалуосадженнярозпилюютьі вгазовійфазііонізують. Першийелектричнийпотенціалмодулюютьтак, щобпритягуватиіонізованікомпонентидодеталі. МодуляціявключаємножинупершихстадійдляППФО - плазмовогопарофазногоосадження. Кожназ першихстадійвключаєсеріюімпульсівнегативногопотенціалу. МодуляціявключаєтакожмножинудругихстадійдляПФО - безплазмовогопарофазногоосадження, якічергуютьсяз першимистадіями. Винахідзабезпечуєпідвищенняякостітаадгезійноїміцностіпокриття, щоосаджуєтьсянадеталь.
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公开(公告)号:CA2500933A1
公开(公告)日:2005-09-19
申请号:CA2500933
申请日:2005-03-15
Applicant: UNITED TECHNOLOGIES CORP
Inventor: BELOUSOV IGOR V , MEMMEN ROBERT L , BIBER VLADIMIR , KUZMICHEV ANATOLY I
IPC: F01D5/28 , C23C14/14 , C23C14/16 , C23C14/22 , C23C14/32 , C23C14/34 , C23C14/54 , F01D5/00 , F01D25/00 , F02C7/00 , F04D29/38 , B23P6/00 , C23C4/06 , C23C14/56
Abstract: Ion-enhanced physical vapor deposition is augmented by sputtering to depos it multi-component materials. The process may be used to deposit coatings and repair material on Ti alloy turbine engine parts. The physical vapor deposition may be ion- enhanced electron beam physical vapor deposition.
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公开(公告)号:SG11201403946YA
公开(公告)日:2014-10-30
申请号:SG11201403946Y
申请日:2013-05-14
Applicant: UNITED TECHNOLOGIES CORP
Inventor: BELOUSOV IGOR V , KONONENKO YURIY G , KUZMICHEV ANATOLY , MULLOOLY JR JOHN F
Abstract: A ceramic material is applied to a part. The part is placed in a deposition chamber and a first electric potential is applied to the part. Components are evaporated for forming the material. The evaporated components are ionized. The first electric potential is modulated so as to draw the ionized component to the part. The modulation comprises maintaining at least an ion current density in a range of 2-1000 mA/cm 2 .
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公开(公告)号:DE602005008169D1
公开(公告)日:2008-08-28
申请号:DE602005008169
申请日:2005-09-08
Applicant: UNITED TECHNOLOGIES CORP
Inventor: KINSTLER MONIKA D , IVASISHIN OREST M , SERHIYENKO GREGORY A , MARKOVSKY PAVEL E , BONDARCHUK VADIM I , BELOUSOV IGOR V
Abstract: A method for treating a deposited titanium-base material from an initial condition to a treated condition includes a rapid heating and a rapid cooling. The heating is from a first temperature to a second temperature, the first temperature being below a ² transus and the second temperature being below above the transus. The cooling is from the second temperature to a third temperature below an equilibrium ² transus.
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