公开(公告)号：US20080290273A1

公开(公告)日：2008-11-27

申请号：US12153455

申请日：2008-05-20

Applicant: Stephan Uhlemann

Inventor： Stephan Uhlemann

IPC: H01J47/00

CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/26 ,  H01J49/48 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2′, 3′) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8′, 9′) which eliminates the dispersion (4) of the at least one first deflecting field (2′, 3′). A radiation source (17) comprises such a monochromator (1). High monchromatism without intensity contrasts caused by defects of the slit aperture is thereby achieved in that the deflection elements (2, 3, 8, 9) have a design other than spherically shaped and their electrodes (24, 25) are given a potential (φ+, φ−) such that the charged particles (xα, yβ) which virtually enter the image of the radiation source (17) at different respective angles (α, β) in different sections (x, y), are differently focused such that charged particles (xα, yβ) of one energy are point focused (10, 10′, 10″) exclusively in the plane (5) of the selection aperture (6), since zero-crossings (11, 12) of the deflections (A) of the charged particles (xα, yβ) of the different sections (x, y) only coincide there at the same axial position (z, E).

Abstract translation: 用于带电粒子光学器件的单色仪（1），特别是用于电子显微镜的装置包括至少一个具有用于产生分散体（4）的静电偏转场（2'，3'）的第一偏转元件（2,3） 选择孔径（6）的平面（5）以选择具有期望能量间隔（7）的带电粒子和至少一个具有静电偏转场（8'，9'）的第二偏转元件（8,9） 所述至少一个第一偏转场（2'，3'）的色散（4）。 辐射源（17）包括这样的单色仪（1）。 因此，由于偏转元件（2,3,8,9）具有除球形之外的设计，并且它们的电极（24,25）被赋予电位（phi + ，phi），使得在不同部分（x，y）中以不同的相应角度（α，β）实际进入辐射源（17）的图像的带电粒子（xalpha，ybeta）被不同地聚焦，使得带电 一个能量的粒子（xalpha，ybeta）专门在选择孔径（6）的平面（5）中点聚焦（10,10'，10“），因为偏转的零交叉（11,12） A）的不同部分（x，y）的带电粒子（xalpha，ybeta）仅在相同的轴向位置（z，E）处重合。

公开(公告)号：US06903337B2

公开(公告)日：2005-06-07

申请号：US10185729

申请日：2002-07-01

Applicant: Oliver Kienzle ,  Dirk Stenkamp ,  Michael Steigerwald ,  Rainer Knippelmeyer ,  Max Haider ,  Heiko Müller ,  Stephan Uhlemann

Inventor： Oliver Kienzle ,  Dirk Stenkamp ,  Michael Steigerwald ,  Rainer Knippelmeyer ,  Max Haider ,  Heiko Müller ,  Stephan Uhlemann

IPC: G03F7/20 ,  H01J31/00 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/28 ,  H01J2237/082 ,  H01J2237/2446

Abstract: An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.

Abstract translation: 一种用于对物体平面中定位的物体进行成像的检查系统，包括用于向物体的界定场提供能量的照明装置，使得带电粒子从场的位置出现，该场可在物体的平面中移动， 第一偏转器，用于提供可变偏转场，用于引导通过固定的预定光束横截面从物体的可选择区域的位置出射的带电粒子，以及设置在光束路径中的位置敏感检测器，使得带电粒子在 已经穿过第一偏转器，撞击位置敏感检测器，其中从该区域的不同位置出现的颗粒被成像在位置敏感检测器的分配到出现位置的不同位置上。

公开(公告)号：US08362442B2

公开(公告)日：2013-01-29

申请号：US12973984

申请日：2010-12-21

Applicant: Joachim Zach ,  Stephan Uhlemann

Inventor： Joachim Zach ,  Stephan Uhlemann

IPC: H01J37/141

CPC classification number: H01J37/153 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (xα, yβ) is produced in the quadrupole field (1′) of a first quadrupole element (1) and this quadrupole field (1′) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are produced in the region of the center of the quadrupole fields (3′, 4′) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2′) of a second quadrupole element (2), the axial fundamental rays (xα, yβ) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are located, each exhibit a maximum.

Abstract translation: 提出了一种用于电子显微镜的校正器（10），如果在四极场（1'）中产生轴向基本射线（xα，y＆bgr）的眩目中间图像（9），对于电源的波动较不敏感， ），并且该四极场（1'）被设置为使得在轴向中心的区域中产生离轴基波（xγ，yδ）的像散中间图像（12,13） 第三（3）和第四多极元件（4）的四极场（3'，4'），并且由于第二四极元件（2）的四极场（2'）的设定， 与偏轴基波（xγ，yδ）的中间图像（12,13）相同的部分（x，y）的基波（xα，y＆bgr）各自呈现最大值。

公开(公告)号：US07800076B2

公开(公告)日：2010-09-21

申请号：US12297306

申请日：2007-03-31

Applicant: Stephan Uhlemann ,  Harald Rose ,  Heiko Müller

Inventor： Stephan Uhlemann ,  Harald Rose ,  Heiko Müller

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J2237/1534

Abstract: A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes. The orientation of the hexapole field pairs is rotated with respect to the orientation defined by the hexapole fields by a sufficient angle so that the extra-axial third order coma is corrected.

Abstract translation: 一种使用圆形透镜和六极场消除三次孔径像差和三次超外差彗差的粒子光学校正器包括三个同轴布置的六极场，至少一个圆形透镜双曲线布置在相邻的六极场之间 并调整为使六边形中心六极场成像。 在六极场之间，以中间平面为准，中间平面彼此共轭。 三个六极场在拉莫尔参考系中相同取向，选择三个场的强度，使得具有三重对称性的像散的像差系数变为0.校正包含两个六极场，其中场 六极场对被彼此反对称地激励，并且在每种情况下这些对围绕两个中间平面布置。 六极场对的取向相对于由六极场确定的取向旋转足够的角度，以便校正异轴三阶彗差。

公开(公告)号：US07800074B2

公开(公告)日：2010-09-21

申请号：US12091411

申请日：2006-10-11

Applicant: Stephan Uhlemann

Inventor： Stephan Uhlemann

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J2237/153

Abstract: An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the corrector includes at least three coaxially arranged hexapole fields with at least one round lens field is arranged between adjacent hexapole fields, so that the hexapole fields are imaged onto each other in pairs. The intensities of the hexapole fields are selected so that the image error coefficient of the three-fold astigmatism is equal to 0, and at least three hexapole fields in the Larmor reference system are rotated in relation to each other at an angle about the optical axis.

Abstract translation: 一种电子光学校正器，其使用圆形透镜和六极场来渲染多余的三次打开误差和异轴三次彗差的各向异性部分，校正器包括至少三个同轴布置的六极场，其具有至少一个 圆形透镜场布置在相邻的六极场之间，使得六极场成对成对。 选择六极场的强度，使得三折像散的图像误差系数等于0，并且拉莫尔参考系中的至少三个六极场相对于彼此以围绕光轴的角度相互旋转 。

公开(公告)号：US20100181479A1

公开(公告)日：2010-07-22

申请号：US12459078

申请日：2009-06-25

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC: H01J3/00 ,  H01J37/02 ,  H01J37/26 ,  H01J37/30

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US20080265172A1

公开(公告)日：2008-10-30

申请号：US12091411

申请日：2006-10-11

Applicant: Stephan Uhlemann

Inventor： Stephan Uhlemann

IPC: H01J1/50

CPC classification number: H01J37/153 ,  H01J2237/153

Abstract: An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the corrector includes at least three coaxially arranged hexapole fields with at least one round lens field is arranged between adjacent hexapole fields, so that the hexapole fields are imaged onto each other in pairs. The intensities of the hexapole fields are selected so that the image error coefficient of the three-fold astigmatism is equal to 0, and at least three hexapole fields in the Larmor reference system are rotated in relation to each other at an angle about the optical axis.

Abstract translation: 一种电子光学校正器，其使用圆形透镜和六极场来渲染多余的三次打开误差和异轴三次彗差的各向异性部分，校正器包括至少三个同轴布置的六极场，其具有至少一个 圆形透镜场布置在相邻的六极场之间，使得六极场成对成对。 选择六极场的强度，使得三折像散的图像误差系数等于0，并且拉莫尔参考系中的至少三个六极场相对于彼此以围绕光轴的角度相互旋转 。

公开(公告)号：US06995378B2

公开(公告)日：2006-02-07

申请号：US10499165

申请日：2002-11-26

Applicant: Stephan Uhlemann ,  Maximilan Haider ,  Heiko Müller

Inventor： Stephan Uhlemann ,  Maximilan Haider ,  Heiko Müller

IPC: H01J37/145 ,  H01J37/153

CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J2237/3175

Abstract: Disclosed is a lens array having a laterally movable axis for corpuscular rays, particularly for transmission from areas of an object surface onto the focal plane by means of electrons. The inventive array consists of a combined lens comprising a cylinder lens and a quadrupole lens provided with slit diaphragms which can be impinged upon by electric and/or magnetic fields. The optical axis of the quadrupole lens is oriented parallel to the axis of the cylinder lens and defines the optical axis of the projection, the position of which can be altered in relation to the axis of the cylinder lens. The quadrupole lens is in focus in the sector in which the cylinder lens is not in focus and is out of focus in the section in which the cylinder lens is in focus. The inventive combined lens can be operated as an immersion lens for projecting secondary electrons. The immersion field consists of at least two adjacent axially aligned fields. The first field lies between the object and the first slit diaphragm, and the second field lies between the first slit diaphragm and the second slit diaphragm. Both fields can be focused independently from each other. The potential difference between the object and the first diaphragm is comparatively small in relation to the potential difference between the first diaphragm and the second diaphragm, and the potential course between the object and the first diaphragm has to be approximately linear. The combined lens is brought into/out of focus by superposing the immersion field, the cylinder lens field, and the quadrupole field. Alternatively, the lens array can be used as a cathode lens for a photocathode with several homogenous adjacent emission areas.

Abstract translation: 公开了一种透镜阵列，其具有用于粒子束的横向可移动轴，特别是用于通过电子从物体表面到焦平面上的区域的透射。 本发明的阵列由包括柱面透镜和四极透镜的组合透镜组成，该四极透镜设置有可被电场和/或磁场撞击的狭缝光阑。 四极透镜的光轴定向为平行于柱面透镜的轴线并且限定投影的光轴，其位置可以相对于柱面透镜的轴线改变。 四极透镜在柱面透镜未聚焦的区域中聚焦，并且在柱面透镜聚焦的部分中不对焦。 本发明的组合透镜可以用作投影二次电子的浸没透镜。 浸入场由至少两个相邻的轴向排列的场组成。 第一场位于物体和第一狭缝光阑之间，第二场位于第一狭缝光阑和第二狭缝光阑之间。 这两个领域可以彼此独立地集中。 物体与第一膜片之间的电位差相对于第一膜片和第二膜片之间的电位差相对较小，并且物体与第一膜片之间的电位过程必须近似线性。 组合透镜通过叠加浸没场，气缸透镜场和四极场进入/离开焦点。 或者，透镜阵列可以用作具有几个均匀的相邻发射区域的用于光电阴极的阴极透镜。

公开(公告)号：US08637834B2

公开(公告)日：2014-01-28

申请号：US13342017

申请日：2011-12-31

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximillian Haider ,  Antonio Casares ,  Steven Rogers

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximillian Haider ,  Antonio Casares ,  Steven Rogers

IPC: H01J37/28 ,  H01J3/14 ,  H01J1/50

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US20120153147A1

公开(公告)日：2012-06-21

申请号：US12973984

申请日：2010-12-21

Applicant: Joachim Zach ,  Stephan Uhlemann

Inventor： Joachim Zach ,  Stephan Uhlemann

IPC: H01J3/20 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: A corrector (10) for an electron microscope is proposed which is less sensitive to fluctuations of the electrical power supply if a stigmatic intermediate image (9) of the axial fundamental rays (xα, yβ) is produced in the quadrupole field (1′) of a first quadrupole element (1) and this quadrupole field (1′) is set such that astigmatic intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are produced in the region of the center of the quadrupole fields (3′, 4′) of a third (3) and fourth multipole element (4) and there also, due to the setting of the quadrupole field (2′) of a second quadrupole element (2), the axial fundamental rays (xα, yβ) of the same section (x, y) as that, in which the intermediate images (12, 13) of the off-axial fundamental rays (xγ, yδ) are located, each exhibit a maximum.

Abstract translation: 提出了一种用于电子显微镜的校正器（10），如果在四极场（1'）中产生轴向基本射线（xα，y＆bgr）的眩目中间图像（9），对于电源的波动较不敏感， ），并且该四极场（1'）被设置为使得在轴向中心的区域中产生离轴基波（xγ，yδ）的像散中间图像（12,13） 第三（3）和第四多极元件（4）的四极场（3'，4'），并且由于第二四极元件（2）的四极场（2'）的设定， 与偏轴基波（xγ，yδ）的中间图像（12,13）相同的部分（x，y）的基波（xα，y＆bgr）各自呈现最大值。