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公开(公告)号：US20240085379A1
公开(公告)日：2024-03-14
申请号：US18268467
申请日：2021-12-15
Applicant: ASML Netherlands B.V.
Inventor： Mustafa Ümit ARABUL , Zili ZHOU , Willem Marie,Julia,Marcel COENE , Coen Adrianus VERSCHUREN , Paul, Louis,Maria Joseph VAN NEER , Daniele PIRAS , Sandra BLAAK , Wouter Dick KOEK , Robert Wilhelm WILLEKERS
CPC classification number: G01N29/04 , G01N29/262 , G01N29/28 , G01N2291/023 , G01N2291/106
Abstract: A metrology apparatus for determining one or more parameters of a structure fabricated in or on a semiconductor substrate. The apparatus comprises a transducer array comprising a plurality of transducers positioned in a plane. The plurality of transducers comprises at least one transmitter transducer for emitting acoustic radiation in a frequency range from 1 GHz to 100 GHz towards the structure, and at least one receiver transducer for receiving acoustic radiation reflected and/or diffracted from the structure.
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102.发明授权公开(公告)号：US11929232B2
公开(公告)日：2024-03-12
申请号：US17026044
申请日：2020-09-18
Applicant: ASML Netherlands B.V.
Inventor： Frank Nan Zhang , Zhongwei Chen , Yixiang Wang , Ying Crystal Shen
CPC classification number: H01J37/265 , H01J37/045 , H01J37/266 , H01J37/28 , H01J2237/0044 , H01J2237/0048 , H01J2237/0453 , H01J2237/0455 , H01J2237/0458 , H01J2237/049 , H01J2237/28 , H01J2237/2817
Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.
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公开(公告)号：US20240077803A1
公开(公告)日：2024-03-07
申请号：US18273618
申请日：2021-12-30
Applicant: ASML NETHERLANDS B.V. , ASML Holding N.V.
IPC: G03F7/00
CPC classification number: G03F7/702 , G03F7/70166 , G03F7/70208 , G03F7/70891
Abstract: Systems, apparatuses, and methods are provided for heating a plurality of optical components. An example method can include receiving an input radiation beam from a radiation source. The example method can further include generating a plurality of output radiation beams based on the input radiation beam. The example method can further include transmitting the plurality of output radiation beams towards a plurality of heater head optics configured to heat the plurality of optical components. Optionally, the example method can further include controlling a respective power value, and realizing a flat-top far-field profile, of each of the plurality of output radiation beams.
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公开(公告)号：US11914308B2
公开(公告)日：2024-02-27
申请号：US18123620
申请日：2023-03-20
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70808 , G03F9/70 , G03F9/7015 , G03F9/7019 , G03F9/7049 , G03F9/7084 , G03F9/7088 , G03F7/70633
Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
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105.发明公开公开(公告)号：US20240062356A1
公开(公告)日：2024-02-22
申请号：US18268924
申请日：2021-12-09
Applicant: ASML Netherlands B.V.
Inventor： Huina XU , Yana MATSUSHITA , Tanbir HASAN , Ren-Jay KOU , Namita Adrianus GOEL , Hongmei LI , Maxim PISARENCO , Marleen KOOIMAN , Chrysostomos BATISTAKIS , Johannes ONVLEE
IPC: G06T7/00
CPC classification number: G06T7/0004 , G06T2207/10061 , G06T2207/20021 , G06T2207/30148 , G06T2207/20081
Abstract: A method and apparatus for analyzing an input electron microscope image of a first area on a first wafer are disclosed. The method comprises obtaining a plurality of mode images from the input electron microscope image corresponding to a plurality of interpretable modes. The method further comprises evaluating the plurality of mode images, and determining, based on evaluation results, contributions from the plurality of interpretable modes to the input electron microscope image. The method also comprises predicting one or more characteristics in the first area on the first wafer based on the determined contributions. In some embodiments, a method and apparatus for performing an automatic root cause analysis based on an input electron microscope image of a wafer are also disclosed.
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Patent Agency Ranking
公开(公告)号：US20240061348A1
公开(公告)日：2024-02-22
申请号：US18268847
申请日：2021-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Bram Antonius Gerardus LOMANS , Arie Jeffrey DEN BOEF , Hans BUTLER
IPC: G03F7/00
CPC classification number: G03F7/706843 , G03F7/7085
Abstract: A metrology apparatus for measuring a parameter of interest of a target on a substrate, the metrology apparatus including: m×n detectors, wherein m≥1 and n≥1; a first frame; and (n−1) second frames; and (m−1)×n intermediate frames, wherein each detector is connected to one of the intermediate or first or second frames via a primary positioning assembly; and each intermediate frame is connected to one of the first or second frames via a secondary positioning assembly.
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公开(公告)号：US20240060906A1
公开(公告)日：2024-02-22
申请号：US18270074
申请日：2021-12-20
Applicant: ASML Netherlands B.V.
Inventor： Bart Jacobus Martinus TIEMERSMA , Alexandru ONOSE , Nick VERHEUL , Remco DIRKS
IPC: G01N21/95 , G03F7/00 , G06N3/0455 , G06N3/0895
CPC classification number: G01N21/9501 , G03F7/70625 , G03F7/706839 , G06N3/0455 , G06N3/0895
Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.
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公开(公告)号：US11906907B2
公开(公告)日：2024-02-20
申请号：US16765339
申请日：2018-11-27
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Derk Servatius Gertruda Brouns , Joshua Adams , Aage Bendiksen , Richard Jacobs , Andrew Judge , Veera Venkata Narasimha Narendra Phani Kottapalli , Joseph Harry Lyons , Theodorus Marinus Modderman , Manish Ranjan , Marcus Adrianus Van De Kerkhof , Xugang Xiong
CPC classification number: G03F7/7085 , G03F1/62 , G03F1/64 , G03F7/70033 , G03F7/70891 , G03F7/70983
Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
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109.发明公开公开(公告)号：US20240055219A1
公开(公告)日：2024-02-15
申请号：US18269269
申请日：2021-11-29
Applicant: ASML Netherlands B.V.
Inventor： Mans Johan Bertil OSTERBERG , Kenichi KANAI
IPC: H01J37/147 , H01J37/05 , H01J37/153 , H01J37/28 , H01J37/24
CPC classification number: H01J37/1472 , H01J37/05 , H01J37/153 , H01J37/28 , H01J37/24 , H01J2237/1508
Abstract: Apparatus and methods for directing a beam of primary electrons along a primary beam path onto a sample are disclosed. In one arrangement, a beam separator diverts away from the primary beam path a beam of secondary electrons emitted from the sample along the primary beam path. A dispersion device is upbeam from the beam separator. The dispersion device compensates for dispersion induced in the primary beam by the beam separator. One or more common power supplies drive both the beam separator and the dispersion device.
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公开(公告)号：US20240045341A1
公开(公告)日：2024-02-08
申请号：US18266246
申请日：2021-12-09
Applicant: ASML NETHERLANDS B.V. , Cymer, LLC
Inventor： Willard Earl CONLEY , Duan-Fu Stephen HSU , Joshua Jon THORNES , Johannes Jacobus Matheus BASELMANS
CPC classification number: G03F7/70575 , G03F7/70583 , G03F7/70025 , G03F7/2004
Abstract: A method for improving a lithographic process of imaging a portion of a design layout onto a substrate using a lithographic apparatus. The method includes computing a multi-variable cost function that is a function of: (i) a plurality of design variables that affect characteristics of the lithographic process and (ii) a radiation bandwidth of a radiation source of the lithographic apparatus; and reconfiguring one or more of the characteristics (e.g., EPE, image contrast, resist, etc.) of the lithographic process by adjusting one or more of the design variables (e.g., source, mask layout, bandwidth, etc.) until a termination condition is satisfied. The termination condition includes a speckle characteristic (e.g., a speckle contrast) maintained within a speckle specification associated with the radiation source and also maintaining an image contrast associated with the lithographic process within a desired range. The speckle characteristic being a function of the radiation bandwidth.
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