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111.发明申请公开(公告)号：US20180068047A1
公开(公告)日：2018-03-08
申请号：US15389558
申请日：2016-12-23
Applicant: MAPPER Lithography IP B.V.
IPC: G06F17/50
CPC classification number: G06F17/5072 , G06F17/5077 , G06F2217/12 , H01L21/027 , H01L21/0274 , H01L21/0277 , H01L21/76816 , H01L23/573
Abstract: A method of creating electronic devices such as semiconductor chips using a maskless lithographic exposure system such as a charged particle multi-beamlet lithography system (301A-301D). The maskless lithographic exposure system comprises a lithography subsystem (316) including a maskless pattern writer such as a charged particle multi-beamlet lithography machine (1) or ebeam machine. The method comprises introducing unique chip design data (430) or information related thereto into pattern data comprising common chip design data before streaming the pattern data to the maskless pattern writer.
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112.发明申请公开(公告)号：US20180006765A1
公开(公告)日：2018-01-04
申请号：US15196711
申请日：2016-06-29
Applicant: Mapper Lithography IP B.V.
Inventor： Marco Jan-Jaco WIELAND
IPC: H04L1/00
CPC classification number: H04L1/0041 , H04L1/0058 , H04L25/49
Abstract: The present invention relates to a method and encoding device for encoding a sequence of m-bit pattern words and outputting as a bit-stream a frame comprising corresponding n-bit symbols as well as a predetermined comma symbol, wherein m
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113.发明授权公开(公告)号：US09829804B1
公开(公告)日：2017-11-28
申请号：US15222705
申请日：2016-07-28
Applicant: Mapper Lithography IP B.V.
IPC: G03B27/32 , G03B27/52 , G03B27/58 , G03F7/20 , H01L21/687
CPC classification number: G03F7/70716 , G03F7/707 , G03F7/70875 , H01L21/67109 , H01L21/6875 , H01L21/68785
Abstract: The invention relates to a substrate holding device comprising a holding plate, a base plate, an array of supports, and an array of droplets of a heat absorbing material. The holding plate comprises a first side for holding a substrate. The base plate is arranged at a distance from the holding plate and provides a gap between the base plate and the holding plate at a side of the holding plate opposite to the first side. The array of supports is arranged in between the holding plate and the base plate. The array of liquid and/or solid droplets is arranged in between the holding plate and the base plate, and the droplets are arranged to contact both the base plate and the holding plate. The droplets are arranged spaced apart from each other and from the supports, and are arranged adjacent to each other in a direction along the gap.
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公开(公告)号：US20170307987A1
公开(公告)日：2017-10-26
申请号：US15642359
申请日：2017-07-06
Applicant: MAPPER LITHOGRAPHY IP B.V.
IPC: G03F7/20 , H01J37/02 , B82Y10/00 , H01J37/317 , B82Y40/00
CPC classification number: G03F7/70891 , B82Y10/00 , B82Y40/00 , G03F7/709 , H01J37/02 , H01J37/3177 , H01J2237/002 , H01J2237/0216 , H01J2237/28
Abstract: Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: a support body for supporting the radiation projection system; electrical wiring for supplying voltages to components within the radiation projection system and/or for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system; optical fibers, for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system, and a cooling arrangement comprising one or more fluid conduits for cooling the radiation projection system; the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.
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公开(公告)号：US20170221674A1
公开(公告)日：2017-08-03
申请号：US15493159
申请日：2017-04-21
Applicant: MAPPER LITHOGRAPHY IP B.V.
Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
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Patent Agency Ranking
公开(公告)号：US09653261B2
公开(公告)日：2017-05-16
申请号：US14400569
申请日：2013-05-14
Applicant: MAPPER LITHOGRAPHY IP B.V.
CPC classification number: H01J37/09 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/3007 , H01J37/302 , H01J37/3174 , H01J37/3177 , H01J2237/002 , H01J2237/026 , H01J2237/0262 , H01J2237/0264 , H01J2237/16 , H01J2237/182 , H01J2237/188
Abstract: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam; a collimator system (5a,5b,5c,5d; 72;300) for refracting the diverging charged particle beam; and a cooling arrangement (203) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.
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公开(公告)号：US20160370704A1
公开(公告)日：2016-12-22
申请号：US15250977
申请日：2016-08-30
Applicant: Mapper Lithography IP B.V.
Inventor： Hendrik Jan DE JONG , Marco Jan-Jaco WIELAND
IPC: G03F7/20 , H01L21/687
CPC classification number: G03F7/707 , H01L21/6838 , H01L21/68707 , H01L21/68742 , H01L21/6875 , H01L21/68785 , Y10T29/49815 , Y10T29/49998 , Y10T29/53
Abstract: The invention relates to a substrate handling and exposure arrangement comprising a plurality of lithography apparatus, a clamp preparation unit for clamping a wafer on a wafer support structure, a wafer track, wherein the clamp preparation unit is configured for accepting a wafer from the wafer track, and an additional wafer track for transferring the clamp towards the plurality of lithography apparatus.
Abstract translation: 本发明涉及一种基板处理和曝光装置，其包括多个光刻设备，用于将晶片夹持在晶片支撑结构上的夹具准备单元，晶片轨道，其中夹具准备单元被配置为从晶片轨道接收晶片 ，以及用于将夹具转移到多个光刻设备的另外的晶片轨道。
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公开(公告)号：US09507629B2
公开(公告)日：2016-11-29
申请号：US14738962
申请日：2015-06-15
Applicant: MAPPER LITHOGRAPHY IP B.V.
Inventor： Marcel Nicolaas Jacobus Van Kervinck , Guido De Boer
IPC: G06F9/46 , G06F19/00 , G06F9/48 , G03F7/20 , H01J37/317 , B82Y10/00 , B82Y40/00 , G05B19/418
CPC classification number: G06F9/48 , B82Y10/00 , B82Y40/00 , G03F7/70483 , G03F7/70508 , G03F7/70525 , G03F7/70991 , G05B19/41865 , G06F9/4881 , H01J37/3177
Abstract: A lithography system having one or more lithography elements Each lithography element has a plurality of lithography subsystems. The lithography system further has a control network forming a control network path between the plurality of the lithography subsystems and at least one element control unit for communication of control information. The lithography system is arranged for: issuing control information to the at least one element control unit to control operation of one or more of the lithography subsystems for exposure of one or more wafers; issuing a process program to the element control unit. The process program has a set of predefined commands and associated parameters. The element control unit is arranged to transmit a command of the process program to a lithography subsystem to be executed by the lithography subsystem, regardless of an execution status of a preceding command transmitted to the lithography subsystem.
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公开(公告)号：US09484188B2
公开(公告)日：2016-11-01
申请号：US14644261
申请日：2015-03-11
Applicant: MAPPER LITHOGRAPHY IP B.V.
Inventor： Niels Vergeer
IPC: G03F1/00 , G03F9/00 , H01J37/317 , G01N21/88
CPC classification number: H01J37/3177 , G01N21/88 , G03F9/7088 , H01J37/3045 , H01J2237/2482 , H01J2237/30433 , H01J2237/31798
Abstract: Methods and systems for verification of a mark written on a target surface during a multiple beam lithography process, and for verifying beam position of individual beams on the target surface based on mark verification are disclosed. A mark can be verified by scanning an optical beam over the mark and measuring the reflected optical beam and the position of the target with respect to the optical beam. By comparing the intensity of the reflected light as a function of distance over the mark with reference mark data representing an intended definition of the mark, and any deviation between the measured representation and the reference mark data are determined. If any deviation deviate more than the predetermined limit, incorrectly positioned beams can be verified from the data.
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120.发明授权Cathode arrangement, electron gun, and lithography system comprising such electron gun 有权阴极装置，电子枪和包括这种电子枪的光刻系统公开(公告)号：US09455112B2
公开(公告)日：2016-09-27
申请号：US14578525
申请日：2014-12-22
Applicant: MAPPER LITHOGRAPHY IP B.V
Inventor： Laura Dinu-Gürtler , Eric Petrus Hogervorst
IPC: H01J29/04 , H01J1/15 , G03F7/20 , H01J37/075 , H01J37/317 , H01J1/28 , H01J3/02
CPC classification number: H01J37/3174 , G03F7/70058 , H01J1/15 , H01J1/28 , H01J3/027 , H01J3/029 , H01J37/075 , H01J37/3177 , H01J2229/481 , H01J2237/061
Abstract: The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
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