Abstract:
The invention relates to a method for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method, according to which a hydrogen-free media flow containing a glass starting material and a carrier gas is fed to a multi-nozzle deposition burner. The glass starting material is introduced into a plasma zone by the deposition burner and is oxidized therein while forming SiO2 particles, and the SiO2 particles are deposited on a deposition surface while being directly vitrified. In order to increase the deposition efficiency, the invention provides that the deposition burner (1) focuses the media flow toward the plasma zone (4) by. A multi-nozzle plasma burner, which is suited for carrying out the method and which is provided with a media nozzle for feeding a media flow to the plasma zone, is characterized in that the media nozzle (7) is designed so that it is focussed toward the plasma zone (4). The focussing is effected by a tapering (6) of the media nozzle (7).
Abstract:
The specification describes an improved optical fiber produced by a hybrid VAD/MCVD process. The core of the fiber is produced using VAD and the inner cladding layer has a depressed index and is produced using MCVD. In preferred embodiments, the optical power envelope is essentially entirely contained in VAD produced core material and the MCVD produced depressed index cladding material. Optical loss is minimized by confining most of the optical power to the VAD core where OH presence is low, as well as by maximizing the optical power in the un-doped silica region. The MCVD substrate tube material is essentially devoid of optical power.
Abstract:
The present invention relates to a method for manufacturing a preform for optical fibres, wherein deposition of glass-forming compounds on the substrate takes place. The present invention furthermore relates to a method for manufacturing optical fibres, wherein one end of a solid preform is heated, after which an optical fibre is drawn from said heated end.
Abstract:
The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
Abstract:
The specification describes an improved optical fiber produced by a hybrid VAD/MCVD process. The core of the fiber is produced using VAD and the inner cladding layer has a depressed index and is produced using MCVD. In preferred embodiments, the optical power envelope is essentially entirely contained in VAD produced core material and the MCVD produced depressed index cladding material. Optical loss is minimized by confining most of the optical power to the VAD core where OH presence is low, as well as by maximizing the optical power in the un-doped silica region. The MCVD substrate tube material is essentially devoid of optical power.
Abstract:
A method for producing a silica container having a rotational symmetry is provided. The method includes, forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.
Abstract:
Disclosed are methods for hydrogen loading silica glass and silica glass comprising loaded H2. The methods can lead to H2 gradient in the glass material. Alternatively, the method may involve the use of varying H2 partial pressure of H2 in the atmosphere. Both can result in expedited hydrogen loading process.
Abstract:
Provided is a method of manufacturing an optical fiber base material having at least four layer including a core, a first cladding, a second cladding containing fluorine, and a third cladding. The manufacturing method comprises preparing a starting base material that includes the core and the first cladding; forming a porous intermediate glass base material by supplying glass raw material and oxygen to a high-frequency induction thermal plasma torch to synthesize glass fine particles that are then deposited on a surface of the starting base material; forming an intermediate glass base material that includes the core, the first cladding, and the second cladding containing fluorine, by heating and vitrifying the porous intermediate glass base material in an atmosphere containing fluorine; and providing the third cladding on the outer surface of the intermediate glass base material.
Abstract:
An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.
Abstract:
The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.