Abstract:
A method for forming EUV LITHOGRAPHY GLASS STRUCTURES WITH VOIDS is disclosed which includes forming a slurry mixture including silica soot particles, and inserting the slurry mixture into a casting mold. The method provides low weight mass reduced rigid glass structures with beneficial thermal stability. The casting mold includes therein a casting form. The casting form is adapted to provide selected geometry void spaces within the glass lithography structure. The slurry mixture is dried to form a green ware object. The casting form is removed from the green ware and the green ware object is consolidated into a lithography glass structure with voids.
Abstract:
A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
Abstract:
A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.
Abstract:
A process for manufacturing glass bodies of doped silicate glass is disclosed. The process involves flame hydrolysis, wherein precursors for the forming of the doped glass are fed together with fuel gases into a single burner. A first formed body is generated on a target. The doped silicate glass produced in this way offers a low density of defects and a small breadth of striae. Preferably the first formed body is subsequently formed into a second formed body having a larger breadth and a smaller length than the first formed body. Thereby, the breadth of striae and the density of defects in the doped silica glass is further reduced.
Abstract:
Aqueous dispersion comprising silicon/titanium mixed oxide powder with a BET surface area of 5 to 500 m2/g which has been prepared by flame hydrolysis and has a titanium dioxide content of 0.5 to 20 wt. %, based on the powder, water and at least one pH-regulating substance which can be removed completely from the reaction mixture on heating, the aqueous dispersion having a solids content of between 40 and 80 wt. %. A green body produced therefrom with a green density of between 40 and 85%. A shaped glass article of optical quality with a coefficient of thermal expansion of not more than 0.5null10null6/K produced from the green body.
Abstract:
An improved sol-gel process is disclosed for producing a synthetic silica glass article, in which a sol is formed having a silica loading as high as 34 to 40%. This high loading is achieved by introducing an aqueous colloidal silica suspension into a silicon alkoxide solution and slowly stirring the mixture together, during which time the mixture hydrolyzes and the colloidal suspension is broken down by chemical reaction. This produces a hydrolyzed sol incorporating a suspension of very fine aggregates of colloidal particles, having particle sizes less than about 10 microns. The need for a stabilizing agent and/or continuous ultra-sonicating or violently stirring the sol is eliminated.
Abstract:
SiO2nullTiO2 glasses having a low coefficient of thermal expansion are produced by a molding being produced that consists of SiO2 powder, SiO2nullTiO2 powder or TiO2 powder and that contains by way of secondary component a titanium-containing component which is converted into amorphous TiO2.
Abstract:
Deuterium oxide, D2O, also called heavy water, is used for the hydrolysis of silanes and metal compounds. The D2O-hydrolyzed silanes polycondense much easier than H2O-hydrolyzed silanes, resulting in a fast SinullOnullSi network build up. The most important feature of using D2O is that the final materials are 100% free of OnullH and the residual OnullD bond does not have an absorption peak in the wavelength range of 1.0 to 1.8 nullm, which is crucial in reducing optical loss at the wavelengths of 1.3 and especially 1.55 nullm. OnullH free sol-gel materials with low optical loss have been developed based on this process. D2O may be applied in all kinds of hydrolysis-processes, such as the sol-gel process of silanes and metal compounds, the synthesis of polysiloxane, and may be extended to other silica and metal-oxides deposition processes for example, flame hydrolysis deposition (FHD) whenever water is used or OnullH bond involved. The concept of replacing OnullH bond with OnullD bond is applicable to any OnullH bond containing materials used in optical based telecommunication.
Abstract:
Ultraviolet (UV) radiation in the UV-C and UV-B bands, which is particularly dangerous, is absorbed and filtered by quartz glass doped with between 0.065% and 3.25%, and preferably between 0.065% and 1.3%, by weight, of cerium metal, or cerium as such. Preferably, the cerium is added to quartz sand and/or rock crystal, in form of a fine-grained powder of up to 20 .mu.m grain size, in form of cerium aluminate (CeAlO.sub.3), present in up to about 5% by weight, and preferably up to about 2%, by weight, and melted together in a single step. The quartz glass so obtained is particularly suitable for a metal halide discharge lamp, e.g. as an outer envelope (1), or as the discharge vessel (27) itself, or for halogen incandescent lamps, to form the quartz-glass light bulb or an envelope therefor. A small quantity of titanium oxide, up to about 0.05%, may be added as a further doping agent to the melt to further improve the UV absorption in the B and C bands.
Abstract:
Gradient-index glass is produced in a sol-gel process by utilizing water or a mixture of water and alcohol. This technique is particularly suitable for production of glass bodies with a ternary system of metal alkoxides, including silicon alkoxide, an index modifying metal alkoxide, such as alkoxides of titanium and zirconium, and an additional metal alkoxide, such as an alkoxide of aluminum, boron, or germanium.