公开(公告)号：US20020114600A1

公开(公告)日：2002-08-22

申请号：US09985477

申请日：2001-11-05

Applicant: THE FURUKAWA ELECTRIC CO., LTD.

Inventor： Keiichi Aiso ,  Yoshio Tashiro ,  Takeshi Yagi

IPC: G02B006/16

CPC classification number: G02B6/03644 ,  C03C3/06 ,  C03C13/046 ,  C03C2201/12 ,  C03C2201/28 ,  C03C2201/31 ,  C03C2201/34 ,  C03C2201/3476 ,  C03C2201/3488 ,  C03C2201/36 ,  G02B6/03627 ,  G02B6/03633 ,  H01S3/0672 ,  H01S3/06729

Abstract: A light amplification optical fiber capable of suppressing a decrease in an amplification efficiency thereof ascribed to the concentration quenching of erbium ions, and the nonlinearity thereof is provided. At least one rare earth element, for example, Yb, which is other than the erbium ions, and which has an ion radius not smaller than 70% and not larger than 130% of that of erbium ions is doped to a core portion of an erbium ion-doped light amplification optical fiber.

Abstract translation: 提供了能够抑制由铒离子的浓度猝灭引起的放大效率降低的光放大光纤及其非线性。 至少一种稀土元素，例如不是铒离子的Yb，其离子半径不小于铒离子的70％且不大于130％的离子半径被掺杂到 铒离子掺杂光放大光纤。

公开(公告)号：US20020013208A1

公开(公告)日：2002-01-31

申请号：US09933749

申请日：2001-08-22

Applicant: NIKON CORPORATION

Inventor： Norio Komine ,  Seishi Fujiwara ,  Hiroki Jinbo

IPC: C03C003/112

CPC classification number: C03B19/14 ,  C03B19/1423 ,  C03B19/1484 ,  C03B37/014 ,  C03B37/0142 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/30 ,  C03B2207/36 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/46 ,  G03F7/2004 ,  Y10S65/90

Abstract: A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.

公开(公告)号：US20010027025A1

公开(公告)日：2001-10-04

申请号：US09876194

申请日：2001-06-06

Inventor： George Edward Berkey ,  Lisa Anne Moore ,  Charles Chunzhe Yu

IPC: H01L021/302 ,  H01L021/461

CPC classification number: C03B23/07 ,  C03B19/1415 ,  C03B19/1423 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B23/043 ,  C03B23/045 ,  C03B23/051 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2207/02 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/32 ,  C03B2207/52 ,  C03B2207/54 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2203/50 ,  G03F1/60

Abstract: The invention includes methods of making lithography photomask blanks. The invention also includes lithography photomask blanks and preforms for producing lithography photomask. The method of making a lithography photomask blank includes providing a soot deposition surface, producing SiO2 soot particles and projecting the SiO2 soot particles toward the soot deposition surface. The method includes successively depositing layers of the SiO2 soot particle on the deposition surface to form a coherent SiO2 porous glass preform body comprised of successive layers of the SiO2 soot particles and dehydrating the coherent SiO2 glass preform body to remove OH from the preform body. The SiO2 is exposed to and reacted with a fluorine containing compound and consolidated into a nonporous silicon oxyfluoride glass body with parallel layers of striae. The method further includes forming the consolidated silicon oxyfluoride glass body into a photomask blank having a planar surface with the orientation of the striae layer parallel to the photomask blank planar surface.

Abstract translation: 本发明包括制造光刻光掩模坯料的方法。 本发明还包括光刻光掩模坯料和用于生产光刻光掩模的预成型件。 制造光刻光掩模坯料的方法包括提供烟灰沉积表面，产生SiO 2烟灰颗粒并将SiO 2烟灰颗粒投射到烟灰沉积表面。 该方法包括在沉积表面上依次沉积SiO 2烟灰颗粒的层，以形成由SiO 2烟灰颗粒的连续层组成的粘结SiO 2多孔玻璃预制体，并使相干的SiO 2玻璃预制体脱水以从预成型体中去除OH。 将SiO 2暴露于含氟化合物并与其反应，并固化成具有平行的条纹层的无孔氟氧化硅玻璃体。 该方法还包括将固化的氟氧化硅玻璃体形成为具有平坦表面的光掩模坯料，其中条纹层的取向平行于光掩模坯料平面。

公开(公告)号：US20010014424A1

公开(公告)日：2001-08-16

申请号：US09799987

申请日：2001-03-06

Inventor： Lisa A. Moore ,  Charlene Smith

IPC: G03F009/00 ,  C03C003/04 ,  C03C003/06 ,  C03C003/112 ,  G03C005/00

CPC classification number: C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  G03F1/60 ,  Y02P40/57

Abstract: High purity silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a nulldry,null silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1null1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract translation: 公开了适用于在低于190nm的VUV波长区域中用于光刻应用的光掩模基板的高纯度氟氧化硅玻璃。 本发明的氟氧化硅玻璃在157nm波长下是透射的，使其特别适用于157nm波长区域的光掩模衬底。 本发明的光掩模基材是“真空”的氟氧化硅玻璃，其在真空紫外（VUV）波长区域中表现出非常高的透射率，同时保持通常与高纯度熔融石英相关的优异的热和物理性能。 除了含氟并且具有很少或不含OH含量之外，本发明的适合用作157nm的光掩模衬底的氟氧化硅玻璃的特征还在于具有小于1×10 17分子/ cm 3的分子氢和低氯水平。

公开(公告)号：US11952302B2

公开(公告)日：2024-04-09

申请号：US17395791

申请日：2021-08-06

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Stefan Ochs ,  Thomas Kayser ,  Martin Trommer ,  Andreas Langner ,  Sascha Pihan ,  Kay Schuster ,  Michael Hünermann

IPC: C03B19/14 ,  C03C3/06

CPC classification number: C03B19/143 ,  C03B19/1423 ,  C03B19/1453 ,  C03C3/06 ,  C03B2201/12 ,  C03B2207/30 ,  C03C2201/12 ,  C03C2203/40

Abstract: A process for the production of a fluorinated quartz glass including the steps of generating SiO2 particles in a synthesis burner; depositing the resulting SiO2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to −10° C. is supplied to the synthesis burner.

公开(公告)号：US20190248696A1

公开(公告)日：2019-08-15

申请号：US16390139

申请日：2019-04-22

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina ,  William Rogers Rosch

IPC: C03C3/076 ,  C03C3/06 ,  C03C3/112 ,  C03B19/12 ,  C03C3/089 ,  C03C23/00 ,  C03B19/14 ,  C03B25/00 ,  C03B25/02

CPC classification number: C03C3/076 ,  C03B19/12 ,  C03B19/1453 ,  C03B25/00 ,  C03B25/02 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C3/089 ,  C03C3/112 ,  C03C23/007 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/14 ,  C03C2203/52

Abstract: Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

公开(公告)号：US20190154911A1

公开(公告)日：2019-05-23

申请号：US16193819

申请日：2018-11-16

Applicant: Corning Incorporated

Inventor： Dana Craig Bookbinder ,  Steven Bruce Dawes ,  Ming-Jun Li ,  Pushkar Tandon

IPC: G02B6/028 ,  G02B6/036

CPC classification number: G02B6/0281 ,  C03B37/01446 ,  C03B37/01453 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/24 ,  C03B2203/24 ,  C03B2203/26 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/08 ,  C03C2201/11 ,  C03C2201/12 ,  G02B6/03627

Abstract: A co-doped optical fiber is provided having an attenuation of less than about 0.17 dB/km at a wavelength of 1550 nm. The fiber includes a core in the fiber having a graded refractive index profile with an alpha of greater than 5. The fiber also includes a cladding in the fiber that surrounds the core addition, the core includes silica that is co-doped with two or more halogens.

公开(公告)号：US20190016630A1

公开(公告)日：2019-01-17

申请号：US16031319

申请日：2018-07-10

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Keisei MORITA ,  Yoshiaki TAMURA ,  Hirotaka SAKUMA

IPC: C03C13/04

CPC classification number: C03C13/046 ,  C03B37/01228 ,  C03B37/0124 ,  C03B37/01248 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/29 ,  C03C3/06 ,  C03C13/045 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/50 ,  C03C2201/54

Abstract: An optical fiber preform includes a silica-glass core portion, and a cladding portion surrounding the core portion, the cladding portion being composed of a fluorine-containing silica glass having a lower refractive index than the core portion, the core portion including a first region that does not include the central axis thereof, the first region containing a first dopant selected from sodium, potassium, and compounds thereof, and a second region that includes the central axis, the second region containing a second dopant that reduces the viscosity of the silica glass, the second dopant having a diffusion coefficient of 1×10−12 cm2/s or more and less than the first dopant at 2,000° C. to 2,300° C., in which the entire core portion has an average first dopant concentration of 10 atomic ppm or more and 2,000 atomic ppm or less and an average second dopant concentration of 10 atomic ppm or more.

公开(公告)号：US09851499B2

公开(公告)日：2017-12-26

申请号：US15435679

申请日：2017-02-17

Applicant: Corning Incorporated

Inventor： Dana Craig Bookbinder ,  Ming-Jun Li ,  Hazel Benton Matthews, III ,  Snigdharaj Kumar Mishra ,  Pushkar Tandon

IPC: G02B6/036 ,  G02B6/02 ,  C03C13/04 ,  C03C3/06 ,  C03B37/018

CPC classification number: G02B6/02019 ,  C03B37/01446 ,  C03B37/01453 ,  C03B37/018 ,  C03B37/01846 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2203/22 ,  C03B2203/23 ,  C03B2207/32 ,  C03C3/06 ,  C03C13/045 ,  C03C13/046 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2213/00 ,  G02B6/02009 ,  G02B6/02238 ,  G02B6/02395 ,  G02B6/03627 ,  G02B6/0365

Abstract: An optical fiber with large effective area, low bending loss and low attenuation. The optical fiber includes a core, an inner cladding region, and an outer cladding region. The core region includes a spatially uniform updopant to minimize low Rayleigh scattering and a relative refractive index and radius configured to provide large effective area. The inner cladding region features a large trench volume to minimize bending loss. The core may be doped with Cl and the inner cladding region may be doped with F.

公开(公告)号：US09834468B2

公开(公告)日：2017-12-05

申请号：US14769382

申请日：2014-02-19

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: F21V9/00 ,  G02B5/02 ,  G02C7/10 ,  G02F1/361 ,  G03B11/00 ,  C03C3/06 ,  C03B19/14 ,  C03B32/00 ,  G02B1/00 ,  G02B1/02 ,  C03B32/02 ,  C03C4/04 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.