公开(公告)号：US20200335297A1

公开(公告)日：2020-10-22

申请号：US16841737

申请日：2020-04-07

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiro Kishi ,  Mitsuhiro Okazawa

IPC: H01J37/09 ,  H01J37/317 ,  H01J37/244

Abstract: Provided is a multi charged particle beam writing apparatus, including: an emission unit emitting a charged particle beam; a first aperture substrate having a plurality of first openings, the first aperture being irradiated with the charged particle beam, and the first aperture allowing a portion of the charged particle beam to pass through the plurality of first openings to form multiple beams; a second aperture substrate having a plurality of second openings through which each beam of the multiple beams passes and the second aperture substrate being capable of independently deflecting the each beam of the multiple beams; and a shielding plate provided so as to be insertable to a space between the first aperture substrate and the second aperture substrate and the shielding plate being capable of simultaneously shielding all the multiple beams.

公开(公告)号：US20200303155A1

公开(公告)日：2020-09-24

申请号：US16753285

申请日：2018-10-02

Applicant: ASML Netherlands B.V.

Inventor： Xuerang HU ,  Xuedong LIU ,  Weiming REN ,  Zhong-wei CHEN

IPC: H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J37/12

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

公开(公告)号：US20200251301A1

公开(公告)日：2020-08-06

申请号：US16266842

申请日：2019-02-04

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke ,  Joerg Jacobi

IPC: H01J37/10 ,  H01J37/09 ,  H01J37/28

Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.

公开(公告)号：US10714296B2

公开(公告)日：2020-07-14

申请号：US16217664

申请日：2018-12-12

Applicant: Axcelis Technologies Inc.

Inventor： Patrick T. Heres ,  Denis A. Robitaille

IPC: H01J27/02 ,  H01J37/08 ,  H01J37/317 ,  H01J37/09

Abstract: An ion implantation system including an ion source for use in creating an ion beam is disclosed. The ion source has an ion source arc chamber housing that confines a high density concentration of ions within the chamber housing. An extraction member defining an appropriately configured extraction aperture allows ions to exit the source arc chamber. In a preferred embodiment, the extraction member defines a tailored extraction aperture shape for modifying an ion beam profile and producing a substantially uniform beam current across a dimension of the ion beam. The extraction aperture member defines an aperture in the form of an elongated slit having a width that varies, with wide ends and a narrow middle. The midsection of the extraction aperture has a narrower width than the opposite end sections. The tailored shape of the extraction aperture includes a central portion having a first width dimension, and first and second distal portions extending from opposite sides of the central portion, the opposed distal portions having a second width dimension that is greater than the first width dimension of the central portion.

公开(公告)号：US10699867B2

公开(公告)日：2020-06-30

申请号：US15970440

申请日：2018-05-03

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Stefan Lanio ,  Jürgen Frosien

IPC: H01J37/063 ,  H01J37/06 ,  H01J37/08 ,  H01J37/09 ,  H01J37/16

Abstract: An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.

公开(公告)号：US20200035443A1

公开(公告)日：2020-01-30

申请号：US15740077

申请日：2017-09-05

Applicant: Focus-eBeam Technology (Beijing) Co., Ltd.

Inventor： Wei He ,  Shuai Li ,  Peng Wang

IPC: H01J37/20 ,  H01J37/244 ,  H01J37/09 ,  H01J37/28

Abstract: A vacuum condition processing apparatus is provided, the top of which is connected to an external charged particle beam generating device, and the apparatus includes: a suction cup in contact with the specimen to be observed or the stage holding the specimen, a first gas controlling device connected to an external gas supplying system, and a second gas controlling device connected to an external pumping system; a window is deployed at the top of the apparatus, through which the particle beam can go into the apparatus; the first gas controlling device is arranged to connect the gas supplying system and the suction cup; the second gas controlling device is arranged to connect the gas pumping system and the suction cup. Also disclosed is a specimen observation system and method.

公开(公告)号：US20190355546A1

公开(公告)日：2019-11-21

申请号：US16381052

申请日：2019-04-11

Applicant: NuFlare Technology, Inc.

Inventor： Atsushi Ando ,  Kiyoshi Hattori

IPC: H01J37/147 ,  H01J37/141 ,  H01J37/09 ,  H01J37/244

Abstract: A multiple electron beam image acquisition apparatus includes an electromagnetic lens to receive multiple electron beams and refract them, a beam selection mechanism, in the magnetic field of the electromagnetic lens, to individually correct the trajectory of each of the multiple electron beams and select a variable desired number of beams from the multiple electron beams, a limiting aperture substrate to block beams which were not selected from the multiple electron beams, a magnification adjustment system to change magnification of the beams selected, depending on the number of beams, being the desired number, selected from the multiple electron beams, an objective lens to focus the beams selected onto the target object surface, a beam separator to separate, from the beams selected, secondary electrons emitted because of the target object surface being irradiated with the beams selected, and a detector to detect the secondary electrons separated by the beam separator.

公开(公告)号：US20190341224A1

公开(公告)日：2019-11-07

申请号：US16402158

申请日：2019-05-02

Applicant: ASML Netherlands B.V.

Inventor： Peter Paul HEMPENIUS ,  Sven Antoin, Johan HOL ,  Maarten Frans, Janus KREMERS ,  Henricus Martinus, Johannes VAN DE GROES ,  Niels Johannes, Maria BOSCH ,  Marcel Koenraad, Marie BAGGEN

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/317

Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

公开(公告)号：US10418223B1

公开(公告)日：2019-09-17

申请号：US15941163

申请日：2018-03-30

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Craig R. Chaney ,  Adam M. McLaughlin ,  James A. Sargent ,  Joshua M. Abeshaus

IPC: H01J37/09 ,  C23C14/48 ,  H01J37/08 ,  H01J27/02 ,  H01J37/317 ,  H01J27/20

Abstract: A foil liner comprising a plurality of foil layers is disclosed. The foil layers may each be an electrically conductive material that are stacked on top of each other. The spacing between adjacent foil layers may create a thermal gradient such that the temperature of the plasma is hotter than the temperature of the ion source chamber. In other embodiments, the foil layers may be assembly to sink the heat from the plasma so that the plasma is cooler than the temperature of the ion source chamber. In some embodiments, gaps or protrusions are disposed on one or more of the foil layers to affect the thermal gradient. In certain embodiments, one or more of the foil layers may be constructed of an insulating material to further affect the thermal gradient. The foil liner may be easily assembled, installed and replaced from within the ion source chamber.

公开(公告)号：US20190259566A1

公开(公告)日：2019-08-22

申请号：US16313693

申请日：2017-06-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Hirohisa ENOMOTO ,  Wataru SUZUKI

IPC: H01J37/16 ,  F16F15/04 ,  H01J37/09

Abstract: Provided is a charged particle beam device in which a support body is rigid enough to support a sample chamber while the vibration of the support body is reduced even under the action of a disturbance such as environmental sound, the degree of parallelism of the support body is maintained, and increase in weight of the support body is suppressed. The support body includes: a first member which supports a mounted object, and is supported by a vibration removing mount; second members which have a thickness different from that of the first member and arranged to overlap the first member; fixing members which fix the first member and the second members; and damping members which have rigidity lower than the fixing members and are deformed by a difference in variations between the first member and the second members.