BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER
    161.
    发明申请
    BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER 审中-公开
    黑色合成石英玻璃与透明层

    公开(公告)号:US20090098370A1

    公开(公告)日:2009-04-16

    申请号:US12249616

    申请日:2008-10-10

    Abstract: To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.

    Abstract translation: 为了提供具有透明层的黑色合成石英玻璃,其在远红外区域具有高发射率,具有优异的遮光性能,在金属杂质方面保持与合成石英玻璃相同的纯度,具有高温粘度 与天然石英玻璃相当的特性,可进行焊接等高温加工,不会从表面释放碳; 以及其生产方法。 含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应,反应开始后,达到一定程度的 真空度超过10mmHg(1343Pa),在1200℃〜2000℃的温度下进行加热,生成紧凑的玻璃体。

    Synthetic quartz glass for optical member and its production method
    162.
    发明授权
    Synthetic quartz glass for optical member and its production method 有权
    光学构件合成石英玻璃及其制作方法

    公开(公告)号:US07514382B2

    公开(公告)日:2009-04-07

    申请号:US11398669

    申请日:2006-04-06

    Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

    Abstract translation: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃,其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件,其基本上不含氧过剩缺陷,溶解氧分子或还原型 其浓度最多为50ppm,OH基浓度为100ppm以下,含有缺氧缺陷量为5×1014个/ cm 3以下且至少1×10 13个缺陷/ cm 3以下的缺陷缺陷。 氟浓度优选为100ppm以下。

    Method of Producing Glass of Optical Quality
    164.
    发明申请
    Method of Producing Glass of Optical Quality 审中-公开
    生产玻璃光学质量的方法

    公开(公告)号:US20090053427A1

    公开(公告)日:2009-02-26

    申请号:US11885745

    申请日:2006-02-15

    Abstract: Glass is produced by depositing presintering composition on a preform set into move in front of a plasma torch which moves back and forth substantially parallel to a longitudinal direction of the preform, a first feed duct feeds the plasma with grains of the presintering composition while optionally a second feed duct feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas, whereby the presintering composition consists of granules of metal oxides or metalloid oxides of a pyrogenic silicon dioxide powder with a BET surface area of 30 to 90 m2/g, a DBP index of 80 or less, a mean aggregate area of less than 25000 nm2 and a mean aggregate circumference of less than 1000 nm, wherein at least 70% of the aggregates have a circumference of less than 1300 nm or a high-purity pyrogenically prepared silicon dioxide having metal contents of less than 0.2 μg/g, which is prepared by reacting a silicon tetrachloride having a metal content of less than 30 ppb by means of flame hydrolysis.

    Abstract translation: 玻璃是通过将预烧结组合物沉积在等离子体焰炬之前移动的预成型体上制造的,所述等离子体焰炬基本上平行于预成型件的纵向方向前后移动,第一进料管将预烧结组合物的颗粒进料到等离子体, 第二进料管将等离子体与载体气体混合的氟或氯化合物,优选氟化合物进料,其中预烧结组合物由BET表面积为30的热解二氧化硅粉末的金属氧化物或准金属氧化物颗粒组成 至90m 2 / g,DBP指数为80以下,平均聚集面积小于25000nm 2,平均聚集体周长小于1000nm,其中至少70%的聚集体具有小于1300nm的圆周 或金属含量小于0.2mug / g的高纯度热解法制备的二氧化硅,其通过使金属含量为1的四氯化硅 通过火焰水解30埃以上。

    METHOD FOR MANUFACTURING A LENS OF SYNTHETIC QUARTZ GLASS WITH INCREASED H2 CONTENT
    167.
    发明申请
    METHOD FOR MANUFACTURING A LENS OF SYNTHETIC QUARTZ GLASS WITH INCREASED H2 CONTENT 有权
    具有增加的H2含量的合成石英玻璃镜片的制造方法

    公开(公告)号:US20070266733A1

    公开(公告)日:2007-11-22

    申请号:US11748151

    申请日:2007-05-14

    Applicant: Eric Eva

    Inventor: Eric Eva

    Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps:providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, andtreating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.

    Abstract translation: 本发明涉及一种用于制造具有增加的H 2 O 3含量的合成石英玻璃透镜的方法,特别是用于具有小于250nm的工作波长的光学系统的透镜,特别是 小于200nm,步骤:提供合成石英玻璃的前体产物,特别是具有小于2.10 15分子/ cm 2的第一H 2 O 3含量 其具有周向边界表面和位于相对侧上的两个基面,其中至少一个所述基底表面的至少一个部分表面具有曲率,并且将前体产物处理成H 2 O 3, 2含量的气氛,以便产生合成石英玻璃的前体产物,其具有相对于第一H 2 N 2含量增加的第二H 2 N 2含量 特别是具有超过10个/ 16个分子/ cm 3的第二H 2 N 2含量,并且测量至少一种光学式 所述前体产物具有所述第二H 2 N 2含量的操作性。

    Synthetic quartz glass and process for producing a quartz glass body
    168.
    发明申请
    Synthetic quartz glass and process for producing a quartz glass body 审中-公开
    合成石英玻璃和生产石英玻璃体的方法

    公开(公告)号:US20060218971A1

    公开(公告)日:2006-10-05

    申请号:US11350286

    申请日:2006-02-09

    Abstract: The invention relates to a synthetic quartz glass that can be produced by direct precipitation by means of flame hydrolysis of a silicon precursor, especially a chlorine-containing silicon precursor, which quartz glass when irradiated with laser pulses at a wavelength of 193 nm at an energy density (H) of up to H=1.5 mJ/cm2 and at a repetition frequency of the laser pulses of up to R=4 kHz is characterized by the following properties: in the range of energy densities of up to 1.5 mJ/cm2, the equilibrium absorption of quartz glass rises sublinearly with the energy density for all repetition frequencies of the laser pulses; the dependency of the equilibrium absorption on the repetition frequency of the laser pulses is sublinear; and the relationship of equilibrium absorption and energy density (H) can be described as a function of H1.7; the H2 content being at least 0.2·1018 molecules/cm3. Other aspects of the invention relate to a process for producing such a synthetic quartz glass.

    Abstract translation: 本发明涉及一种合成石英玻璃,其可以通过使用硅前体,特别是含氯的硅前体进行火焰水解直接沉淀来制备,该石英玻璃在能量为193nm的激光脉冲下照射时, 高达H = 1.5mJ / cm 2的密度(H)和高达R = 4kHz的激光脉冲的重复频率的特征在于以下特性:在能量密度范围内 高达1.5mJ / cm 2,石英玻璃的平衡吸收与激光脉冲的所有重复频率的能量密度成线性上升; 平衡吸收对激光脉冲重复频率的依赖性是亚线性的; 平衡吸收和能量密度(H)的关系可以描述为H <1.7的函数; H 2含量为至少0.2×10 18分子/ cm 3。 本发明的其它方面涉及一种生产这种合成石英玻璃的方法。

    Synthetic quartz glass for optical member and its production method
    169.
    发明申请
    Synthetic quartz glass for optical member and its production method 有权
    光学构件合成石英玻璃及其制作方法

    公开(公告)号:US20060183623A1

    公开(公告)日:2006-08-17

    申请号:US11398669

    申请日:2006-04-06

    Abstract: A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.

    Abstract translation: 得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃,其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件,其基本上不含氧过剩缺陷,溶解氧分子或还原型 缺陷,其氯浓度最多为50ppm,OH基浓度为至多100ppm,并且其含有缺氧缺陷的浓度范围至多为5×10 14个/ cm 2以下 > 3%和至少1×10 3个缺陷/ cm 3。 氟浓度优选为100ppm以下。

Patent Agency Ranking