Abstract:
To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.
Abstract:
A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.
Abstract translation:得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃,其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件,其基本上不含氧过剩缺陷,溶解氧分子或还原型 其浓度最多为50ppm,OH基浓度为100ppm以下,含有缺氧缺陷量为5×1014个/ cm 3以下且至少1×10 13个缺陷/ cm 3以下的缺陷缺陷。 氟浓度优选为100ppm以下。
Abstract:
Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99.65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of H2O and/or O2.
Abstract:
Glass is produced by depositing presintering composition on a preform set into move in front of a plasma torch which moves back and forth substantially parallel to a longitudinal direction of the preform, a first feed duct feeds the plasma with grains of the presintering composition while optionally a second feed duct feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas, whereby the presintering composition consists of granules of metal oxides or metalloid oxides of a pyrogenic silicon dioxide powder with a BET surface area of 30 to 90 m2/g, a DBP index of 80 or less, a mean aggregate area of less than 25000 nm2 and a mean aggregate circumference of less than 1000 nm, wherein at least 70% of the aggregates have a circumference of less than 1300 nm or a high-purity pyrogenically prepared silicon dioxide having metal contents of less than 0.2 μg/g, which is prepared by reacting a silicon tetrachloride having a metal content of less than 30 ppb by means of flame hydrolysis.
Abstract:
A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.
Abstract:
An optical member comprising OD-doped silica glass, optionally doped with fluorine. The optical member is particularly advantageous for use in connection with radiation having a wavelength shorter than about 248 nm. In certain embodiments the optical member can be advantageously used for wavelength as short as about 157 nm.
Abstract:
The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps:providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, andtreating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.
Abstract translation:本发明涉及一种用于制造具有增加的H 2 O 3含量的合成石英玻璃透镜的方法,特别是用于具有小于250nm的工作波长的光学系统的透镜,特别是 小于200nm,步骤:提供合成石英玻璃的前体产物,特别是具有小于2.10 15分子/ cm 2的第一H 2 O 3含量 其具有周向边界表面和位于相对侧上的两个基面,其中至少一个所述基底表面的至少一个部分表面具有曲率,并且将前体产物处理成H 2 O 3, 2含量的气氛,以便产生合成石英玻璃的前体产物,其具有相对于第一H 2 N 2含量增加的第二H 2 N 2含量 特别是具有超过10个/ 16个分子/ cm 3的第二H 2 N 2含量,并且测量至少一种光学式 所述前体产物具有所述第二H 2 N 2含量的操作性。
Abstract:
The invention relates to a synthetic quartz glass that can be produced by direct precipitation by means of flame hydrolysis of a silicon precursor, especially a chlorine-containing silicon precursor, which quartz glass when irradiated with laser pulses at a wavelength of 193 nm at an energy density (H) of up to H=1.5 mJ/cm2 and at a repetition frequency of the laser pulses of up to R=4 kHz is characterized by the following properties: in the range of energy densities of up to 1.5 mJ/cm2, the equilibrium absorption of quartz glass rises sublinearly with the energy density for all repetition frequencies of the laser pulses; the dependency of the equilibrium absorption on the repetition frequency of the laser pulses is sublinear; and the relationship of equilibrium absorption and energy density (H) can be described as a function of H1.7; the H2 content being at least 0.2·1018 molecules/cm3. Other aspects of the invention relate to a process for producing such a synthetic quartz glass.
Abstract translation:本发明涉及一种合成石英玻璃,其可以通过使用硅前体,特别是含氯的硅前体进行火焰水解直接沉淀来制备,该石英玻璃在能量为193nm的激光脉冲下照射时, 高达H = 1.5mJ / cm 2的密度(H)和高达R = 4kHz的激光脉冲的重复频率的特征在于以下特性:在能量密度范围内 高达1.5mJ / cm 2,石英玻璃的平衡吸收与激光脉冲的所有重复频率的能量密度成线性上升; 平衡吸收对激光脉冲重复频率的依赖性是亚线性的; 平衡吸收和能量密度(H)的关系可以描述为H <1.7的函数; H 2含量为至少0.2×10 18分子/ cm 3。 本发明的其它方面涉及一种生产这种合成石英玻璃的方法。
Abstract:
A synthetic quartz glass for an optical member which is free from compaction and rarefaction is obtained. A synthetic quartz glass for an optical member to be used for an optical device employing a light having a wavelength of at most 400 nm and at least 170 nm as a light source, which contains substantially no oxygen excess defects, dissolved oxygen molecules nor reduction type defects, which has a chlorine concentration of at most 50 ppm and a OH group concentration of at most 100 ppm, and which contains oxygen deficient defects within a concentration range of at most 5×1014 defects/cm3 and at least 1×1013 defects/cm3. The fluorine concentration is preferably at most 100 ppm.
Abstract translation:得到不含压实和稀释的用于光学构件的合成石英玻璃。 用于光学元件的合成石英玻璃,其用于使用波长最多为400nm且至少170nm的光作为光源的光学元件,其基本上不含氧过剩缺陷,溶解氧分子或还原型 缺陷,其氯浓度最多为50ppm,OH基浓度为至多100ppm,并且其含有缺氧缺陷的浓度范围至多为5×10 14个/ cm 2以下 > 3%和至少1×10 3个缺陷/ cm 3。 氟浓度优选为100ppm以下。
Abstract:
Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.