Abstract:
An interconnect structure for connecting an integrated circuit (IC) chip to a supporting substrate is described. The supporting substrate serves to communicate signals between the IC chip and the "outside world," such as other IC chips. In one embodiment, the interconnect structure comprises an interconnect substrate having a first post disposed on one of its surfaces and a second post disposed on another of its surfaces. One post is for contacting the IC chip and the other is for contacting the major substrate. Each post comprises an elongated body having top and bottom ends, with the bottom end being mounted to one of the substrate surfaces and the top end having a substantially flat surface which is substantially co-planer with the substrate surface. The interconnect substrate further comprises a device for de-concentrating the mechanical stain present at one or both of the top and bottom ends of each post. The first and second posts are electrically coupled to one anther so that an electrical signal may pass from IC chip to the supporting substrate, and vice-versa.
Abstract:
A double-sided printed wiring board includes a base plate having a copper foil laminated on each of the opposite sides thereof. The copper foil-laminated base plate has through-holes extending therethrough, and at least one of the through-holes is internally plated for providing a through-via-hole into which a resin filler is provided and solidified. A closed through-via-hole is thus obtained. The copper foil-laminated base plate including the closed through-via-hole is copper-plated, and a particular wiring pattern is formed thereon. A chip land is formed in alignment with the closed through-via-hole.
Abstract:
A multi-layer wiring board where a plurality of wiring boards are laminated. The wiring board comprises a flexible insulating layer having a through hole and a wiring pattern formed on the flexible insulating layer. The wiring pattern is composed at least of two conductive layers. The first conductive layer formed on the insulating layer is made of a non-metallic conductor and the first wiring pattern is formed by a laser beam. The second conductive layer is an electroplated layer formed on the first wiring pattern. The first and second conductive layers have different reflectance for a beam. The wiring board is manufactured by integrally laminating a plastic conductive supporting plate wound in a roll shape and an insulating film similarly wound in a roll shape; forming a through hole in a predetermined position of the insulating film; forming the first conductive layer on the laminated body provided with the through hole; forming the first wiring pattern by a laser beam; and forming the electroplated layer on the first wiring pattern.
Abstract:
High density/heavy current hybrid circuit on a ceramic substrate, or other insulating board material, includes first screen printed silver, or copper, polymer seed layer for basic circuitry and bus bar around this circuitry outside the scribe lines, which is connected by removable silver filled polymer links with the circuitry and also the circuit elements are connected with each other by the same links in order to provide uniform electroplating. The links are protected before electroplating with a removable plating resist and they are removed after electroplating using an appropriate stripping solution. Then a permanent plating resist and dielectric polymer thick film isolation layer are applied (for crossovers) on which the second seed layer is applied, plating of the second metal layer occurs and so on until the desired number of layers are done. Thus, cure temperature is that of polymerization, high density, good heat dissipation conditions, heavy current capacity in all the layers and low manufacturing costs are achieved.
Abstract:
A method for making an integrated circuit chip packaging structure comprising a substrate, preferably a semiconductor base substrate, a conductive layer on said substrate in regions where connections to metallization layers of the substrate are formed, solder balls and gold bumps connected to said conductive layer in said regions of said conductive layer, and a solder stop layer on said conductive layer at least around said solder balls. The conductive layer further comprises wiring lines. Further, a method of forming the structure is disclosed which uses only two masks for providing terminals for connecting the substrate to integrated circuits and to other substrates or to the printed circuit board and wiring lines. Thus, there is a need for one less metallization layer. The method is applicable to 200 mm wafers and allows two different packaging technologies (C-4 and TAB or wire-bonding) on the same substrate. Thus, packaging of VLSI circuits is improved.
Abstract:
An electrically connectable module is manufactured from a substrate of an electrically insulating polymer matrix doped with an electrically insulating fibrous filler capable of heat conversion to an electrically conductive fibrous filler to form a fiber-doped substrate. One end of an electrical connector is embedded in the fiber-doped substrate to locate the one end adjacent the surface of the substrate while exposing an opposite end of the electrical connector. The surface of the fiber-doped substrate is locally heated preferably with a laser to form a conductive trace by the in-situ heat conversion of the electrically insulating fibrous filler, the localized heating including the one end of the electrical connector to electrically connect the electrical connector to the conductive trace. In another embodiment, a conductive material is electrodeposited on the conductive trace by applying a voltage to the opposite end of the electrical connector. The substrate is molded into a desired shape to form the module, and a plurality of electrical connectors can be embedded into the substrate in any one of several different standardized arrangements.
Abstract:
The present invention relates to a manufacturing method of a probe head for an inspection apparatus of a semiconductor device represented by an LSI, and more particularly to a manufacturing method suitable for forming probes with high accuracy in forming into multipins at high density, and is characterized in that a structure is obtained, in which a probe forming conductive lower layer is formed on a formed conductive attaching layer for improving attaching strength after forming electrode pads on a wiring substrate, a mask pattern for forming a probe tip forming conductive upper layer is formed at a position corresponding to the probe position is removed by etching in a cylindrical form until the probe forming conductive lower layer is exposed, a probe tip forming conductive upper layer is grown at the position where etching removal has been performed, a mask pattern is removed, a mask pattern which covers a probe tip forming conductive upper layer is formed thereafter at a position corresponding to the probe position, and the probe forming conductive lower layer is removed by etching in a cylindrical form until the conductive attaching layer is exposed, and pin tips are formed as the small probe tip forming conductive upper layer, thus processing into a pin configuration by removing the conductive attaching layer and the mask.
Abstract:
A process for making an electrically conductive pattern on a substrate including forming a patterned adhesive layer on the substrate, applying a conductive metal powder to the adhesive layer, and in a second coating pass, applying a powder containing supplementary elements to the pattern. The patterned substrate is fired to volatilize theadhesive layer and sinter the powders. This process can be used to make printed circuits on ceramic substrates which are useful in hybrid circuits, for example.
Abstract:
A process for manufacturing a 3-dimensional circuit board by electrophoretic deposition whereby (a) providing the board with a conductive surface and (b) applying a photoresist by electrophoretic deposition.
Abstract:
A method for fabricating a hybrid IC substrate comprises the steps of: preparing an insulating ceramic substrate having a major surface; baking one or more conductors of a first group formed of high melting point metal or alloy thereof on the major surface; covering the conductors of the first group with a first plated film formed by electroless plating; forming an insulating porous active including a glass component and a small amount of a metal component having a catalytic action for electroless plating on the first plated film; and forming one or more conductors of a second group by electroless plating on the active layer, whereby portions of the active layer sandwiched between the conductors of the first and second groups are rendered conductive.