公开(公告)号：US20070023698A1

公开(公告)日：2007-02-01

申请号：US11457775

申请日：2006-07-14

Applicant: Geum-Sik PARK

Inventor： Geum-Sik PARK

IPC: H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/2002 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/31701

Abstract: An ion implanting apparatus and method are provided. The apparatus includes a plurality of dummy wafers and a plurality of dummy wafer cassettes. The dummy wafers are separately used for respective kinds of ions, and the plurality of dummy wafer cassettes separately store the dummy wafers separately used for the respective kinds of ions. The plurality of dummy wafer cassettes are installed in order to store the plurality of dummy wafers for the respective kinds of ions and use the dummy wafers for an ion implanting process.

Abstract translation: 提供了离子注入装置和方法。 该装置包括多个虚拟晶片和多个虚拟晶片盒。 虚拟晶片分别用于各种离子，并且多个虚设晶片盒分别存储分别用于各种离子的虚拟晶片。 安装多个虚拟晶片盒以便存储用于各种离子的多个虚拟晶片，并使用虚拟晶片进行离子注入工艺。

公开(公告)号：US20060249687A1

公开(公告)日：2006-11-09

申请号：US11216049

申请日：2005-09-01

Applicant: Chih-Yu Chao ,  Wen-Jiunn Hsieh

Inventor： Chih-Yu Chao ,  Wen-Jiunn Hsieh

IPC: H01J37/18

CPC classification number: H01J37/20 ,  H01J2237/2002

Abstract: A device for operating gas in the vacuum or low-pressure environment and for observation of the operation includes a housing. The housing has a thinner part formed at a side thereof, and at least one spacer mounted therein for partitioning off its inside into a gas chamber and at least one buffer chamber outside the gas chamber. The gas chamber has two inner apertures provided on the spacers above and below the gas chamber. The housing has two outer apertures provided respectively on a top side thereof and a bottom side thereof. All of the inner and outer apertures are coaxial with one another and located on the thinner part. The housing has a pumping port for communication with the buffer chamber, and a gas inlet for communication with the gas chamber.

公开(公告)号：US07033444B1

公开(公告)日：2006-04-25

申请号：US09667770

申请日：2000-09-22

Applicant: Mitsuaki Komino ,  Yasuharu Sasaki ,  Kyo Tsuboi ,  Hideaki Amano

Inventor： Mitsuaki Komino ,  Yasuharu Sasaki ,  Kyo Tsuboi ,  Hideaki Amano

IPC: C23C16/509 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/67109 ,  C23C16/46 ,  H01J2237/2002

Abstract: An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber (26) in which a vacuum can be formed. An electrode unit (38) has a heater unit (44) therein. A cooling block (40) having a cooling jacket (58) is joined to the electrode unit (38) so as to cool the electrode unit. A heat resistant metal seal member (66A, 66B) seals an electrode-side heat transfer space (62, 64) formed between the electrode unit and the cooling block. Electrode-side heat transfer gas supply means (94) supplies a heat transfer gas to the electrode-side heat transfer space. Accordingly, a sealing characteristic of the electrode-side heat transfer space does not deteriorate even in a high temperature range such as a temperature higher than 200° C. and, for example, a range from 350° C. to 500° C., and the heat transfer gas does not leak.

Abstract translation: 一种在等离子体处理装置中使用的电极结构，其对能够形成真空的处理室（26）中的等离子体对待处理的物体（W）进行预定的处理。 电极单元（38）中具有加热器单元（44）。 具有冷却套（58）的冷却块（40）与电极单元（38）接合，以冷却电极单元。 耐热金属密封构件（66A，66B）密封形成在电极单元和冷却块之间的电极侧传热空间（62,64）。 电极侧传热气体供给装置（94）向电极侧传热空间供给传热气体。 因此，即使在高于200℃的温度和例如350℃至500℃的温度的高温范围内，电极侧传热空间的密封特性也不会劣化， 并且传热气体不会泄漏。

公开(公告)号：US20050035303A1

公开(公告)日：2005-02-17

申请号：US10910327

申请日：2004-08-04

Applicant: Yong-nam Ham

Inventor： Yong-nam Ham

IPC: G01N23/227 ,  G01J3/02 ,  G01M3/00 ,  G01N23/00 ,  G01N35/10 ,  G12B9/08 ,  H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/2002 ,  H01J2237/20235 ,  H01J2237/2522

Abstract: A carrier, and an analyzing apparatus including the carrier, the carrier including a sample holder having a guide groove, a sample receiver on which to mount the sample holder, the sample receiver having a guide rail to couple with the guide groove, and a sample elevator to elevate the sample receiver up and down, to receive and discharge the sample holder, wherein the sample elevator includes a driving portion to drive the sample receiver up and down, and a vacuum chamber to maintain a vacuum in an enclosed state around the sample holder.

Abstract translation: 载体和包括载体的分析装置，载体包括具有导向槽的样品保持器，其上安装样品架的样品接收器，具有导轨的样品接收器以与导向槽耦合，以及样品 电梯将样品接收器上下升降，以接收和放电样品架，其中样品升降机包括用于上下驱动样品接收器的驱动部分和真空室，以使样品中的真空保持在封闭状态 持有人

公开(公告)号：US20030168595A1

公开(公告)日：2003-09-11

申请号：US10343638

申请日：2003-02-03

Inventor： Gerasimos Daniel Danilatos

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J37/301 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/2605 ,  H01J2237/2608

Abstract: The invention provides for a scanning electron or ion beam instrument capable of transferring the beam from a high vacuum chamber (8) into a high pressure chamber (5) via aperture (1) and aperture (2). The beam is deflected and scanned by coils (3) generally positioned between apertures (1) and (2). The amplitude of deflection of the beam over a specimen placed inside chamber (5) is substantially larger than the diameter of aperture (1). Leaking gas through aperture (1) is removed via port (7) by appropriate pumping apparatus. The size of aperture (1) is such that the pressure in chamber (6) combined with the supersonic jet and shock waves naturally forming therein do not result in catastrophic electron beam loss in chamber (6). The addition of appropriate detection means result in an instrument characterised by superior performance over prior art by way of better field of view at low magnification, better vacuum system and improved detection and imaging capabilities.

Abstract translation: 本发明提供一种扫描电子或离子束仪器，其能够通过孔（1）和孔（2）将束从高真空室（8）传送到高压室（5）中。 光束被通常位于孔（1）和（2）之间的线圈（3）偏转和扫描。 放置在室（5）内部的样品上的束的偏转幅度基本上大于孔（1）的直径。 通过孔（1）泄漏气体通过适当的泵送装置通过端口（7）去除。 孔（1）的尺寸使得室（6）中与其中自然形成的超音速射流和冲击波结合的压力不会导致腔室（6）中的电子束损失。 通过添加适当的检测装置，可以通过在低放大倍数，更好的真空系统以及改善的检测和成像能力的更好的视场方面，以超过现有技术的性能为特征。

公开(公告)号：US06555815B2

公开(公告)日：2003-04-29

申请号：US09342802

申请日：1999-06-29

Applicant: Hans-Peter Feuerbaum ,  Dieter Winkler

Inventor： Hans-Peter Feuerbaum ,  Dieter Winkler

IPC: H01J3700

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/006 ,  H01J2237/2002 ,  H01J2237/2608

Abstract: An apparatus for examining a specimen with a beam of charged particles, where charging of the specimen is avoided or reduced by injecting inert gas onto the sample's surface. In order to avoid interactions with the electron optics, various embodiments are disclosed for providing a rotationally symmetrical nozzles and/or electrodes. Additionally, embodiments are disclosed wherein a plurality of gas conduits are arranged in a rotationally symmetrical manner. Alternatively, the conduit is incorporated into an element of the electron optics, such as the magnetic lens. Also, in order to reduce or eliminate interaction of the electrons with the gas molecules, embodiments are disclosed wherein the gas is pulsated, rather than continually injected.

Abstract translation: 一种用带电粒子束检查样本的装置，其中通过将惰性气体注射到样品表面上来避免或减少样品的充电。 为了避免与电子光学器件的相互作用，公开了用于提供旋转对称的喷嘴和/或电极的各种实施例。 另外，公开了其中多个气体管道以旋转对称的方式布置的实施例。 或者，导管结合到电子光学元件的元件中，例如磁性透镜。 此外，为了减少或消除电子与气体分子的相互作用，公开了其中气体被脉动而不是连续喷射的实施例。

公开(公告)号：US20020148975A1

公开(公告)日：2002-10-17

申请号：US09985324

申请日：2001-11-02

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G21G005/00

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate nullSnull to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到在检查室中保持真空的检查室23-1中; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US06444982B1

公开(公告)日：2002-09-03

申请号：US09599325

申请日：2000-06-22

Applicant: James A. Mitchell ,  Philip J. Palermo

Inventor： James A. Mitchell ,  Philip J. Palermo

IPC: H01J3700

CPC classification number: G01N23/2204 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2005 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/2605

Abstract: A system is provided for imaging, in an ESE microscope or other variable pressure microscope, a single sample at various time intervals during dissolution of the sample in a liquid. The system includes a sample chamber having a sample well. The sample well includes an first fluid port and a second fluid port for forming a dissolution bath in the sample well. In accordance with the system according to the present invention, the sample chamber is placed into the specimen chamber of the ESE microscope and a sample is deposited into the sample well of the sample chamber. The sample is immersed in a liquid which flows through the sample well via the first and second fluid ports during a dissolution cycle. The liquid is then drained from the sample well via one of the first and second fluid ports during a draining cycle, and then, during an imaging cycle, the sample is imaged by the ESE microscope. The dissolution cycle, the draining cycle, and the imaging cycle all occur while the sample well is inside the specimen chamber of the ESE microscope.

Abstract translation: 提供了一种系统，用于在ESE显微镜或其它可变压力显微镜下，将样品溶解在液体中，以不同的时间间隔对单个样品进行成像。 该系统包括具有样品阱的样品室。 样品阱包括用于在样品阱中形成溶解浴的第一流体端口和第二流体端口。 根据本发明的系统，将样品室放置在ESE显微镜的样品室中，并将样品沉积到样品室的样品孔中。 在溶解循环期间，将样品浸入通过第一和第二流体端口流经样品的液体中。 然后在排液循环期间，通过第一和第二流体端口之一从样品阱中排出液体，然后在成像周期期间，通过ESE显微镜对样品进行成像。 当样品孔在ESE显微镜的样品室内时，溶解循环，排水循环和成像循环都会发生。

公开(公告)号：US20020053638A1

公开(公告)日：2002-05-09

申请号：US09342802

申请日：1999-06-29

Inventor： DIETER WINKLER ,  HANS-PETER FEUERBAUM

IPC: G01N023/00

CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/006 ,  H01J2237/2002 ,  H01J2237/2608

Abstract: An apparatus for examining a specimen with a beam of charged particles, where charging of the specimen is avoided or reduced by injecting inert gas onto the sample's surface. In order to avoid interactions with the electron optics, various embodiments are disclosed for providing a rotationally symmetrical nozzles and/or electrodes. Additionally, embodiments are disclosed wherein a plurality of gas conduits are arranged in a rotationally symmetrical manner. Alternatively, the conduit is incorporated into an element of the electron optics, such as the magnetic lens. Also, in order to reduce or eliminate interaction of the electrons with the gas molecules, embodiments are disclosed wherein the gas is pulsated, rather than continually injected.

Abstract translation: 一种用带电粒子束检查样本的装置，其中通过将惰性气体注射到样品表面上来避免或减少样品的充电。 为了避免与电子光学器件的相互作用，公开了用于提供旋转对称的喷嘴和/或电极的各种实施例。 另外，公开了其中多个气体管道以旋转对称的方式布置的实施例。 或者，导管结合到电子光学元件的元件中，例如磁性透镜。 此外，为了减少或消除电子与气体分子的相互作用，公开了其中气体被脉动而不是连续喷射的实施例。

公开(公告)号：US20240186104A1

公开(公告)日：2024-06-06

申请号：US18438400

申请日：2024-02-10

Applicant: Frederick A. Flitsch

Inventor： Frederick A. Flitsch

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J2237/2002 ,  H01J2237/221 ,  H01J2237/30433

Abstract: The present invention provides apparatus for an imaging system including artificial intelligence algorithmic processing components. Imaging systems may include elements that emit electrons, photons or molecules in different examples. Artificial intelligence algorithms may be used to optimize operating parameters of the imaging systems through use of training databases and feedback of metrology obtained during processing.