公开(公告)号：US10011477B2

公开(公告)日：2018-07-03

申请号：US15437727

申请日：2017-02-21

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Christopher V. Jahnes ,  Anthony K. Stamper

IPC: H01P1/10 ,  B81B3/00 ,  B81C1/00 ,  G06F17/50

CPC classification number: B81B3/0072 ,  B81B3/0021 ,  B81B2201/01 ,  B81B2201/014 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81B2203/04 ,  B81C1/0015 ,  B81C1/00365 ,  B81C1/00476 ,  B81C1/00619 ,  B81C1/00626 ,  B81C1/00666 ,  B81C2201/0109 ,  B81C2201/013 ,  B81C2201/0167 ,  B81C2201/017 ,  B81C2203/0136 ,  B81C2203/0172 ,  G06F17/5068 ,  G06F17/5072 ,  H01H1/0036 ,  H01H57/00 ,  H01H59/0009 ,  H01H2057/006 ,  H01L41/1136 ,  H01L2924/0002 ,  Y10S438/937 ,  Y10T29/42 ,  Y10T29/435 ,  Y10T29/49002 ,  Y10T29/49105 ,  Y10T29/49121 ,  Y10T29/49126 ,  Y10T29/4913 ,  Y10T29/49155 ,  Y10T29/5313 ,  H01L2924/00

Abstract: A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.

公开(公告)号：US09926193B2

公开(公告)日：2018-03-27

申请号：US15301337

申请日：2014-06-27

Applicant: Intel Corporation

Inventor： Jorge A. Munoz ,  Dmitri E. Nikonov ,  Kelin J. Kuhn ,  Patrick Theofanis ,  Chytra Pawashe ,  Kevin Lin ,  Seiyon Kim

IPC: B82B1/00 ,  B82B3/00 ,  H01L29/66 ,  H01L29/84 ,  H01L29/82 ,  H01H59/00 ,  B82Y15/00 ,  B82Y25/00 ,  B82Y40/00

CPC classification number: B82B1/005 ,  B81B3/0016 ,  B81B7/02 ,  B81B2201/014 ,  B81B2203/0118 ,  B82B1/002 ,  B82B3/0023 ,  B82Y15/00 ,  B82Y25/00 ,  B82Y40/00 ,  H01H1/0094 ,  H01H1/54 ,  H01H59/0009 ,  H01L29/66227 ,  H01L29/82 ,  H01L29/84 ,  Y10S977/732 ,  Y10S977/838 ,  Y10S977/888 ,  Y10S977/938

Abstract: Nanoelectromechanical (NEMS) devices having nanomagnets for an improved range of operating voltages and improved control of dimensions of a cantilever are described. For example, in an embodiment, a nanoelectromechanical (NEMS) device includes a substrate layer, a first magnetic layer disposed above the substrate layer, a first dielectric layer disposed above the first magnetic layer, a second dielectric disposed above the first dielectric layer, and a cantilever disposed above the second dielectric layer. The cantilever bends from a first position to a second position towards the substrate layer when a voltage is applied to the cantilever.

公开(公告)号：US09892879B2

公开(公告)日：2018-02-13

申请号：US13348277

申请日：2012-01-11

Applicant: Jonathan Hale Hammond ,  Julio Costa

Inventor： Jonathan Hale Hammond ,  Julio Costa

IPC: H01L29/84 ,  H01L21/02 ,  H01H49/00 ,  H01H1/00 ,  H01H59/00 ,  B81C1/00

CPC classification number: H01H49/00 ,  B81B2201/014 ,  B81C1/0023 ,  B81C2203/0145 ,  H01H1/0036 ,  H01H59/0009

Abstract: Encapsulated MEMS switches are disclosed along with methods of manufacturing the same. A non-polymer based sacrificial layer is used to form the actuation member of the MEMS switch while a polymer based sacrificial layer is used to form the enclosure that encapsulates the MEMS switch. The first non-polymer based sacrificial layer allows for highly reliable MEMS switches to be manufactured while also protecting the MEMS switch from carbon contamination. The polymer based sacrificial layer allows for the manufacture of more spatially efficient encapsulated MEMS switches.

公开(公告)号：US09859076B2

公开(公告)日：2018-01-02

申请号：US14874704

申请日：2015-10-05

Applicant: RF Micro Devices, Inc.

Inventor： Jonathan Hale Hammond ,  Julio C. Costa

IPC: H01H49/00 ,  H01H1/00 ,  H01H59/00 ,  B81C1/00

CPC classification number: H01H49/00 ,  B81B2201/014 ,  B81C1/0023 ,  B81C2203/0145 ,  H01H1/0036 ,  H01H59/0009

Abstract: Encapsulated MEMS switches are disclosed along with methods of manufacturing the same. A first sacrificial layer is used to form the actuation member of the MEMS switch. A second sacrificial layer is used to form the enclosure that encapsulates the MEMS switch.

公开(公告)号：US20170341931A1

公开(公告)日：2017-11-30

申请号：US15650953

申请日：2017-07-16

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Bucknell C. Webb

IPC: B81B3/00 ,  B81C1/00

CPC classification number: B81B3/0056 ,  B81B2201/012 ,  B81B2201/014 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81B2203/04 ,  B81B2207/07 ,  B81C1/0015 ,  B81C1/00619 ,  B81C2201/0112 ,  B81C2201/0132 ,  B81C2201/0178 ,  B81C2203/0109 ,  B81C2203/0136 ,  H01H59/0009 ,  H01H2001/0078

Abstract: Deep via technology is used to construct an integrated silicon cantilever and cavity oriented in a vertical plane which creates an electrostatically-switched MEMS switch in a small wafer area. Another embodiment is a small wafer area electrostatically-switched, vertical-cantilever MEMS switch wherein the switch cavity is etched within a volume defined by walls grown internally within a silicon substrate using through vias.

公开(公告)号：US20170341930A1

公开(公告)日：2017-11-30

申请号：US15650788

申请日：2017-07-14

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Bucknell C. Webb

IPC: B81B3/00 ,  B81C1/00

CPC classification number: B81B3/0056 ,  B81B2201/012 ,  B81B2201/014 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81B2203/04 ,  B81B2207/07 ,  B81C1/0015 ,  B81C1/00619 ,  B81C2201/0112 ,  B81C2201/0132 ,  B81C2201/0178 ,  B81C2203/0109 ,  B81C2203/0136 ,  H01H59/0009 ,  H01H2001/0078

Abstract: Deep via technology is used to construct an integrated silicon cantilever and cavity oriented in a vertical plane which creates an electrostatically-switched MEMS switch in a small wafer area. Another embodiment is a small wafer area electrostatically-switched, vertical-cantilever MEMS switch wherein the switch cavity is etched within a volume defined by walls grown internally within a silicon substrate using through vias.

公开(公告)号：US09815690B2

公开(公告)日：2017-11-14

申请号：US15212888

申请日：2016-07-18

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Russell T. Herrin ,  Jeffrey C. Maling ,  Anthony K. Stamper

IPC: H05K3/00 ,  B81C1/00 ,  H01L41/113 ,  H01H57/00 ,  B81B3/00 ,  G06F17/50 ,  H01H1/00 ,  H01H59/00

CPC classification number: B81B3/0072 ,  B81B3/0021 ,  B81B2201/01 ,  B81B2201/014 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81B2203/04 ,  B81C1/0015 ,  B81C1/00365 ,  B81C1/00476 ,  B81C1/00619 ,  B81C1/00626 ,  B81C1/00666 ,  B81C2201/0109 ,  B81C2201/013 ,  B81C2201/0167 ,  B81C2201/017 ,  B81C2203/0136 ,  B81C2203/0172 ,  G06F17/5068 ,  G06F17/5072 ,  H01H1/0036 ,  H01H57/00 ,  H01H59/0009 ,  H01H2057/006 ,  H01L41/1136 ,  H01L2924/0002 ,  Y10S438/937 ,  Y10T29/42 ,  Y10T29/435 ,  Y10T29/49002 ,  Y10T29/49105 ,  Y10T29/49121 ,  Y10T29/49126 ,  Y10T29/4913 ,  Y10T29/49155 ,  Y10T29/5313 ,  H01L2924/00

Abstract: A method of forming at least one Micro-Electro-Mechanical System (MEMS) includes forming a beam structure and an electrode on an insulator layer, remote from the beam structure. The method further includes forming at least one sacrificial layer over the beam structure, and remote from the electrode. The method further includes forming a lid structure over the at least one sacrificial layer and the electrode. The method further includes providing simultaneously a vent hole through the lid structure to expose the sacrificial layer and to form a partial via over the electrode. The method further includes venting the sacrificial layer to form a cavity. The method further includes sealing the vent hole with material. The method further includes forming a final via in the lid structure to the electrode, through the partial via.

公开(公告)号：US09786459B2

公开(公告)日：2017-10-10

申请号：US15093808

申请日：2016-04-08

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Dawn D. Hall ,  Mark C. H. Lamorey ,  Anthony K. Stamper

IPC: H01H59/00 ,  H01H11/00 ,  G06F17/50

CPC classification number: H01H59/0009 ,  B81B2201/014 ,  G06F17/5068 ,  H01H11/00 ,  Y10T29/49105 ,  Y10T29/49117 ,  Y10T29/49155 ,  Y10T29/49204

Abstract: Normally closed (shut) micro-electro-mechanical switches (MEMS), methods of manufacture and design structures are provided. A structure includes a beam structure that includes a first end hinged on a first electrode and in electrical contact with a second electrode, in its natural state when not actuated.

公开(公告)号：US09758366B2

公开(公告)日：2017-09-12

申请号：US14969329

申请日：2015-12-15

Applicant: Bucknell C. Webb

Inventor： Bucknell C. Webb

IPC: H01L21/00 ,  H01L43/14 ,  H01L43/10 ,  B81C1/00 ,  B81B3/00

CPC classification number: B81B3/0056 ,  B81B2201/012 ,  B81B2201/014 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81B2203/04 ,  B81B2207/07 ,  B81C1/0015 ,  B81C1/00619 ,  B81C2201/0112 ,  B81C2201/0132 ,  B81C2201/0178 ,  B81C2203/0109 ,  B81C2203/0136 ,  H01H59/0009 ,  H01H2001/0078

Abstract: Deep via technology is used to construct an integrated silicon cantilever and cavity oriented in a vertical plane which creates an electrostatically-switched MEMS switch in a small wafer area. Another embodiment is a small wafer area electrostatically-switched, vertical-cantilever MEMS switch wherein the switch cavity is etched within a volume defined by walls grown internally within a silicon substrate using through vias.

公开(公告)号：US09624099B2

公开(公告)日：2017-04-18

申请号：US14966128

申请日：2015-12-11

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Christopher V. Jahnes ,  Anthony K. Stamper

IPC: B81B3/00 ,  B81C1/00 ,  H01L41/113 ,  H01H57/00 ,  G06F17/50 ,  H01H1/00 ,  H01H59/00 ,  H01P1/10

CPC classification number: B81B3/0072 ,  B81B3/0021 ,  B81B2201/01 ,  B81B2201/014 ,  B81B2203/0118 ,  B81B2203/0315 ,  B81B2203/04 ,  B81C1/0015 ,  B81C1/00365 ,  B81C1/00476 ,  B81C1/00619 ,  B81C1/00626 ,  B81C1/00666 ,  B81C2201/0109 ,  B81C2201/013 ,  B81C2201/0167 ,  B81C2201/017 ,  B81C2203/0136 ,  B81C2203/0172 ,  G06F17/5068 ,  G06F17/5072 ,  H01H1/0036 ,  H01H57/00 ,  H01H59/0009 ,  H01H2057/006 ,  H01L41/1136 ,  H01L2924/0002 ,  Y10S438/937 ,  Y10T29/42 ,  Y10T29/435 ,  Y10T29/49002 ,  Y10T29/49105 ,  Y10T29/49121 ,  Y10T29/49126 ,  Y10T29/4913 ,  Y10T29/49155 ,  Y10T29/5313 ,  H01L2924/00

Abstract: A method of forming a Micro-Electro-Mechanical System (MEMS) includes forming a lower electrode on a first insulator layer within a cavity of the MEMS. The method further includes forming an upper electrode over another insulator material on top of the lower electrode which is at least partially in contact with the lower electrode. The forming of the lower electrode and the upper electrode includes adjusting a metal volume of the lower electrode and the upper electrode to modify beam bending.