中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

24 records (took 0.018 seconds)

    Electrostatic corrector for eliminating the chromatic aberration of particle lenses
    13.
    发明授权
    Electrostatic corrector for eliminating the chromatic aberration of particle lenses 有权
    用于消除粒子透镜色差的静电校正器

    公开(公告)号：US06797962B1

    公开(公告)日：2004-09-28

    申请号：US10018193

    申请日：2002-03-05

    Applicant: Harald Rose ,  Stephan Uhlemann ,  Christoph Weissbacker

    Inventor： Harald Rose ,  Stephan Uhlemann ,  Christoph Weissbacker

    IPC: H01J314

    CPC classification number: H01J37/153 ,  H01J2237/1516

    Abstract: An electrostatic corrector for eliminating the chromatic aberration of particle lenses, includes a corrector having a straight optical axis and an electrostatic quadrupole for allocating to the objective lens. Two corrector pieces are positioned behind the quadrupole, along the optical axis in the direction of radiation. Each corrector piece has three electrical quadrupole fields with an overlying circular lens field. The quadrupole fields, however, are rotated 90° about the optical axis in relation to each other. This arrangement is adjusted so that the astigmatic first image of one sectional view lies in one corrector piece and the astigmatic first image perpendicular thereto, of the other sectional view, lies in the other corrector piece, with another electrostatic quadrupole being located on the output side.

    Abstract translation: 用于消除粒子透镜的色像差的静电校正器包括具有用于分配到物镜的直线光轴和静电四极杆的校正器。 两个校正件位于四极杆的后面，沿着辐射方向的光轴。 每个校正器具有三个具有上覆圆形透镜场的四极四极场。 然而，四极场相对于彼此绕光轴旋转90°。 调整这种布置，使得一个截面图的散光的第一图像位于一个校正件中，并且另一截面图垂直于其的象散的第一图像位于另一个校正件中，另一个静电四极杆位于输出侧 。

    Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope
    14.
    发明授权
    Device for correcting third-order spherical aberration in a lens, especially the objective lens of an electronic microscope 有权
    用于校正透镜中的三阶球面像差的装置，特别是电子显微镜的物镜

    公开(公告)号：US06605810B1

    公开(公告)日：2003-08-12

    申请号：US09601053

    申请日：2000-09-05

    Applicant: Maximilian Haider ,  Stephan Uhlemann

    Inventor： Maximilian Haider ,  Stephan Uhlemann

    IPC: H01J3710

    CPC classification number: H01J37/153

    Abstract: A device for correcting third-order spherical aberration in the objective lens of an electron microscope, including an objective lens and a correction device which is formed by two hexapoles and a round-lens doublet arranged therebetween having two round lenses with the same focal length, whereby a single round lens (3) is arranged between the objective lens (2) and the correction device (1) in such a way that a parallel optical path hits the correction device (1) and the coma-free plane (6) of the objective lens is represented on the plane of the first hexapole (8) of the correction device (1) or two round lenses with different focal lengths are arranged between the objective lens and the correction device, whereby the distance between the round lens (14) close to the objective and the coma-free plane (16) of the objective and the distance between the round lens (15) close to the correction device and the coma-free plane (17) of the correction device is the same is terms of focal length and the distance between both round lenses (14, 15) is equal to the sum of their focal lengths.

    Abstract translation: 一种用于校正电子显微镜的物镜中的三阶球面像差的装置，包括物镜和由两个六极体形成的校正装置和设置在其间的圆形透镜双面镜，具有两个具有相同焦距的圆形透镜， 由此在物镜（2）和校正装置（1）之间设置单个圆形透镜（3），使得平行光路撞击校正装置（1）和无偏转平面（6）， 物镜被表示在校正装置（1）的第一六极（8）的平面上，或者在物镜和校正装置之间布置具有不同焦距的两个圆形透镜，由此圆形透镜（14） ）接近目标的物体，并且物镜的无昏暗平面（16）和靠近校正装置的圆形透镜（15）与校正装置的无昏暗平面（17）之间的距离是相同的 的焦点 并且两个圆形透镜（14,15）之间的距离等于它们的焦距的总和。

    Monochromator and radiation source with monochromator
    15.
    发明授权
    Monochromator and radiation source with monochromator 有权
    单色仪和辐射源

    公开(公告)号：US07745783B2

    公开(公告)日：2010-06-29

    申请号：US12153455

    申请日：2008-05-20

    Applicant: Stephan Uhlemann

    Inventor： Stephan Uhlemann

    IPC: G21K1/06 ,  G21K5/02

    CPC classification number: H01J37/153 ,  H01J37/05 ,  H01J37/26 ,  H01J49/48 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

    Abstract: A monochromator (1) for a charged particle optics, in particular, for electron microscopy, comprises at least one first deflection element (2, 3) with an electrostatic deflecting field (2′, 3′) for generating a dispersion (4) in the plane (5) of a selection aperture (6) to select charged particles of a desired energy interval (7) and at least one second deflection element (8, 9) with an electrostatic deflecting field (8′, 9′) which eliminates the dispersion (4) of the at least one first deflecting field (2′, 3′). A radiation source (17) comprises such a monochromator (1). High monchromatism without intensity contrasts caused by defects of the slit aperture is thereby achieved in that the deflection elements (2, 3, 8, 9) have a design other than spherically shaped and their electrodes (24, 25) are given a potential (φ+, φ−) such that the charged particles (xα, yβ) which virtually enter the image of the radiation source (17) at different respective angles (α, β) in different sections (x, y), are differently focused such that charged particles (xα, yβ) of one energy are point focused (10, 10′, 10″) exclusively in the plane (5) of the selection aperture (6), since zero-crossings (11, 12) of the deflections (A) of the charged particles (xα, yβ) of the different sections (x, y) only coincide there at the same axial position (z, E).

    Abstract translation: 用于带电粒子光学器件的单色仪（1），特别是用于电子显微镜的装置包括至少一个具有用于产生分散体（4）的静电偏转场（2'，3'）的第一偏转元件（2,3） 选择孔径（6）的平面（5）以选择具有期望能量间隔（7）的带电粒子和至少一个具有静电偏转场（8'，9'）的第二偏转元件（8,9） 所述至少一个第一偏转场（2'，3'）的色散（4）。 辐射源（17）包括这样的单色仪（1）。 因此，由于偏转元件（2,3,8,9）具有除球形之外的设计，并且它们的电极（24,25）被赋予电位（＆phgr），因此实现了由狭缝孔径的缺陷引起的没有强度对比度的高单色差 ; +，＆phgr; - ），使得实际上在不同部分（x，y）中以不同的各个角度（α，＆bgr））进入辐射源（17）的图像的带电粒子（xα，y和bgr） 不同的聚焦使得一个能量的带电粒子（xα，y和bgr）专门在选择孔径（6）的平面（5）中点聚焦（10,10'，10“），因为过零点（11,12 不同部分（x，y）的带电粒子（xα，y＆bgr）的偏转（A）的位移仅在相同的轴向位置（z，E）处重合。

    ELECTRON-OPTICAL CORRECTOR FOR APLANATIC IMAGING SYSTEMS
    17.
    发明申请
    ELECTRON-OPTICAL CORRECTOR FOR APLANATIC IMAGING SYSTEMS 有权
    用于APLANICAL IMAGING SYSTEMS的电子光学校正器

    公开(公告)号：US20090134339A1

    公开(公告)日：2009-05-28

    申请号：US12297306

    申请日：2007-03-31

    Applicant: Stephan Uhlemann ,  Harald Rose ,  Heiko Muller

    Inventor： Stephan Uhlemann ,  Harald Rose ,  Heiko Muller

    IPC: H01J3/14

    CPC classification number: H01J37/153 ,  H01J2237/1534

    Abstract: A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes. The orientation of the hexapole field pairs is rotated with respect to the orientation defined by the hexapole fields by a sufficient angle so that the extra-axial third order coma is corrected.

    Abstract translation: 一种使用圆形透镜和六极场消除三次孔径像差和三次超外差彗差的粒子光学校正器包括三个同轴布置的六极场，至少一个圆形透镜双曲线布置在相邻的六极场之间 并调整为使六边形中心六极场成像。 在六极场之间，以中间平面为准，中间平面彼此共轭。 三个六极场在拉莫尔参考系中相同取向，选择三个场的强度，使得具有三重对称性的像散的像差系数变为0.校正包含两个六极场，其中场 六极场对被彼此反对称地激励，并且在每种情况下这些对围绕两个中间平面布置。 六极场对的取向相对于由六极场限定的取向旋转足够的角度，以便校正异轴三阶彗差。

    Lens array with a laterally movable optical axis for corpuscular rays
    20.
    发明申请
    Lens array with a laterally movable optical axis for corpuscular rays 失效
    透镜阵列具有用于红外线的横向移动的光轴

    公开(公告)号：US20050035299A1

    公开(公告)日：2005-02-17

    申请号：US10499165

    申请日：2002-11-26

    Applicant: Stephan Uhlemann ,  Maximilan Haider ,  Heiko Muller

    Inventor： Stephan Uhlemann ,  Maximilan Haider ,  Heiko Muller

    IPC: G03F7/20 ,  H01J37/065 ,  H01J37/073 ,  H01J37/12 ,  H01J37/145 ,  H01J37/153 ,  H01L21/027 ,  G21K1/08

    CPC classification number: H01J37/153 ,  H01J37/145 ,  H01J2237/3175

    Abstract: Disclosed is a lens array having a laterally movable axis for corpuscular rays, particularly for transmission from areas of an object surface onto the focal plane by means of electrons. The inventive array consists of a combined lens comprising a cylinder lens and a quadrupole lens provided with slit diaphragms which can be impinged upon by electric and/or magnetic fields. The optical axis of the quadrupole lens is oriented parallel to the axis of the cylinder lens and defines the optical axis of the projection, the position of which can be altered in relation to the axis of the cylinder lens. The quadrupole lens is in focus in the sector in which the cylinder lens is not in focus and is out of focus in the section in which the cylinder lens is in focus. The inventive combined lens can be operated as an immersion lens for projecting secondary electrons. The immersion field consists of at least two adjacent axially aligned fields. The first field lies between the object and the first slit diaphragm, and the second field lies between the first slit diaphragm and the second slit diaphragm. Both fields can be focused independently from each other. The potential difference between the object and the first diaphragm is comparatively small in relation to the potential difference between the first diaphragm and the second diaphragm, and the potential course between the object and the first diaphragm has to be approximately linear. The combined lens is brought into/out of focus by superposing the immersion field, the cylinder lens field, and the quadrupole field. Alternatively, the lens array can be used as a cathode lens for a photocathode with several homogenous adjacent emission areas.

    Abstract translation: 公开了一种透镜阵列，其具有用于粒子束的横向可移动轴，特别是用于通过电子从物体表面到焦平面上的区域的透射。 本发明的阵列由包括柱面透镜和四极透镜的组合透镜组成，该四极透镜设置有可被电场和/或磁场撞击的狭缝光阑。 四极透镜的光轴定向为平行于柱面透镜的轴线并且限定投影的光轴，其位置可以相对于柱面透镜的轴线改变。 四极透镜在柱面透镜未聚焦的区域中聚焦，并且在柱面透镜聚焦的部分中不对焦。 本发明的组合透镜可以用作投影二次电子的浸没透镜。 浸入场由至少两个相邻的轴向排列的场组成。 第一场位于物体和第一狭缝光阑之间，第二场位于第一狭缝光阑和第二狭缝光阑之间。 这两个领域可以彼此独立地集中。 物体与第一膜片之间的电位差相对于第一膜片和第二膜片之间的电位差相对较小，并且物体与第一膜片之间的电位过程必须近似线性。 组合透镜通过叠加浸没场，气缸透镜场和四极场进入/离开焦点。 或者，透镜阵列可以用作具有几个均匀的相邻发射区域的用于光电阴极的阴极透镜。

Patent Agency Ranking