公开(公告)号：US20240077308A1

公开(公告)日：2024-03-07

申请号：US18260817

申请日：2022-01-04

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX ,  Michael Leo NELSON ,  Muhsin ERALP

IPC: G01B11/27 ,  G03F7/20

CPC classification number: G01B11/272 ,  G03F7/20

Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.

公开(公告)号：US20220057723A1

公开(公告)日：2022-02-24

申请号：US17415715

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Eric Justin MONKMAN ,  Michael Andrew CHIEDA ,  Stephen ROUX ,  Victor Antonio PEREZ-FALCON

IPC: G03F7/20

Abstract: An apparatus for reticle sub-field thermal control in a lithography system is disclosed. The apparatus includes a clamp configured to fix an object. The clamp includes a plurality of gas distribution features that are spatially arranged in a pattern. The apparatus further includes a gas pressure controller configured to individually control a gas flow rate through each of the plurality of gas distribution features to spatially modulate a gas pressure distribution in a space between the clamp and the object. The gas distribution features include a plurality of trenches or holes arranged in an array form.

公开(公告)号：US20230059471A1

公开(公告)日：2023-02-23

申请号：US17796640

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Stephen ROUX ,  Yevgeniy Konstantinovich SHMAREV

IPC: G03F7/20 ,  G03F9/00

Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.

公开(公告)号：US20240319617A1

公开(公告)日：2024-09-26

申请号：US18578168

申请日：2022-06-28

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Wei GUO ,  Stephen ROUX

IPC: G03F7/00 ,  G01N21/956 ,  G02F1/295

CPC classification number: G03F7/706849 ,  G01N21/956 ,  G02F1/2955 ,  G03F7/7065 ,  G03F7/706837 ,  G03F7/706845 ,  G03F7/706847 ,  G03F7/70925 ,  G01N2201/068

Abstract: A metrology system includes a radiation source (708), a phased array (722a,b;724a,b;726;734), a detector, and a comparator. The phased array includes optical elements (706), waveguides (704), and phase modulators (702). The phased array generates a beam of radiation and directs the beam toward a surface of an object. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves combine to form the beam. The detector receives radiation scattered from the surface and generates a detection signal based on the received radiation. The comparator analyzes the detection signal and determines a location of a defect on the surface based on the analyzing.

公开(公告)号：US20230266681A1

公开(公告)日：2023-08-24

申请号：US18012799

申请日：2021-06-09

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX

IPC: G03F9/00

CPC classification number: G03F9/7019 ,  G03F9/7065

Abstract: Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.

公开(公告)号：US20210181640A1

公开(公告)日：2021-06-17

申请号：US16760357

申请日：2018-10-05

Applicant: ASML Holding N.V.

Inventor： Stephen ROUX ,  Christopher William REED

IPC: G03F7/20 ,  H01L21/033

Abstract: An optical assembly and a method of making an optical assembly in which additive manufacturing techniques are used to form a support structure either directly on an optical element or on a carrier that is subsequently bonded to an optical element.