公开(公告)号：US20180016705A1

公开(公告)日：2018-01-18

申请号：US15627149

申请日：2017-06-19

Applicant: Applied Materials, Inc.

Inventor： Christopher S. OLSEN ,  Theresa K. GUARINI ,  Jeffrey TOBIN ,  Lara HAWRYLCHAK ,  Peter STONE ,  Chi Wei LO ,  Saurabh CHOPRA

IPC: C30B25/18 ,  C30B29/08 ,  C30B29/06

CPC classification number: C30B25/186 ,  C30B29/06 ,  C30B29/08

Abstract: Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.

公开(公告)号：US20170263493A1

公开(公告)日：2017-09-14

申请号：US15600336

申请日：2017-05-19

Applicant: Applied Materials, Inc.

Inventor： Mehran BEHDJAT ,  Aaron Muir HUNTER ,  Joseph M. RANISH ,  Norman TAM ,  Jeffrey TOBIN ,  Jiping LI ,  Martin TRAN

IPC: H01L21/687 ,  H01L21/67 ,  H01L21/324

CPC classification number: H01L21/68735 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/68757

Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder includes a hollow cylindrical body comprising an inner peripheral surface, an outer peripheral surface parallel to the inner peripheral surface, wherein the inner peripheral surface and the outer peripheral surface extend along a direction parallel to a longitudinal axis of the support cylinder, and a lateral portion extending radially from the outer peripheral surface to the inner peripheral surface, wherein the lateral portion comprises a first end having a first beveled portion, a first rounded portion, and a first planar portion connecting the first beveled portion and the first rounded portion, and a second end opposing the first end, the second end having a second beveled portion, a second rounded portion, and a second planar portion connecting the second beveled portion and the second rounded portion.

公开(公告)号：US20150329966A1

公开(公告)日：2015-11-19

申请号：US14691496

申请日：2015-04-20

Applicant: Applied Materials, Inc.

Inventor： Kartik SHAH ,  Chaitanya A. PRASAD ,  Kevin Joseph BAUTISTA ,  Jeffrey TOBIN ,  Umesh M. KELKAR ,  Lara HAWRYLCHAK

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/458 ,  C23C16/4584 ,  H01L21/67115

Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.

Abstract translation: 本文所述的实施例涉及一种具有反射板的喷头，其具有用于径向分布气体的气体注射插入件。 在一个实施例中，喷头组件包括反射板和气体注射插入件。 反射板包括至少一个气体注入口。 气体注射插入件设置在反射板中，并且包括多个孔。 气体注射插入件还包括设置在气体注射插入件中的挡板，其中挡板还包括多个孔。 在挡板的第一部分和反射板之间形成第一增压室，并且在挡板的第二部分和反射板之间形成第二增压室。 气体注射插入物的多个孔和挡板的多个孔不轴向对齐。

公开(公告)号：US20150050819A1

公开(公告)日：2015-02-19

申请号：US14298389

申请日：2014-06-06

Applicant: APPLIED MATERIALS, INC.

Inventor： Mehran BEHDJAT ,  Aaron Muir HUNTER ,  Joseph M. RANISH ,  Norman TAM ,  Jeffrey TOBIN ,  Jiping LI ,  Martin TRAN

IPC: H01L21/683 ,  F16C13/00 ,  H01L21/324 ,  B05D7/22

CPC classification number: H01L21/68735 ,  H01L21/324 ,  H01L21/67115 ,  H01L21/68757

Abstract: Embodiments of the disclosure generally relate to a support cylinder used in a thermal process chamber. In one embodiment, the support cylinder comprises a ring body having an inner peripheral surface and an outer peripheral surface, wherein the ring body comprises an opaque quartz glass material and wherein the ring body is coated with an optical transparent layer. The optical transparent layer has a coefficient of thermal expansion that is substantially matched or similar to the opaque quartz glass material to reduce thermal expansion mismatch that may cause thermal stress under high thermal loads. In one example, the opaque quartz glass material is synthetic black quartz and the optical transparent layer comprises a clear fused quartz material.

Abstract translation: 本公开的实施例一般涉及在热处理室中使用的支撑筒。 在一个实施例中，支撑筒包括具有内周表面和外周表面的环体，其中环体包括不透明的石英玻璃材料，并且其中环体涂覆有光学透明层。 光学透明层的热膨胀系数基本上与不透明的石英玻璃材料匹配或类似，以减少在高热负荷下可能引起热应力的热膨胀失配。 在一个实例中，不透明石英玻璃材料是合成黑色石英，光学透明层包括透明的熔融石英材料。