公开(公告)号：US20210262093A1

公开(公告)日：2021-08-26

申请号：US17317418

申请日：2021-05-11

Applicant: Applied Materials, Inc.

Inventor： Kartik SHAH ,  Vishwas Kumar PANDEY ,  Kailash PRADHAN ,  Sairaju TALLAVARJULA ,  Rene GEORGE ,  Eric Kihara SHONO ,  Philip A. BOTTINI ,  Roger CURTIS

IPC: C23C16/455 ,  C23C16/44 ,  H01L21/67 ,  C23C14/56

Abstract: A gas supply member includes a first side opposite a second side and an inner surface defining a first opening extending between the first and second sides. The gas supply member includes a third side orthogonal to the first side, the third side includes a first extension that has a face partially defining the second side, and the first extension includes a first plurality of holes extending through the first extension to the face. The gas supply member includes a fourth side opposite the third side, the fourth side includes a protrusion that has a face partially defining the second side. The gas supply member also includes a baffle disposed adjacent to the inner surface, the baffle includes a first portion extending from the inner surface and a second portion attached to the first portion, and the second portion orthogonal to the first portion and parallel to the third side.

公开(公告)号：US20200332437A1

公开(公告)日：2020-10-22

申请号：US16427812

申请日：2019-05-31

Applicant: Applied Materials, Inc.

Inventor： Brian H. BURROWS ,  Ala MORADIAN ,  Kartik SHAH ,  Shu-Kwan LAU

IPC: C30B25/14 ,  H01L21/02 ,  C30B29/40 ,  C23C16/455 ,  C23C16/30

Abstract: Embodiment disclosed herein include a liner assembly, comprising an injector plate liner, a gas injector liner coupled to the injector plate liner, an upper process gas liner coupled to the gas injector liner, a lower process gas liner coupled to the upper process gas liner, and an injector plate positioned between the injector plate liner and the upper process gas liner, wherein a cooling fluid channel is formed in the injector plate adjacent to the gas injector liner.

公开(公告)号：US20200071832A1

公开(公告)日：2020-03-05

申请号：US16539317

申请日：2019-08-13

Applicant: Applied Materials, Inc.

Inventor： Shu-Kwan LAU ,  Lit Ping LAM ,  Preetham RAO ,  Kartik SHAH ,  Ian ONG ,  Nyi O. MYO ,  Brian H. BURROWS

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/46

Abstract: Embodiments described herein generally relate to apparatus for fabricating semiconductor devices. A gas injection apparatus is coupled to a first gas source and a second gas source. Gases from the first gas source and second gas source may remain separated until the gases enter a process volume in a process chamber. A coolant is flowed through a channel in the gas injection apparatus to cool the first gas and the second gas in the gas injection apparatus. The coolant functions to prevent thermal decomposition of the gases by mitigating the influence of thermal radiation from the process chamber. In one embodiment, the channel surrounds a first conduit with the first gas and a second conduit with the second gas.

公开(公告)号：US20190228951A1

公开(公告)日：2019-07-25

申请号：US16230917

申请日：2018-12-21

Applicant: Applied Materials, Inc.

Inventor： Vishwas Kumar PANDEY ,  Kartik SHAH ,  Christopher S. OLSEN ,  Agus Sofian TJANDRA ,  Hansel LO ,  Eric Kihara SHONO ,  Hemantha RAJU

IPC: H01J37/32 ,  C23C16/455

Abstract: Embodiments of the present disclosure generally relate to a processing chamber for conformal oxidation of high aspect ratio structures. The processing chamber includes a chamber body with a first side and a second side opposite the first side, and a flow assembly disposed in the first side. The flow assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the processing chamber. The flow divider includes a crescent shaped first side, a top, and a bottom. The processing chamber also includes a distributed pumping structure located adjacent to the second side. The flow assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux.

公开(公告)号：US20180142352A1

公开(公告)日：2018-05-24

申请号：US15808543

申请日：2017-11-09

Applicant: Applied Materials, Inc.

Inventor： Kartik SHAH ,  Nisha Prakash HOLLA ,  Vijaykumar KRITHIVASAN ,  Anantha K. SUBRAMANI ,  Hamid NOORBAKHSH

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/452

Abstract: An apparatus and method for cooling a gas distribution assembly with a cooling plate. The cooling plate having a body having a top surface, an outer perimeter, a center, an inner zone and an outer zone. A plurality of channels formed through the top surface. The plurality of channels having a first outer channel having one or more first outer channel segments configured for flowing a first cooling fluid from a cooling fluid inlet to a cooling fluid outlet and a first inner channel disposed between the first outer channel and the center having one or more first inner channel segments configured for flowing a second cooling fluid from a cooling fluid inlet to a cooling fluid outlet wherein flow in adjacent segments is in an opposite direction.

公开(公告)号：US20150329966A1

公开(公告)日：2015-11-19

申请号：US14691496

申请日：2015-04-20

Applicant: Applied Materials, Inc.

Inventor： Kartik SHAH ,  Chaitanya A. PRASAD ,  Kevin Joseph BAUTISTA ,  Jeffrey TOBIN ,  Umesh M. KELKAR ,  Lara HAWRYLCHAK

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/458 ,  C23C16/4584 ,  H01L21/67115

Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.

Abstract translation: 本文所述的实施例涉及一种具有反射板的喷头，其具有用于径向分布气体的气体注射插入件。 在一个实施例中，喷头组件包括反射板和气体注射插入件。 反射板包括至少一个气体注入口。 气体注射插入件设置在反射板中，并且包括多个孔。 气体注射插入件还包括设置在气体注射插入件中的挡板，其中挡板还包括多个孔。 在挡板的第一部分和反射板之间形成第一增压室，并且在挡板的第二部分和反射板之间形成第二增压室。 气体注射插入物的多个孔和挡板的多个孔不轴向对齐。

公开(公告)号：US20230407471A1

公开(公告)日：2023-12-21

申请号：US18205415

申请日：2023-06-02

Applicant: Applied Materials, Inc.

Inventor： Vishwas Kumar PANDEY ,  Eric Kihara SHONO ,  Kartik SHAH ,  Christopher S. OLSEN ,  Agus Sofian TJANDRA ,  Tobin KAUFMAN-OSBORN ,  Taewan KIM ,  Hansel LO

IPC: C23C16/452 ,  C23C16/455 ,  B01F23/10 ,  B01F25/421 ,  H01J37/32 ,  B01F25/10 ,  B01F25/314 ,  B01F35/511 ,  H01L21/67

CPC classification number: C23C16/452 ,  C23C16/45548 ,  C23C16/45536 ,  B01F23/19 ,  B01F25/421 ,  C23C16/45561 ,  H01J37/3244 ,  B01F23/10 ,  B01F25/102 ,  B01F25/3141 ,  B01F25/31423 ,  B01F35/511 ,  H01J37/32357 ,  H01L21/67017

Abstract: The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.

公开(公告)号：US20220411927A1

公开(公告)日：2022-12-29

申请号：US17753524

申请日：2020-09-09

Applicant: Applied Materials, Inc.

Inventor： Vishwas Kumar PANDEY ,  Christopher OLSEN ,  Rene GEORGE ,  Eric SHONO ,  Lara HAWRYLCHAK ,  Erika HANSEN ,  Tobin KAUFMAN-OSBORN ,  Hansel LO ,  Kartik SHAH

IPC: C23C16/455 ,  H01L21/67 ,  C23C16/40 ,  C23C16/52 ,  C23C16/458

Abstract: Embodiments described herein generally relate to a processing system and a method of delivering a reactant gas. The processing system includes a substrate support system, an injection cone, and an intake. The injection cone includes a linear rudder. The linear rudder is disposed such that the flow of reactant gas through the injection cone results in film growth on a specific portion of a substrate. The method includes flowing the gas through the injection cone and delivering the gas onto the substrate below. The localization of the reactant gas, allows for film growth on a specific portion of the substrate.

公开(公告)号：US20200040451A1

公开(公告)日：2020-02-06

申请号：US16521826

申请日：2019-07-25

Applicant: Applied Materials, Inc.

Inventor： Zhepeng CONG ,  Schubert CHU ,  Nyi O. MYO ,  Kartik SHAH ,  Surajit KUMAR

IPC: C23C16/44 ,  C23C16/46 ,  C23C16/458 ,  C30B25/08

Abstract: Embodiments herein relate to chamber liners with a multi-piece design for use in processing chambers. The multi-piece design can have an inner portion and an outer portion. A portion of the inner surface of the outer portion may be designed to be in contact with the outer surface of the inner portion at a single junction point, creating a thermal barrier between the inner portion and outer portion, thus reducing heat transfer from the inner portion and outer portion. The thermal barrier creates higher temperatures at the chamber liner inner surface and therefore leads to shorter heat up times within the chamber. Additionally, the thermal barrier also creates lower temperatures near the base ring and outer surface of the outer ring, thereby protecting the chamber walls and requiring less thermal regulation/dissipation at the chamber walls.

公开(公告)号：US20190194810A1

公开(公告)日：2019-06-27

申请号：US16292078

申请日：2019-03-04

Applicant: Applied Materials, Inc.

Inventor： Kartik SHAH ,  Chaitanya A. PRASAD ,  Kevin Joseph BAUTISTA ,  Jeffrey TOBIN ,  Umesh M. KELKAR ,  Lara HAWRYLCHAK

IPC: C23C16/455 ,  H01L21/67 ,  C23C16/458

CPC classification number: C23C16/45565 ,  C23C16/458 ,  C23C16/4584 ,  H01L21/67115

Abstract: Embodiments described herein relate to a showerhead having a reflector plate with a gas injection insert for radially distributing gas. In one embodiment, a showerhead assembly includes a reflector plate and a gas injection insert. The reflector plate includes at least one gas injection port. The gas injection insert is disposed in the reflector plate, and includes a plurality of apertures. The gas injection insert also includes a baffle plate disposed in the gas injection insert, wherein the baffle plate also includes a plurality of apertures. A first plenum is formed between a first portion of the baffle plate and the reflector plate, and a second plenum is formed between a second portion of the baffle plate and the reflector plate. The plurality of apertures of the gas injection insert and the plurality of apertures of the baffle plate are not axially aligned.