Abstract:
Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
Abstract:
A method and chemical delivery system are provided for low temperature atomic layer deposition. Thus, methods of forming nitrogen-containing thin films by atomic layer deposition using a substantially water free hydrazine gas and plasma treatment are provided.
Abstract:
A method and chemical delivery system are provided. The method includes providing a vapor phase of a multi-component liquid source. The method further includes contacting a pre-loaded carrier gas with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the multi-component liquid source and delivering a gas stream comprising at least one component of the liquid source to a critical process or application, wherein the amount of the component in the carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant. The chemical delivery system includes a multi-component liquid source having a vapor phase. The system further includes a pre-loaded carrier gas source that is in fluid contact with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the liquid source and an apparatus for delivering a gas stream including at least one component of the liquid source, wherein the amount of the component in the pre-loaded carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant.
Abstract:
Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
Abstract:
Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.
Abstract:
Methods, systems, and devices for decontaminating materials containing biological or biologically derived materials, such as microorganisms or DNA products, are provided. The methods, systems, and devices may be used for decontaminating or sterilizing materials, such as surfaces, including, but not limited to reducing the number of viable microorganisms on surfaces. The methods, systems, and devices may further be used for rendering DNA non-amplifiable in nucleic acid amplification reactions that synthesize DNA amplification products.
Abstract:
Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
Abstract:
Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
Abstract:
Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.
Abstract:
Provided herein are methods, systems, and devices for the vapor phase delivery of high purity process gases to a critical process or application.