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    EUV collector system with enhanced EUV radiation collection
    11.
    发明授权
    EUV collector system with enhanced EUV radiation collection 有权
    具有增强的EUV辐射收集的EUV收集器系统

    公开(公告)号：US08587768B2

    公开(公告)日：2013-11-19

    申请号：US13065008

    申请日：2011-03-11

    Applicant: Natale M. Ceglio ,  Gopal Vasudevan

    Inventor： Natale M. Ceglio ,  Gopal Vasudevan

    IPC: G02B5/10 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

    CPC classification number: G03F7/70008 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/208 ,  G02B27/0927 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175

    Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

    Abstract translation: 用于极紫外（EUV）辐射的收集器系统包括与照明器的孔径构件相邻布置的收集器反射镜和辐射收集增强装置（RCED）。 收集器镜将EUV辐射源的EUV辐射引导到孔径构件。 RCED将EUV辐射的一部分重新定向，否则这些辐射将不会通过孔径构件的孔径或不具有最佳角度分布，以通过孔径并且具有更好地适于输入规格的角度分布 照明器 这为照明器提供了比单独从收集器镜可能获得的更大量的可用的EUV辐射，从而增强了使用具有RCED的这种收集器系统的EUV光刻系统的执行。

    Optical alignment tool and method of alignment
    13.
    发明授权
    Optical alignment tool and method of alignment 有权
    光学对准工具和对准方法

    公开(公告)号：US08094310B2

    公开(公告)日：2012-01-10

    申请号：US12449134

    申请日：2008-02-04

    Applicant: Fabio Marioni

    Inventor： Fabio Marioni

    IPC: G01B11/00

    CPC classification number: G02B27/62 ,  G02B7/003 ,  G03F7/70141

    Abstract: An alignment tool for use in calibrating an optical bench and/or alignment of an optical system such as a collector optical system for EUV and X-ray applications is disclosed. The optical system includes multiple nested mirrors attached to a mechanical support. The tool includes a mechanical interface plate, a lower reference ring, an upper reference ring and a pinhole member disposed spaced apart axially in sequence; a first positioning device attached to the mechanical interface plate and to the lower reference ring; the first positioning device being adapted for precisely adjusting the position of the lower reference ring in two dimensions; a second positioning device attached to the mechanical interface plate and to the upper reference ring and adapted for precisely adjusting the position of the upper reference ring in two dimensions; a third positioning device attached to the upper reference plate and to the pinhole member and adapted for precisely adjusting the position of the pinhole member in three dimensions; a mechanical interface mounted on or integral with the mechanical interface plate and being substantially identical in form to that of the mechanical support of the optical system.

    Abstract translation: 公开了一种用于校准光学平台的对准工具和/或诸如用于EUV和X射线应用的收集器光学系统的光学系统的对准。 光学系统包括连接到机械支撑件的多个嵌套反射镜。 该工具包括机械接口板，下参考环，上参考环和依次间隔轴向设置的针孔构件; 附接到机械接口板和下参考环的第一定位装置; 所述第一定位装置适于在两个维度上精确地调整所述下基准环的位置; 第二定位装置，其附接到所述机械接口板和所述上参考环，并且适于在两个维度上精确地调节所述上参考环的位置; 第三定位装置，其附接到所述上参考板和所述针孔构件，并且适于在三维中精确地调整所述针孔构件的位置; 机械接口，其安装在机械接口板上或与机械接口板一体，并且在形式上与光学系统的机械支撑件的形状基本相同。

    Source-collector module with GIC mirror and tin vapor LPP target system
    14.
    发明申请
    Source-collector module with GIC mirror and tin vapor LPP target system 有权
    源收集器模块采用GIC镜和锡蒸汽LPP目标系统

    公开(公告)号：US20110318694A1

    公开(公告)日：2011-12-29

    申请号：US12803461

    申请日：2010-06-28

    Applicant: Richard Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

    Inventor： Richard Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

    IPC: H05G2/00 ,  G03F7/20 ,  G03B27/70

    CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  H05G2/005

    Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.

    Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

    Telescope mirror for high bandwidth free space optical data transmission
    15.
    发明授权
    Telescope mirror for high bandwidth free space optical data transmission 失效
    望远镜用于高带宽自由空间光数据传输

    公开(公告)号：US07347572B1

    公开(公告)日：2008-03-25

    申请号：US09577209

    申请日：2000-05-23

    Applicant: Arnoldo Valenzuela ,  Giuseppe Valsecchi ,  Robert David Banham ,  Fabio Marioni

    Inventor： Arnoldo Valenzuela ,  Giuseppe Valsecchi ,  Robert David Banham ,  Fabio Marioni

    IPC: G02B5/08 ,  G02B5/10 ,  G02B7/182 ,  C25D1/06 ,  C25D7/08

    CPC classification number: C25D1/06 ,  C25D3/12 ,  C25D3/48 ,  C25D7/08 ,  G02B5/0808 ,  G02B17/0652 ,  Y10S359/90

    Abstract: Optical mirror elements for high bandwidth free space optical communication are produced by an electroforming replication technique. Onto the precision surface of a mandrel that is a negative of the required optical surface a layer of metal is deposited forming an exact copy of the mandrel surface and is then separated to form the required optical element. During the production process the mandrel may be coated with a variety of materials that are then separated together with the electroformed optical element during the release step to form a monolithic structure that includes a reflective coating. The mandrel remains unchanged by the process and can then be re-used. The high cost of conventional polishing techniques is therefore limited to the production of the mandrel. The replication process results in the production of low cost optical elements suitable for high bandwidth free space optical data transmission.

    Abstract translation: 用于高带宽自由空间光通信的光学镜元件通过电铸复制技术产生。 在要求的光学表面为负的心轴的精密表面上，沉积一层金属，形成心轴表面的精确复制物，然后分离以形成所需的光学元件。 在生产过程中，心轴可以涂覆有各种材料，然后在释放步骤期间与电铸光学元件分离，以形成包括反射涂层的整体结构。 心轴通过该过程保持不变，然后可以重新使用。 因此，常规抛光技术的高成本限于芯棒的生产。 复制过程导致生产适合于高带宽自由空间光数据传输的低成本光学元件。

    Fabrication of cooling and heat transfer systems by electroforming
    16.
    发明申请
    Fabrication of cooling and heat transfer systems by electroforming 有权

    公开(公告)号：US20070134908A1

    公开(公告)日：2007-06-14

    申请号：US10580397

    申请日：2004-11-23

    Applicant: Robert Banham ,  Armoldo Valenzuela

    Inventor： Robert Banham ,  Armoldo Valenzuela

    IPC: H01L21/4763

    CPC classification number: C25D1/08 ,  C25D1/003 ,  C25D1/02 ,  F23M5/08 ,  F23M2900/05003 ,  F23M2900/05004 ,  F23R3/005 ,  F28F3/12 ,  F28F7/02 ,  F28F13/06 ,  F28F13/08 ,  F28F2260/00 ,  G02B7/1815 ,  Y02T50/675 ,  Y10T29/49002 ,  Y10T29/49117 ,  Y10T29/494 ,  Y10T29/4998

    Abstract: A process for the fabrication of a metallic component, such as those used in energy generation and heat transfer systems (e.g., reactor vessels, combustion chambers), in propulsion systems (e.g., rocket engines), and communications (e.g., optical telescopes). The process comprises: providing an object (e.g. a shaped mandrel) having surface; performing a first electroforming operation, thereby forming a first metallic layer comprising a metallic material (e.g. nickel, copper) on said surface; forming a first mask layer on the first metallic layer, the first mask layer comprising a non-conductive material (e.g. PMMA); patterning the first mask layer, thereby providing a plurality of first recesses in the first mask layer in which the non-conductive material above the first metallic layer is removed, said first recesses having a dimension of elongation; performing second electroforming operation using a metallic material whereby said first recesses are filled with said metallic material and a second metallic layer is formed comprising said metallic material extending at least a first predetermined thickness above, and entirely or partially over the surface of, said first mask layer. The process may include: forming a second mask layer on the upper surface of the second metallic layer, the second mask layer comprising a non-conductive material; patterning the second mask layer, thereby providing a plurality of second recesses in the second mask layer in which the non-conductive material above the second metallic layer is removed, said second recesses having a dimension of elongation; performing a third electroforming operation using said metallic material whereby said second recesses are filled with said metallic material and a third metallic layer is formed comprising said metallic material extending at least a second predetermined thickness above, and entirely or partially over the surface of, said mask layer. The non-conductive material and mandrel are removed, thus producing a component single or multiple layers of cooling or heat transfer channels, the channels in adjacent layers for example having directions at right angles.

    Process for manufacturing an athermal low cost telescope based on high precision replication technology, and such telescope
    17.
    发明授权
    Process for manufacturing an athermal low cost telescope based on high precision replication technology, and such telescope 有权

    公开(公告)号：US12292562B2

    公开(公告)日：2025-05-06

    申请号：US17433936

    申请日：2020-02-17

    Applicant: MEDIA LARIO S.R.L.

    Inventor： Robert David Banham ,  Giuseppe Valsecchi ,  Fabio Marioni

    IPC: G02B23/10 ,  G02B5/08

    Abstract: A manufacturing method creates a type of telescope which is athermal, lightweight, optical quality for visible and IR applications. The method includes: a) optical mirrors being made by immersing a master, that is an optical component with a curvature opposite to the mirror required into an electrolytic bath where the applied current transfers metal ions and deposit them on the master, the cathode, as a layer, b) the layer being bonded by an adhesive, solder or any other attachment process to a mechanical reinforcing structure, c) after the hardening of the bond or glue, the thin layer being finally released from the master and having maintained the optical quality of the master. The master or mandrel can be cleaned and reused for repeating this method and manufacturing large series of telescopes.

    EUV collector system with enhanced EUV radiation collection
    19.
    发明授权
    EUV collector system with enhanced EUV radiation collection 有权
    具有增强的EUV辐射收集的EUV收集器系统

    公开(公告)号：US08873025B2

    公开(公告)日：2014-10-28

    申请号：US14056654

    申请日：2013-10-17

    Applicant: Media Lario, S.R.L.

    Inventor： Natale M. Ceglio ,  Gopal Vasudevan

    IPC: G03F7/20 ,  G02B5/08 ,  G02B5/10 ,  G02B5/20 ,  G02B27/09

    CPC classification number: G03F7/70008 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/208 ,  G02B27/0927 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175

    Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

    Abstract translation: 用于极紫外（EUV）辐射的收集器系统包括与照明器的孔径构件相邻布置的收集器反射镜和辐射收集增强装置（RCED）。 收集器镜将EUV辐射源的EUV辐射引导到孔径构件。 RCED将EUV辐射的一部分重新定向，否则它们将不会通过孔径构件的孔径，或者不具有最佳的角度分布，以穿过该孔，并具有更好地适合于输入规格的角分布 照明器 这为照明器提供了比单独从收集器镜可能获得的更大量的可用的EUV辐射，从而增强了使用具有RCED的这种收集器系统的EUV光刻系统的执行。

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