公开(公告)号：US20100279017A1

公开(公告)日：2010-11-04

申请号：US12741658

申请日：2008-11-06

Applicant: Jens Eckstein

Inventor： Jens Eckstein

IPC: B05D3/02 ,  B05C9/14

CPC classification number: B05C3/18 ,  B05C3/005 ,  B05C3/05 ,  B05C3/20 ,  B05C9/14 ,  H01L21/67011 ,  H01L21/6715

Abstract: A device for coating a product includes a provider for providing a liquid containing reagents necessitated for coating. Additionally, the device comprises a transporter for contacting the surface of the product to be coated with the liquid and passing same by the liquid such that the surface to be coated remains in contact with the liquid for a predetermined period of time so as to effect coating thereof.

Abstract translation: 用于涂覆产品的装置包括用于提供含有需要涂覆的试剂的液体的提供者。 另外，该装置包括一个运送器，用于接触要被涂覆的产品的表面并通过液体使其通过，使得待涂覆的表面保持与液体接触一段预定的时间，从而实现涂覆 其中。

公开(公告)号：US20080314312A1

公开(公告)日：2008-12-25

申请号：US12123308

申请日：2008-05-19

Applicant: Kendall W. Prince ,  Gordon L. King ,  Roderick Hughes ,  Richard B. Flora

Inventor： Kendall W. Prince ,  Gordon L. King ,  Roderick Hughes ,  Richard B. Flora

IPC: B05C11/10

CPC classification number: B05C3/00 ,  B05C3/005 ,  B05C3/12 ,  B05C11/1042 ,  B05D1/265 ,  B28B3/2636 ,  B28B11/044 ,  B29C47/003 ,  B29C47/025

Abstract: A coating apparatus and method are disclosed that applies a coating to a product in a uniform and controlled manner. The coating apparatus comprises a feeding stage, an optional pre-treatment stage, at least one coating stage and a finishing stage. The coating stage(s) comprise a coating material feeder and a coating device. The coating device includes an aperture conforming to the perimeter of a substrate to be coated in a first and second dimension. As the substrate passes through the aperture, coating material is applied in a uniform and consistent layer ranging from 0.001 inches to 0.250 inches. The coating material also back fills minor surface imperfections and blemishes on the substrate to achieve a consistent finish across the whole area where coating material is applied. The coating device includes first and second shell portions. The first shell portion has a concave surface surrounding the aperture portion. The concave surface allows for coating material to collect prior to deposition upon the surface of the substrate. The second shell has a substantially flat face and a mirror aperture that aligns with the aperture of the first shell. A groove is formed along the perimeter of the aperture to collect coating material for coating the object as it passes through the apertures of both shells.

Abstract translation: 公开了以均匀和受控的方式将涂层施加到产品上的涂布装置和方法。 涂覆装置包括进料段，任选的预处理阶段，至少一个涂布阶段和整理阶段。 涂覆阶段包括涂料供料器和涂布装置。 涂覆装置包括与第一和第二尺寸要涂覆的基底的周边相一致的孔。 当基底穿过孔时，涂层材料以0.001英寸至0.250英寸的均匀且一致的层施加。 涂层材料还填充了基材上的小的表面缺陷和瑕疵，以在涂覆材料的整个区域上实现一致的整理。 涂覆装置包括第一和第二壳部分。 第一外壳部分具有围绕孔部分的凹形表面。 凹形表面允许涂层材料在沉积之前收集在基底表面上。 第二壳体具有基本平坦的面和与第一壳体的孔对准的反射镜孔。 沿着孔的周边形成凹槽以收集用于在物体穿过两个孔的孔时涂覆物体的涂层材料。

公开(公告)号：US07374795B2

公开(公告)日：2008-05-20

申请号：US10723500

申请日：2003-11-26

Applicant: Kendall W. Prince ,  Gordon L. King ,  Roderick Hughes ,  Richard B. Flora

Inventor： Kendall W. Prince ,  Gordon L. King ,  Roderick Hughes ,  Richard B. Flora

IPC: B05D3/12

CPC classification number: B05C3/00 ,  B05C3/005 ,  B05C3/12 ,  B05C11/1042 ,  B05D1/265 ,  B28B3/2636 ,  B28B11/044 ,  B29C47/003 ,  B29C47/025

Abstract: A coating method is disclosed that applies a coating to a product in a uniform and controlled manner. The coating method comprises a feeding step, an optional pre-treatment step, at least one coating step, and a finishing step. The coating step(s) comprise the use of a coating material feeder and a coating device. During the coating step(s), a substrate passes through an aperture in the coating device which, includes first and second shell portions, where the first shell portion has a concave surface surrounding the aperture portion. The second shell has a substantially flat face and a mirror aperture that aligns with the aperture of the first shell. The concave surface of the first shell and a groove formed along the perimeter of the aperture collect coating material for coating the object as it passes through the apertures of both shells.

Abstract translation: 公开了一种以均匀且受控的方式将涂层施加到产品上的涂布方法。 涂布方法包括进料步骤，任选的预处理步骤，至少一个涂布步骤和精整步骤。 涂覆步骤包括使用涂料供料器和涂布装置。 在涂布步骤期间，基底通过涂覆装置中的孔，其包括第一和第二壳体部分，其中第一壳部分具有包围孔部分的凹形表面。 第二壳体具有基本平坦的面和与第一壳体的孔对准的反射镜孔。 第一壳体的凹面和沿着孔的周边形成的凹槽聚集涂层材料，用于当物体穿过两个孔的孔时涂覆物体。

公开(公告)号：US06534112B1

公开(公告)日：2003-03-18

申请号：US09630175

申请日：2000-08-01

Applicant: Mark S. Bouchier ,  Robert Lund ,  James Gohman ,  Randall P. Rowland

Inventor： Mark S. Bouchier ,  Robert Lund ,  James Gohman ,  Randall P. Rowland

IPC: A61L2700

CPC classification number: A61L29/16 ,  A61L27/28 ,  A61L27/54 ,  A61L31/16 ,  A61L2300/406 ,  A61L2300/606 ,  A61L2420/02 ,  B05C3/005 ,  B05C3/04 ,  B05C3/09

Abstract: A semi-automated coating system for providing medical devices with antimicrobial coatings is disclosed. The semi-automated coating system extends the coating solution's usable life span by minimizing exposure to light, air and temperature extremes. Moreover, the disclosed semi-automated coating system minimizes operator and environmental exposure to the coating solutions. Methods for coating medical devices using the semi-automated coating system are also provided. The methods disclose techniques for preparing coating solutions, setting up the coating system and operating the device. Moreover, the systems and methods described herein minimize operator intervention with the coating processes and provide superior product consistency.

Abstract translation: 公开了一种用于向医疗设备提供抗微生物涂层的半自动涂层系统。 半自动涂层系统通过最大限度地减少暴露于光，空气和极端温度来延长涂层溶液的使用寿命。 此外，所公开的半自动涂布系统使操作者和涂覆溶液的环境暴露最小化。 还提供了使用半自动涂布系统涂覆医疗装置的方法。 该方法公开了制备涂料溶液的技术，设置涂料体系和操作装置。 此外，本文所述的系统和方法使涂覆过程的操作员干预最小化并提供优异的产品一致性。

公开(公告)号：US5741362A

公开(公告)日：1998-04-21

申请号：US543286

申请日：1995-10-16

Applicant: Takaaki Kobayashi

Inventor： Takaaki Kobayashi

IPC: C23C18/16 ,  B05C3/00 ,  B05C3/02 ,  C23C22/73 ,  H01L21/00 ,  H01L21/027 ,  H01L21/304 ,  B05C11/00 ,  B08B3/00

CPC classification number: H01L21/67057 ,  B05C3/005 ,  B05C3/02 ,  H01L21/67023

Abstract: A wafer surface treating apparatus has an overflow treating tank for holding therein a chemical in which a wafer is to be soaked to perform a surface treatment of the wafer, piping for circulating the chemical overflowing from said treating tank to said treating tank, a filter unit for filtering the chemical passing through said piping to remove foreign articles from the chemical, and at least two temperature regulating mechanisms. The first temperature regulating mechanism keeps a temperature of the chemical in said treating tank at a predetermined temperature. The second temperature regulating mechanism regulates the temperature of the chemical in said filter unit to a temperature at which no deposit is produced from the chemical in said filter.

Abstract translation: 晶片表面处理装置具有溢流处理槽，用于保持其中要浸泡晶片以进行晶片的表面处理的化学品，用于将从所述处理槽溢出的化学品循环到所述处理槽的管道，过滤器单元 用于过滤通过所述管道的化学品以从化学品中除去外来物品，以及至少两个温度调节机构。 第一温度调节机构使化学品在所述处理槽中的温度保持在预定温度。 第二温度调节机构将所述过滤器单元中的化学品的温度调节到在所述过滤器中不从所述化学物质产生沉积物的温度。

公开(公告)号：US11834746B2

公开(公告)日：2023-12-05

申请号：US17962598

申请日：2022-10-10

Applicant: Consolidated Nuclear Security, LLC

Inventor： Melissa Ensor Freiderich

IPC: C23C18/31 ,  C23C18/16 ,  C25F3/02 ,  B05C3/02 ,  C25F7/00 ,  B05C3/00

CPC classification number: C23C18/31 ,  B05C3/005 ,  B05C3/02 ,  C23C18/1619 ,  C23C18/1628 ,  C23C18/1637 ,  C23C18/1676 ,  C25F3/02 ,  C25F7/00

Abstract: Systems and methods for electroless plating a first metal onto a second metal in a molten salt bath including: a bath vessel holding a dry salt mixture including a dry salt medium and a dry salt medium of the first metal, and without the reductant therein, the dry salt mixture configured to be heated to form a molten salt bath; and the second metal is configured to be disposed in the molten salt bath and receive a pure coating of the first metal thereon by electroless plating in the molten salt bath, wherein the second metal is more electronegative than the first metal.

公开(公告)号：US20180195191A1

公开(公告)日：2018-07-12

申请号：US15524737

申请日：2015-11-04

Applicant: STELIA AEROSPACE

Inventor： Bertrand RIVES

IPC: C25D5/02 ,  C23G3/00 ,  C25D5/34 ,  C25D21/12

CPC classification number: C25D5/026 ,  B05C3/005 ,  B05C3/04 ,  B05C3/109 ,  B05C3/12 ,  B05C3/20 ,  B05C9/04 ,  B05D1/18 ,  B05D1/32 ,  B05D2202/00 ,  C23F1/08 ,  C23G3/00 ,  C25D5/34 ,  C25D11/005 ,  C25D11/022 ,  C25D17/00 ,  C25D17/02 ,  C25D21/02 ,  C25D21/06 ,  C25D21/10 ,  C25D21/12

Abstract: The invention relates to a system for the local surface treatment of an aeronautical part (1) to be treated.Said system is characterised in that it comprises a plurality of containers (18, 19, 20, 21) each comprising a treatment product (22, 23, 24, 25), at least one bath enclosure (102a, 102b) suitable for delimiting a fluid-tight space (26a, 26b) between this bath enclosure (102a, 102b) and a portion (101a, 101b) of the part to be treated, and a controlled circuit (10) for supplying said fluid-tight space (26a, 26b) with treatment product (22, 23, 24, 25) the containers (18, 19, 20, 21) connecting at least this container (18, 19, 20, 21) to said fluid-tight space (26a, 26b) and comprising valves for managing the supply to the fluid-tight space by one or more containers from the plurality of containers.

公开(公告)号：US09433966B2

公开(公告)日：2016-09-06

申请号：US14186002

申请日：2014-02-21

Applicant: TSMC Solar Ltd.

Inventor： Pei-Chen Tsai

IPC: B05C3/00 ,  B05C11/00 ,  B05C13/00 ,  B05C11/10 ,  B05C3/02 ,  H01L31/18

CPC classification number: B05C11/1002 ,  B05C3/005 ,  B05C3/02 ,  H01L31/1828 ,  Y02E10/50 ,  Y02E10/543 ,  Y02P70/521

Abstract: An apparatus for chemical bath deposition includes a housing defining a chemical tank, a circulation pipe, and at least one flow adjustment device disposed inside the chemical tank. The chemical tank has an opening on a top surface and is configured to accept and hold at least one substrate inside the chemical tank. The circulation pipe has at least one portion inside the chemical tank, and is configured to supply at least one chemical to the chemical tank. The at least one flowing adjustment device includes any one of a turbine, a diffuser and a bubbler, or a combination thereof.

Abstract translation: 一种用于化学浴沉积的设备包括限定化学罐，循环管和设置在化学罐内部的至少一个流量调节装置的壳体。 化学罐在顶表面上具有开口，并且构造成在化学罐内容纳和保持至少一个基底。 所述循环管具有至少一部分在所述化学罐内部，并且构造成向所述化学罐供应至少一种化学品。 至少一个流动调节装置包括涡轮机，扩散器和起泡器中的任何一个或其组合。

公开(公告)号：US20160199871A1

公开(公告)日：2016-07-14

申请号：US15076495

申请日：2016-03-21

Applicant: PRECISION COATING INNOVATIONS, LLC

Inventor： GORDON L. KING ,  DON PATTERSON

IPC: B05C3/12

CPC classification number: B05C3/12 ,  B05C3/005 ,  B05C9/12 ,  B05C11/1042 ,  B05D1/265 ,  B05D7/06 ,  B29C48/07 ,  B29C48/12 ,  B29C48/154 ,  B29C48/90 ,  B29C48/904 ,  B29C48/908 ,  B29C48/916 ,  B29K2711/14

Abstract: Exemplary pressurization and coating systems, methods, and apparatuses are described herein. In certain embodiments, pressurization systems, methods, and apparatuses are used in conjunction with coating systems, methods, and apparatuses to control pressure about a substrate after a coating material is applied to a surface of the substrate. An exemplary system includes a die tool configured to apply a coating material to a substrate passing through the die tool and a pressurization apparatus attached to the die tool and forming a pressurization chamber. The pressurization apparatus is configured to receive the substrate from the die tool and control pressure about the substrate in the pressurization chamber. In certain embodiments, the die tool forms a coating chamber and is configure,d to apply the coating material on at least one surface of the substrate in the coating chamber.

Abstract translation: 本文描述了示例性的加压和涂覆系统，方法和装置。 在某些实施例中，加压系统，方法和装置与涂覆系统，方法和装置结合使用，以便在将涂层材料施加到基底的表面之后控制基底上的压力。 示例性系统包括：模具工具，其被配置为将涂层材料施加到通过模具工具的基板和附接到模具工具并形成加压室的加压装置。 加压装置构造成从模具工具接收基板并控制加压室中的基板周围的压力。 在某些实施例中，模具工具形成涂覆室，并且构造为将涂层材料涂覆在涂覆室中的基底的至少一个表面上。

公开(公告)号：US09133540B2

公开(公告)日：2015-09-15

申请号：US13824574

申请日：2011-12-26

Applicant: Tae-In Jang ,  Yong-Hun Kweon ,  Jung-Kuk Kim ,  Chang-Woon Jee

Inventor： Tae-In Jang ,  Yong-Hun Kweon ,  Jung-Kuk Kim ,  Chang-Woon Jee

IPC: C23C2/00 ,  B05C3/02 ,  B05C3/00

CPC classification number: C23C2/003 ,  B05C3/005 ,  B05C3/02 ,  C23C2/00 ,  C23C2/06

Abstract: Provided is an apparatus for efficiently removing a pollutant source in a snout of a steel plating line such as a steel galvanizing line. The pollutant removing apparatus includes at least one pollutant collecting member connecting to a snout between a heating furnace and a plating tank, and a contact-free inducer varying magnetic field within the snout to forcibly guide, without contact, a pollutant source of a steel plate or a processing unit to the pollutant collecting member.

Abstract translation: 提供了一种用于有效地去除诸如钢镀锌生产线的镀钢线的喷嘴中的污染源的装置。 污染物去除装置包括至少一个连接到加热炉和镀槽之间的喷嘴的污染物收集构件，以及在鼻孔内改变磁场的无接触诱导器，以强制地引导钢板的污染源 或处理单元到污染物收集构件。