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    Process and system for fabrication of patterns on a surface
    18.
    发明授权
    Process and system for fabrication of patterns on a surface 有权
    用于在表面上制作图案的工艺和系统

    公开(公告)号：US08524100B2

    公开(公告)日：2013-09-03

    申请号：US13003484

    申请日：2009-07-03

    Applicant: Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

    Inventor： Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

    IPC: C03C15/00

    CPC classification number: G03F7/11 ,  B81C1/00634 ,  B81C2201/0143 ,  B81C2201/0159 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337

    Abstract: The invention provides a system and process of patterning structures on a carbon based surface comprising exposing part of the surface to an ion flux, such that material properties of the exposed surface are modified to provide a hard mask effect on the surface. A further step of etching unexposed parts of the surface forms the structures on the surface. The inventors have discovered that by controlling the ion exposure, alteration of the surface structure at the top surface provides a mask pattern, without substantially removing any material from the exposed surface. The mask allows for subsequent ion etching of unexposed areas of the surface leaving the exposed areas raised relative to the unexposed areas thus manufacturing patterns onto the surface. For example, a Ga+ focussed ion beam exposes a pattern onto a diamond surface which produces such a pattern after its exposure to a plasma etch. The invention is particularly suitable for patterning of clear well-defined structures down to nano-scale dimensions.

    Abstract translation: 本发明提供了一种在碳基表面上构图结构的系统和工艺，包括将表面的一部分暴露于离子通量，使得暴露表面的材料特性被修饰以在表面上提供硬掩模效应。 蚀刻表面的未曝光部分的另一步骤形成表面上的结构。 发明人已经发现，通过控制离子暴露，顶表面上的表面结构的改变提供掩模图案，而基本上不从暴露表面移除任何材料。 该掩模允许对表面的未曝光区域的后续离子蚀刻，离开暴露区域相对于未曝光区域升高，从而将图案制造到表面上。 例如，Ga +聚焦离子束将图案暴露在金刚石表面上，其在暴露于等离子体蚀刻之后产生这种图案。 本发明特别适用于直到纳米级尺寸的清晰明确定义的结构的图案化。

    Method of manufacturing a switch system
    19.
    发明授权
    Method of manufacturing a switch system 有权
    制造开关系统的方法

    公开(公告)号：US08506826B2

    公开(公告)日：2013-08-13

    申请号：US13195949

    申请日：2011-08-02

    Applicant: John E. Rogers

    Inventor： John E. Rogers

    IPC: C23F1/00

    CPC classification number: B81C1/00714 ,  B81B2201/014 ,  B81B2203/0109 ,  B81B2207/03 ,  B81B2207/99 ,  B81C1/00341 ,  B81C2201/0143 ,  B81C2203/037 ,  H01H1/0036 ,  H01H59/0009 ,  H01H2001/0073

    Abstract: A method for manufacturing a micro electro-mechanical system (MEMS) switch system (600, 700) includes etching each of a plurality of base circuit layers (425) and a plurality of passive component substrate layers (412, 418, 42, 426). The method continues with laser milling of a first dielectric film (406) to create a spacer layer (405). A metal cladding (402, 403) formed on a flexible dielectric film layer 404 is etched so as to form a plurality of switch component features. Further laser milling is performed with respect to the flexible dielectric film layer to form at least one switch structure (448, 450). Thereafter, a stack (400) is assembled which is comprised of the spacer layer disposed between the flexible dielectric film layer and the plurality of base circuit layers. Additional layers can also be included in the stack. When the stack is completed, heat and pressure are applied to join the various layers forming the stack.

    Abstract translation: 一种用于制造微机电系统（MEMS）开关系统（600,700）的方法包括蚀刻多个基极电路层（425）和多个无源部件衬底层（412,418,42,426）中的每一个， 。 该方法继续激光研磨第一介电膜（406）以产生间隔层（405）。 形成在柔性电介质膜层404上的金属覆层（402,403）被蚀刻以形成多个开关元件特征。 相对于柔性电介质膜层进行激光研磨以形成至少一个开关结构（448,450）。 此后，组装叠层（400），其由设置在柔性电介质膜层和多个基极电路层之间的间隔层组成。 堆栈中还可以包含附加层。 当堆叠完成时，施加热和压力以连接形成堆叠的各种层。

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