公开(公告)号：US20060137397A1

公开(公告)日：2006-06-29

申请号：US11148504

申请日：2005-06-08

Applicant: Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

Inventor： Dana Bookbinder ,  Richard Fiacco ,  Kenneth Hrdina ,  Lisa Moore ,  Susan Schiefelbein

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/40 ,  C03C2203/54 ,  G03F7/70958

Abstract: Disclosed are high purity synthetic silica material having an internal transmission at 193 nm of at least 99.65%/cm and method of preparing such material. The material is also featured by a high compositional homogeneity in a plane transverse to the intended optical axis. The soot-to-glass process for making the material includes a step of consolidating the soot preform in the presence of H2O and/or O2.

Abstract translation: 公开了具有193nm以上的内透射率为至少99.65％/ cm 3的高纯度合成二氧化硅材料及其制备方法。 该材料的特征还在于横向于预期光轴的平面中具有高的组成均匀性。 用于制造材料的烟灰对玻璃工艺包括在H 2 O 2和/或O 2 2的存在下固化烟灰预制件的步骤。

公开(公告)号：US20050081565A1

公开(公告)日：2005-04-21

申请号：US10501523

申请日：2003-08-08

Applicant: Shuichiro Kato ,  Tomomi Moriya ,  Yuichi Ohga

Inventor： Shuichiro Kato ,  Tomomi Moriya ,  Yuichi Ohga

IPC: C03B23/043 ,  C03B23/045 ,  C03B23/049 ,  C03B32/00 ,  C03B37/012 ,  C03C23/00

CPC classification number: C03B32/00 ,  C03B23/043 ,  C03B23/045 ,  C03B23/0496 ,  C03B37/01228 ,  C03B37/01254 ,  C03B2201/03

Abstract: An object of the present invention is to provide a method of highly purifying a glass body, which enables high purification of the glass body while decreasing deformation of the glass body at a high degree, to provide a highly purified glass body, and to provide a method and an apparatus for manufacturing a glass tube, which can obtain a highly purified glass tube. A method of highly purifying a glass body according to the present invention is to apply a voltage between electrodes 1 and 2, which make contact with the glass pipe 11, in a nearly radial direction of the glass pipe 11 while heating the glass pipe 11 to a temperature within a range less than 1300° C. Further, a method of manufacturing a glass tube according to the invention is to generate a voltage gradient in a radial direction of a glass tube 106 by applying voltages to the inner circumferential side and the outer circumferential side of the glass tube 106 when a glass rod 103 is gradually formed into the glass tube 106 by heating the glass rod 103 to soften the glass rod 103 and by bringing a boring jig 130 into contact with a softened portion of the glass rod 103.

Abstract translation: 本发明的目的是提供一种玻璃体的高纯化方法，能够高度净化玻璃体，同时降低玻璃体的高度变形，提供高精度的玻璃体， 方法和制造玻璃管的装置，其可以获得高纯度的玻璃管。 根据本发明的高纯度玻璃体的方法是在将玻璃管11加热至玻璃管11的大致径向的同时，在与玻璃管11接触的电极1和2之间施加电压， 温度在小于1300℃的范围内。此外，根据本发明的玻璃管的制造方法是通过向内周侧和外侧施加电压而在玻璃管106的径向上产生电压梯度 当玻璃棒103通过加热玻璃棒103以软化玻璃棒103并且使镗孔夹具130与玻璃棒103的软化部分接触而逐渐形成玻璃管106时，玻璃管106的圆周侧 。

公开(公告)号：US20050000404A1

公开(公告)日：2005-01-06

申请号：US10781682

申请日：2004-02-20

Applicant: Hiroshi Kishi ,  Masanori Fukui ,  Yoshiyuki Tsuji

Inventor： Hiroshi Kishi ,  Masanori Fukui ,  Yoshiyuki Tsuji

IPC: C03B20/00 ,  C03B19/09 ,  C30B15/00 ,  C30B15/10 ,  C30B29/06 ,  C30B21/06 ,  C30B27/02 ,  C30B28/10 ,  C30B30/04

CPC classification number: C03C3/06 ,  C03B19/095 ,  C03B2201/03 ,  C30B15/10 ,  C30B29/06 ,  Y10S117/90 ,  Y10T117/1032 ,  Y10T117/1052

Abstract: This invention provides a high purity silica crucible having low impurity concentration in its inner portion, and its production method. The crucible, in which at least each content of Na and Li being contained in the depth of 1 mm from the inside surface is less than 0.05 ppm, is given by a production method of a high purity silica glass crucible, wherein a purity of the melted silica powder layer is increased by applying a voltage between a mold and an arc electrode to move impurity metals being contained in the melted silica glass layer to the outside, when the silica crucible is produced by arc plasma heating a raw material powder of silica in an inside surface of a hollow rotary mold. The method comprises, keeping an arc electrode potential of within ±500 V during an arc melting, applying a voltage of from −1000 V to −20000 V to a mold being insulated to the ground, and applying a high voltage to the un-melted silica powder layer of the outside.

Abstract translation: 本发明提供了内部杂质浓度低的高纯度二氧化硅坩埚及其制造方法。 通过高纯度二氧化硅玻璃坩埚的制造方法给出至少含有内表面1mm以内的Na和Li的含量小于0.05ppm的坩埚，其中， 通过在模具和电弧电极之间施加电压来增加熔融二氧化硅粉末层，以将熔融石英玻璃层中所含的杂质金属移动到外部，当通过电弧等离子体加热二氧化硅原料粉末 中空旋转模具的内表面。 该方法包括：在电弧熔化期间将电弧电极电位保持在±500V以内，向-1000V至-20000V施加电压至与地绝缘的模具，并将高电压施加到未熔化 二氧化硅粉末层外面。

公开(公告)号：US06351972B1

公开(公告)日：2002-03-05

申请号：US09349547

申请日：1999-07-08

Applicant: Hisatoshi Ohtsuka

Inventor： Hisatoshi Ohtsuka

IPC: C03B2000

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B2201/03 ,  C03B2207/85 ,  C03B2207/87 ,  C03C1/02 ,  C03C2201/02 ,  C03C2203/40 ,  C03C2203/42

Abstract: There is disclosed a method for producing a synthetic fused silica member comprising vaporizing a raw material silane compound, hydrolyzing or oxidizing by combustion the vaporized silane compound in oxyhydrogen flame to form silica microparticles so that the silica microparticles should deposit on a rotating refractory carrier, and melting the silica microparticles during the deposition to form the synthetic fused silica member, wherein sulfur impurities are preliminarily removed from the raw material. According to the present invention, there are provided a synthetic fused silica member that does not emit yellow fluorescence at a wavelength of 560-580 nm even when it is irradiated with an ultraviolet ray by an excimer laser or the like, and hence can suitably be used for optical applications utilizing as a light source high energy ultraviolet rays such as those from excimer lasers, typically KrF and ArF excimer lasers, for example, use as a lens material for steppers and the like, and a method for producing the same, as well as an optical member such as lenses and photomasks produced from the synthetic fused silica material.

Abstract translation: 公开了一种合成石英玻璃的制造方法，其包括使原料硅烷化合物蒸发，通过在氢氧焰中燃烧蒸发的硅烷化合物进行水解或氧化，形成二氧化硅微粒，使得二氧化硅微粒沉积在旋转的耐火载体上， 在沉积期间熔化二氧化硅微粒以形成合成的熔融二氧化硅构件，其中预先从原料中除去硫杂质。 根据本发明，提供了即使在通过准分子激光等照射紫外线的情况下也不会在560-580nm的波长下发出黄色荧光的合成石英玻璃构件，因此可以适当地 用于作为光源的光学应用使用高能量紫外线，例如来自准分子激光器（通常为KrF和ArF准分子激光器）的紫外线，例如用作步进器等的透镜材料及其制造方法，如 以及诸如由合成熔融石英材料制成的透镜和光掩模的光学构件。

公开(公告)号：US06289161B1

公开(公告)日：2001-09-11

申请号：US09198883

申请日：1998-11-23

Applicant: Gerhard Schötz ,  Jan Vydra

Inventor： Gerhard Schötz ,  Jan Vydra

IPC: G02B600

CPC classification number: C03C13/045 ,  C03B37/01446 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/08 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03C2201/11 ,  C03C2201/23 ,  G02B6/02 ,  G02B6/02395 ,  G02B6/443

Abstract: In a known optical component a cylindrical glass core of synthetic quartz glass contains hydroxyl groups, a maximum 200 wt.-ppm of chlorine, and no dopant in the form of a metal oxide. The glass core is axially enveloped by a glass mantle of doped quartz glass which has a lower refractive index than the glass core. Setting out from this, in order to offer an optical component of quartz glass for broad-band transmission, especially for broad-band spectroscopy, which is characterized by low attenuation over a broad range of wavelengths, it is proposed by the invention that the core glass contain less than 5 wt.-ppm of hydroxyl groups.

Abstract translation: 在已知的光学组件中，合成石英玻璃的圆柱形玻璃芯包含羟基，最大为200重量ppm的氯，并且不含金属氧化物形式的掺杂剂。 玻璃芯由掺杂石英玻璃的玻璃罩轴向包围，折射率比玻璃芯低。 从此出发，为了提供用于宽带传输的石英玻璃的光学部件，特别是对于在宽波长范围内具有低衰减特征的宽带光谱，本发明提出了核心 玻璃含有小于5重量ppm的羟基。

公开(公告)号：US09828691B2

公开(公告)日：2017-11-28

申请号：US14817839

申请日：2015-08-04

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Christian Schenk ,  Gerrit Scheich ,  Nils-Christian Nielsen ,  Walter Lehmann ,  Bernhard Freudenberg ,  Kaspars Dadzis ,  Sandra Nadolny ,  Franziska Wolny ,  Gerd Fischer

IPC: C30B11/00 ,  C03B19/09 ,  C30B35/00 ,  C30B29/06

CPC classification number: C30B11/002 ,  C03B19/09 ,  C03B2201/03 ,  C30B11/003 ,  C30B29/06 ,  C30B35/002

Abstract: A method for producing a solar crucible includes providing a crucible base body of transparent or opaque fused silica having an inner wall, providing a dispersion containing amorphous SiO2 particles, applying a SiO2-containing slip layer to at least a part of the inner wall by using the dispersion, drying the slip layer to form a SiO2-containing grain layer and thermally densifying the SiO2-containing grain layer to form a diffusion barrier layer. The dispersion contains a dispersion liquid and amorphous SiO2 particles that form a coarse fraction and a fine fraction with SiO2 nanoparticles. The weight percentage of the SiO2 nanoparticles based on the solids content of the dispersion is in the range between 2 and 15% by weight. The SiO2-containing grain layer is thermally densified into the diffusion barrier layer through the heating up of the silicon in the crystal growing process.

公开(公告)号：US20170174560A1

公开(公告)日：2017-06-22

申请号：US15118368

申请日：2015-02-16

Applicant: TOSOH CORPORATION

Inventor： Satori HIRAI ,  Nobusuke YAMADA ,  Kazuyoshi ARAI

IPC: C03C11/00 ,  C03B19/08 ,  C03B19/06

CPC classification number: C03C11/00 ,  C03B19/066 ,  C03B19/08 ,  C03B2201/03 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2204/06

Abstract: To provide opaque quartz glass having no water absorbing properties and being excellent in infrared light shielding properties, and a method for its production. In the production of opaque quartz glass of the present invention, a fine amorphous silica powder and a pore forming agent are mixed, then molded and heated at a predetermined temperature, to obtain opaque quartz glass wherein contained pores are closed pores, the average pore size of pores is from 5 to 20 μm, and the content density of pores is high, whereby the heat shielding properties are high.

公开(公告)号：US20160096765A1

公开(公告)日：2016-04-07

申请号：US14868858

申请日：2015-09-29

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Ian George Sayce ,  Martin Trommer

IPC: C03B20/00 ,  C08G77/04 ,  C03C3/06

CPC classification number: C03B20/00 ,  C03B19/14 ,  C03B19/1415 ,  C03B2201/03 ,  C03B2207/32 ,  C03C3/06 ,  C08G77/04 ,  C23C16/4402

Abstract: One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.

Abstract translation: 一个方面涉及一种生产合成石英玻璃的方法。 此外，一方面涉及聚烷基硅氧烷化合物，其包括关于氯含量，金属杂质含量和残余水分的一些规格，以及其用于生产合成石英玻璃的用途。 一个方面还涉及可以根据一个实施方案的方法获得的合成石英玻璃。

公开(公告)号：US08263511B2

公开(公告)日：2012-09-11

申请号：US12644563

申请日：2009-12-22

Applicant: Carlos Duran ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Daniel Raymond Sempolinski

Inventor： Carlos Duran ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Daniel Raymond Sempolinski

IPC: C03C3/06 ,  C03B25/00

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C2201/22 ,  C03C2201/23

Abstract: A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.

Abstract translation: 具有低绝对折射率和低浓度羟基，卤素和具有低绝对折射率的金属的熔融石英玻璃制品。 玻璃制品含有重量少于约10ppm含氘羟基和重量小于约20ppm的卤素。 石英玻璃制品的绝对折射率（ARI）也小于或等于1.560820。 在一个实施方案中，熔融二氧化硅制品的ARI通过降低熔融二氧化硅的假想温度来实现。 还描述了降低虚构温度的方法。

公开(公告)号：US07592063B2

公开(公告)日：2009-09-22

申请号：US11514997

申请日：2006-09-05

Applicant: Yoshiaki Ikuta ,  Shinya Kikugawa

Inventor： Yoshiaki Ikuta ,  Shinya Kikugawa

IPC: B32B3/00 ,  B32B17/06 ,  B32B18/00 ,  B32B3/16 ,  C03C3/112 ,  C03C3/06 ,  C03C10/16 ,  G01N23/00

CPC classification number: C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

Abstract: For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

Abstract translation: 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。