公开(公告)号：US08931307B2

公开(公告)日：2015-01-13

申请号：US13499352

申请日：2010-09-28

Applicant: Bodo Kuehn

Inventor： Bodo Kuehn

IPC: B32B17/00 ,  C03B23/13 ,  C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06

CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

Abstract translation: 基于具有高二氧化硅含量的钛掺杂玻璃的坯料的制造方法（玻璃）的基础是用于具有外表面的EUV光刻用的镜面基板，其目的是设置有 反射涂层，并且当反射镜基板按预期使用时被指定为高负载区域，以便提供可以以低成本生产的空白，并且在均匀性方面满足高要求并且不受起泡和条纹的影响， 提出了包括以下方法步骤的方法：（a）制造尺寸大到足以包围外轮廓的钛掺杂高品质玻璃的前体，（b）从掺钛玻璃制造圆柱形支撑体 ，（c）将所述前体和所述支撑体接合以形成复合体，和（d）加工所述复合体以形成所述反射镜基板坯料，其中，所述制造所述前体的步骤包括 一种均质化方法，其特征在于，通过使含硅化合物的火焰水解使绞合线形成的起始体扭转而形成前体坯料，所述支撑体形成为与前身均匀性较差的整体式玻璃块。

公开(公告)号：US08789390B2

公开(公告)日：2014-07-29

申请号：US13044684

申请日：2011-03-10

Applicant: Windsor P Thomas ,  Daniel Warren Hawtof

Inventor： Windsor P Thomas ,  Daniel Warren Hawtof

IPC: C03B19/06

CPC classification number: C03B19/1492 ,  C03B19/1453 ,  C03B2201/31 ,  C03B2201/42 ,  C03B2201/58 ,  F42B10/46 ,  F42B15/34 ,  Y10T428/131 ,  Y10T428/1317

Abstract: A near-net or net shape fused silica glass article, such as a radome. The article is formed by depositing silica soot onto a mandrel having a shape that corresponds to the shape of the fused silica glass article. In some embodiments, the mandrel is inductively heated to a temperature that is sufficient to consolidate or sinter the silica soot upon deposition onto the mandrel to form fused silica glass. The fused silica glass article may have an outer layer that is under compression and/or multiple layers comprising various dopants that can alter or affect physical, mechanical, electrical, and/or optical properties.

Abstract translation: 近净或净形熔融石英玻璃制品，如天线罩。 该制品通过将二氧化硅烟灰沉积到具有对应于熔融石英玻璃制品的形状的形状的心轴上而形成。 在一些实施例中，心轴被感应加热到足以在沉积到心轴上时固化或烧结二氧化硅烟炱以形成熔融石英玻璃的温度。 熔融石英玻璃制品可以具有处于压缩下的外层和/或包含可以改变或影响物理，机械，电和/或光学性质的各种掺杂剂的多层。

公开(公告)号：US20140190212A1

公开(公告)日：2014-07-10

申请号：US14204009

申请日：2014-03-11

Applicant: CARL ZEISS SMT GMBH

Inventor： Wilfried CLAUSS

IPC: C03C23/00 ,  C03C17/00

CPC classification number: C03C23/0005 ,  C03B32/005 ,  C03B2201/42 ,  C03C17/00 ,  C03C17/40 ,  C03C2218/31 ,  G02B1/12 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062

Abstract: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

Abstract translation: 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。

公开(公告)号：US20140155246A1

公开(公告)日：2014-06-05

申请号：US13835039

申请日：2013-03-15

Applicant: CORNING INCORPORATED

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: G03F1/22

CPC classification number: G03F1/22 ,  C03B19/12 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54

Abstract: The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiO2 and the remainder SiO2. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tf of less than 875° C. In an embodiment Tf is less than 825° C. In another embodiment Tf is less than 775° C.

Abstract translation: 本公开涉及掺杂的二氧化硅 - 二氧化钛玻璃，DST玻璃，其基本上由0.1重量％ ％至5wt。 ％卤素，50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，卤素含量可以在0.2wt。 ％〜3重量％ ％和50ppm-wt。 至6重量％ ％的一种或多种Al，Ta和Nb的氧化物，3wt。 ％〜10重量％ ％的TiO 2和其余的SiO 2。 在一个实施方案中，DST玻璃的OH浓度小于100ppm。 在另一个实施方案中，OH浓度小于50ppm。 DST玻璃具有小于875℃的假想温度Tf。在一个实施方案中，Tf小于825℃。在另一个实施方案中，Tf小于775℃

公开(公告)号：US20130316890A1

公开(公告)日：2013-11-28

申请号：US13955409

申请日：2013-07-31

Applicant: ASAHI GLASS COMPANY, LIMITED

Inventor： Junko MIYASAKA ,  Tomonori Ogawa ,  Masahiro Kawagishi ,  Masaaki Takata

IPC: C03C3/06 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1415 ,  C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03B2207/36 ,  C03B2207/42 ,  C03C2201/42 ,  C03C2203/40

Abstract: The present invention relates to a method for producing a silica glass body containing titania, containing: a flame hydrolysis step of feeding a silica (SiO2) precursor and a titania (TiO2) precursor into an oxyhydrogen flame and causing a hydrolysis reaction in the flame to form silica glass fine particles containing titania, in which in the flame hydrolysis step, a reaction rate of the hydrolysis reaction of the silica precursor is 80% or more.

Abstract translation: 本发明涉及含有二氧化钛的二氧化硅玻璃体的制造方法，其特征在于，含有将二氧化硅（SiO 2）前体和二氧化钛（TiO 2）前体供给到氢氧焰中的火焰水解工序，将火焰中的水解反应 形成二氧化钛的二氧化硅玻璃微粒，其中在火焰水解步骤中，二氧化硅前体的水解反应的反应速率为80％以上。

公开(公告)号：US08541325B2

公开(公告)日：2013-09-24

申请号：US13028472

申请日：2011-02-16

Applicant: Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

Inventor： Carlos Duran ,  Kenneth Edward Hrdina ,  Michael A Mueller

IPC: C03C3/06

CPC classification number: C03C3/06 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1407 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G03F1/60 ,  G03F7/0002 ,  G03F7/70958

Abstract: In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti+3 concentration level [Ti3+] less than 3 ppm by weight.

Abstract translation: 在一个实施方案中，本公开涉及在340nm至840nm的波长下具有> 90％/ cm 3的内透射率的二氧化硅 - 二氧化钛玻璃。 在另一个实施例中，在340nm至840nm的波长下，内透射率> 93％/ cm。 在另一个实施方案中，在340nm至840nm的波长下，内透射率> 95％/ cm。 在另一个实施方案中，本发明涉及一种二氧化硅 - 二氧化钛玻璃，其透射率通过玻璃制成的光学透镜在340nm至840nm的波长处> 84％。 在另一个实施例中，通过由玻璃制成的光学器件的整个透射在340nm至840nm的波长处为> 86％。 在另一实施例中，通过由玻璃制成的光学器件的整体透射在330nm至840nm的波长处为> 88％。 在另一个实施方案中，二氧化硅 - 二氧化钛玻璃具有小于3ppm重量的Ti + 3浓度水平[Ti 3+]。

公开(公告)号：US08443630B2

公开(公告)日：2013-05-21

申请号：US13082080

申请日：2011-04-07

Applicant: Igor Milicevic ,  Mattheus Jacobus Nicolaas Van Stralen ,  Johannes Antoon Hartsuiker ,  Eugen Aldea ,  Eric Aloysius Kuijpers

Inventor： Igor Milicevic ,  Mattheus Jacobus Nicolaas Van Stralen ,  Johannes Antoon Hartsuiker ,  Eugen Aldea ,  Eric Aloysius Kuijpers

IPC: C03B37/018

CPC classification number: C03B37/0183 ,  C03B37/01807 ,  C03B2201/12 ,  C03B2201/24 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/42

Abstract: A method for manufacturing a primary preform for optical fibers using an internal vapor deposition process, including the steps of: i) providing a hollow glass substrate tube having a supply side and a discharge side, ii) surrounding at least part of the hollow glass substrate tube by a furnace, iii) supplying a gas flow, doped or undoped, of glass-forming gases to the interior of the hollow glass substrate tube via the supply side thereof, iv) creating a reaction zone in which conditions such that deposition of glass will take place on the interior of the hollow glass tube are created, and v) moving the reaction zone back and forth in longitudinal direction over the hollow glass substrate tube between a reversal point located near the supply side and a reversal point located near the discharge side of the hollow glass substrate tube.

Abstract translation: 一种使用内部气相沉积工艺制造用于光纤的初级预制棒的方法，包括以下步骤：i）提供具有供给侧和排出侧的中空玻璃基板管，ii）至少部分中空玻璃基板 通过炉子管，iii）通过其供应侧向中空玻璃基底管的内部供应玻璃形成气体的掺杂或未掺杂的气流，iv）产生反应区，其中使玻璃沉积的条件 将产生在中空玻璃管​​的内部，并且v）使反应区域在纵向方向上前后移动到中空玻璃基板管之间，位于靠近供应侧的反转点和位于放电附近的反转点 一侧的中空玻璃基板管。

公开(公告)号：US20130047669A1

公开(公告)日：2013-02-28

申请号：US13563882

申请日：2012-08-01

Applicant: Sezhian Annamalai

Inventor： Sezhian Annamalai

IPC: C03B19/06

CPC classification number: C03B19/06 ,  C03B19/063 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42

Abstract: In one aspect the disclosure is directed to a binary silica-titania glass blank having a CTE of 0±30 ppb/° C. or less over a temperature range of 5° C. to 35° C., and a doped silica-titania glass critical zone, wherein the dopant(s) are selected from the group consisting of aluminum oxide, and transition metal oxides, and amount of the dopant(s) is in the range of 0.05 wt. % to 8 wt. %. In various embodiments the dopants are selected from the group consisting of 0.25 wt. % to 8 wt. % Al2O3, 0.05 wt. % to 3 wt. % Nb2O5, and 0.25 wt. % to 6 wt. % Ta2O5, and mixtures thereof.

Abstract translation: 一方面，本公开涉及在5℃至35℃的温度范围内CTE为0±30ppb /℃或更低的二氧化硅 - 二氧化钛玻璃坯料，掺杂的二氧化硅 - 二氧化钛 玻璃临界区，其中所述掺杂剂选自氧化铝和过渡金属氧化物，并且所述掺杂剂的量在0.05重量％的范围内。 ％至8wt。 ％。 在各种实施方案中，掺杂剂选自0.25wt。 ％至8wt。 ％Al 2 O 3，0.05重量％ ％〜3重量％ ％Nb2O5和0.25wt。 ％至6wt。 ％Ta 2 O 5，及其混合物。

公开(公告)号：US08356494B2

公开(公告)日：2013-01-22

申请号：US13210673

申请日：2011-08-16

Applicant: Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

Inventor： Takahiro Mitsumori ,  Yasutomi Iwahashi ,  Akio Koike

IPC: C03B37/018 ,  C03C3/06

CPC classification number: C03B19/1423 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/20 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44

Abstract: A process for producing a porous quartz glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.

Abstract translation: 一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积并生长在基材上，其中燃烧器具有 至少两个喷嘴，其中含有（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体，以及（D）选自以下的一种或多种气体： 一组稀有气体，N 2，CO 2，卤化氢和H 2 O，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

公开(公告)号：US20120327384A1

公开(公告)日：2012-12-27

申请号：US13531315

申请日：2012-06-22

Applicant: Wilfried CLAUSS

Inventor： Wilfried CLAUSS

IPC: G02B5/08 ,  G03B27/54 ,  B05D3/12 ,  B05D5/06 ,  B05D3/06

CPC classification number: C03C23/0005 ,  C03B32/005 ,  C03B2201/42 ,  C03C17/00 ,  C03C17/40 ,  C03C2218/31 ,  G02B1/12 ,  G02B5/0891 ,  G02B7/181 ,  G03F7/70316 ,  G03F7/7095 ,  G21K1/062

Abstract: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

Abstract translation: 一种用于生产具有用于EUV波长范围的反射涂层（10a）的反射镜元件（10）的方法和一种基板（10b）。 基板（10b）通过热等静压进行预压实，并将反射涂层（10a）施加到预压实的基板（10b）上。 在该方法中，进行基板（10b）的预压实，直到达到通过长期EUV照射的基板（10b）的压实的饱和值，或者为了进一步压缩，预压实基板 （10b）在涂层（10a）已经或将被施加的表面区域（15）中与离子（16）和/或电子被优选均匀地照射。 用于与该方法相关联的EUV波长范围的镜元件（10）具有通过热等静压预压制的基底（10b）。 这种镜子元件（10）适合于设置在EUV投影曝光系统中。