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公开(公告)号：US20180071999A1
公开(公告)日：2018-03-15
申请号：US15260345
申请日：2016-09-09
Applicant: Eric Karlen
Inventor： Eric Karlen
CPC classification number: B33Y30/00 , B29C64/393 , B29K2105/251 , B33Y50/00 , B33Y50/02 , G01N21/8806 , G01N21/9515 , G01N2021/8848 , G01N2201/06113 , G01N2201/0683
Abstract: An inspection system for an additive manufacturing machine can include a housing configured to be mounted to an internal construction of the additive manufacturing machine, wherein the housing defines a laser inlet configured to allow a laser beam from a laser of the additive manufacturing machine to enter into the housing, wherein the housing defines a laser outlet configured to allow the laser beam to exit from the housing and to allow reflected light to enter into the housing. One or more detectors is disposed within the housing and configured to receive the reflected light. The system includes one or more optical elements configured to allow the laser beam to pass through the housing from the laser inlet to the laser outlet toward a build area of the additive manufacturing machine and to direct reflected light from the laser outlet to the one or more detectors within the housing.
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公开(公告)号：US09909976B2
公开(公告)日：2018-03-06
申请号：US14916538
申请日：2014-09-03
Applicant: LEICA MICROSYSTEMS CMS GMBH
Inventor： Vishnu Vardhan Krishnamachari
CPC classification number: G01N21/21 , G01N21/65 , G01N2201/067 , G01N2201/0683 , G02B21/002 , G02B21/0032 , G02B21/0068 , G02B27/283 , G02B27/286
Abstract: The invention relates to a method for investigating a sample, the sample being impinged upon by illuminating light, and detected light emerging from the sample being directed to a detector, and the illuminating light being directed through an acousto-optic component with which the impingement upon the sample by illuminating light can be temporarily interrupted. The method is notable for the fact that the sample is illuminated with a first illuminating light bundle that has a first linear polarization direction, and with a second illuminating light bundle whose linear polarization direction is continuously switched over between the first linear polarization direction and a second linear polarization direction different from the first linear polarization direction, the illuminating light having the first linear polarization direction proceeding along a first light path and illuminating light having the second linear polarization direction proceeding along a second light path, and the acousto-optic component combining the light paths.
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13.发明申请公开(公告)号：US20180052099A1
公开(公告)日：2018-02-22
申请号：US15387180
申请日：2016-12-21
Applicant: KLA-Tencor Corporation
Inventor： Andrew V. Hill , Amnon Manassen , Ohad Bachar
CPC classification number: G01N21/255 , G01J1/0418 , G01J1/4257 , G01J3/0208 , G01J3/021 , G01J3/06 , G01J3/10 , G01J3/12 , G01J2001/4247 , G01J2003/069 , G01J2003/1213 , G01J2003/1217 , G01J2003/1221 , G01J2003/1234 , G01N2201/0666 , G01N2201/0668 , G01N2201/0675 , G01N2201/0683 , G03F7/70633
Abstract: A metrology system includes an illumination source to generate an illumination beam, a multi-channel spectral filter, a focusing element to direct illumination from the single optical column to a sample, and at least one detector to capture the illumination collected from the sample. The multi-channel spectral filter includes two or more filtering channels having two or more channel beam paths. The two or more filtering channels filter illumination propagating along the two or more channel beam paths based on two or more spectral transmissivity distributions. The multi-channel spectral filter further includes a channel selector to direct at least a portion of the illumination beam into at least one selected filtering channel to filter the illumination beam. The multi-channel spectral filter further includes at least one beam combiner to combine illumination from the two or more filtering channels to a single optical column.
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公开(公告)号：US20180045639A1
公开(公告)日：2018-02-15
申请号：US15783969
申请日：2017-10-13
Applicant: SUMCO CORPORATION
Inventor： Toshiaki SUDO , Tadahiro SATO , Ken KITAHARA , Eriko KITAHARA
CPC classification number: G01N21/23 , C03C3/04 , C30B15/10 , C30B29/06 , G01L1/24 , G01L5/0047 , G01N2201/062 , G01N2201/0683 , H04N5/232
Abstract: A vitreous silica crucible used to pull up silicon single crystal includes: a cylindrical straight body portion, a corner portion formed at a lower end of the straight body portion, and a bottom portion connected with the straight body portion via the corner portion, wherein the vitreous silica crucible further comprises: an opaque outer layer enclosing bubbles therein; and a transparent inner layer from which bubbles are removed, wherein the residual distortion's distribution obtained by measuring the silica glass's inner surface in a non-destructed state has an optical path difference which is 130 nm or less, which residual distortion's distribution is measured using a distortion-measuring apparatus which converts a linearly polarized light into circularly polarized light and then irradiates the crucible's wall.
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公开(公告)号：US09874526B2
公开(公告)日：2018-01-23
申请号：US15468608
申请日：2017-03-24
Applicant: KLA-Tencor Corporation
Inventor： Sheng Liu , Guoheng Zhao
CPC classification number: G01N21/8806 , G01N21/21 , G01N21/9501 , G01N2021/8848 , G01N2201/0683
Abstract: Disclosed are methods and apparatus for inspecting a semiconductor sample. This system comprises an illumination optics subsystem for generating and directing an incident beam towards a defect on a surface of a wafer. The illumination optics subsystem includes a light source for generating the incident beam and one or more polarization components for adjusting a ratio and/or a phase difference for the incident beam's electric field components. The system further includes a collection optics subsystem for collecting scattered light from the defect and/or surface in response to the incident beam, and the collection optics subsystem comprises an adjustable aperture at the pupil plane, followed by a rotatable waveplate for adjusting a phase difference of electric field components of the collected scattered light, followed by a rotatable analyzer. The system also includes a controller that is configured for (i) selecting a polarization of the incident beam, (ii) obtaining a defect scattering map, (iii) obtaining a surface scattering map, and (iv) determining a configuration of the one or more polarization components, aperture mask, and rotatable ¼ waveplate, and analyzer based on analysis of the defect and surface scattering map so as to maximize a defect signal to noise ratio,
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Patent Agency Ranking
公开(公告)号：US20170372924A1
公开(公告)日：2017-12-28
申请号：US15193502
申请日：2016-06-27
Applicant: GLOBALFOUNDRIES Inc.
Inventor： Abner BELLO , Stephanie WAITE , William J. FOSNIGHT , Thomas BEEG
CPC classification number: G01J5/0096 , G01J5/0007 , G01J5/025 , G01J5/0825 , G01J5/0896 , G01N21/211 , G01N21/55 , G01N2201/06113 , G01N2201/0683 , G01N2201/12 , G01R27/00 , H01L21/67253 , H01L21/6732 , H01L21/67353 , H01L21/67386 , H01L22/12
Abstract: A self-contained metrology wafer carrier systems and methods of measuring one or more characteristics of semiconductor wafers are provided. A wafer carrier system includes, for instance, a housing configured for transport within the automated material handling system, the housing having a support configured to support a semiconductor wafer in the housing, and a metrology system disposed within the housing, the metrology system operable to measure at least one characteristic of the wafer, the metrology system comprising a sensing unit and a computing unit operably connected to the sensing unit. Also provided are methods of measuring one or more characteristics of a semiconductor wafer within the wafer carrier systems of the present disclosure.
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公开(公告)号：US20170350811A1
公开(公告)日：2017-12-07
申请号：US15685636
申请日：2017-08-24
Applicant: DEKA Products Limited Partnership
Inventor： Jacob W. Scarpaci
IPC: G01N21/21
CPC classification number: G01N21/21 , G01N2201/0683
Abstract: An apparatus and method for determining the concentration of chiral molecules in a fluid includes a first polarizer configure to polarize light in substantially a first plane to provide initially polarized light. A second polarizer is capable of polarizing the initially polarized light in a plurality of planes, at least one of the plurality of planes being different from the first plane, to provide subsequently polarized light. One or more receivers are included for measuring an intensity of the subsequently polarized light in one or more of the plurality of planes.
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公开(公告)号：US20170276597A1
公开(公告)日：2017-09-28
申请号：US15505621
申请日：2015-08-11
Inventor： Akira EMOTO , Naoki OTANI , Takashi FUKUDA
IPC: G01N21/23
CPC classification number: G01N21/23 , G01N2201/0683
Abstract: A birefringence measurement device includes a light flux generator for generating light flux, a light flux irradiator for irradiating a measurement target with the light flux in a predetermined polarization state, an imaging optical system for forming an image from light flux transmitted through the measurement target, a polarization/diffraction grating positioned within the imaging optical system, an image pickup for generating a light-dark signal related to brightness of the image, and an output for outputting information regarding a phase difference for the light flux. The phase difference resulting from the transmission through the measurement target is determined on the basis of the light-dark signal. The image pickup generates the light-dark signal for the image based on at least one beam of diffracted light from among a plurality of beams of diffracted light produced by the grating. A two-dimensional distribution of birefringence is obtained in real time without a rotating mechanism.
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19.发明申请公开(公告)号：US20170199116A1
公开(公告)日：2017-07-13
申请号：US15315275
申请日：2015-06-03
Applicant: UNIVERSITY OF TSUKUBA
Inventor： Yoshiaki YASUNO , Deepa Kamath KASARAGOD
CPC classification number: G01N21/21 , A61B3/102 , G01B9/02044 , G01B9/02083 , G01B9/02091 , G01B2290/70 , G01N21/17 , G01N21/4795 , G01N2201/0683 , G01N2201/12
Abstract: In polarization-sensitive optical image measurement, noise-containing OCT signals obtained by polarization OCT are processed using a birefringence calculation algorithm, to obtain measured birefringence, after which noise is statistically adjusted to simulate a measured birefringence distribution and determine the noise characteristics of the measured birefringence values, and then Monte Carlo calculations are repeated by assuming different values for the noise level and the true birefringence value, respectively, to form three-dimensional histogram of combinations of true birefringence values, SN ratios, and measured birefringence values, after which specified measured birefringence values and SN ratios are assumed from the three-dimensional histogram information to obtain a true birefringence probability density distribution, and true birefringence values are estimated from the true birefringence probability density distribution.
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公开(公告)号：US09568439B2
公开(公告)日：2017-02-14
申请号：US15088673
申请日：2016-04-01
Applicant: Hitachi High-Technologies Corporation
Inventor： Toshifumi Honda , Yuta Urano , Takahiro Jingu , Akira Hamamatsu
IPC: G01N21/00 , G01N21/95 , G01N21/956 , G01J1/04
CPC classification number: G01N21/8806 , G01J1/0474 , G01J1/44 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/068 , G01N2201/0683 , G01N2201/0697 , G01N2201/10 , G01N2201/12
Abstract: To detect an infinitesimal defect, highly precisely measure the dimensions of the detect, a detect inspection device is configured to comprise: a irradiation unit which irradiate light in a linear region on a surface of a sample; a detection unit which detect light from the linear region; and a signal processing unit which processes a signal obtained by detecting light and detecting a defect. The detection unit includes: an optical assembly which diffuses the light from the sample in one direction and forms an image in a direction orthogonal to the one direction; and a detection assembly having an array sensor in which detection pixels are positioned two-dimensionally, which detects the light diffused in the one direction and imaged in the direction orthogonal to the one direction, adds output signals of each of the detection pixels aligned in the direction in which the light is diffused, and outputs same.
Abstract translation: 为了检测无限小的缺陷，高度精确地测量检测器的尺寸，检测检查装置被配置为包括：照射单元，其照射样品表面上的线性区域中的光; 检测单元，其检测来自所述线性区域的光; 以及处理通过检测光而获得的信号并检测缺陷的信号处理单元。 检测单元包括：光学组件，其在一个方向上扩散来自样品的光并在与该一个方向正交的方向上形成图像; 以及检测组件，其具有阵列传感器，其中检测像素被二维地定位，其检测沿与所述一个方向正交的方向成像的沿所述一个方向扩散的光，并将每个所述检测像素的输出信号相加 光漫射的方向，并输出。
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